Patents by Inventor Jason Hupp

Jason Hupp has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11761893
    Abstract: Systems and method for minimizing the impact of water vapor or other interferent analyte on analyte concentration measurements in a gas exchange measurement system. A system is includes a gas source, first and second gas analyzers coupled to first and second gas flow lines and configured to measure first and second concentrations of a target analyte in the first and second gas flow lines, respectively, a sample chamber configured to hold a water saturable sample, and a water vapor selective element and having a first and second inputs fluidly coupling the gas source to first and second sides, respectively, of the water vapor selective element, and at least one output fluidly coupling the first side of the water vapor selective element to the first and second gas flow lines and a second output coupling the second side of the water vapor selective element to the second gas flow line.
    Type: Grant
    Filed: November 30, 2020
    Date of Patent: September 19, 2023
    Assignee: LI-COR, Inc.
    Inventors: Jason Hupp, Mark Johnson, Bob Eckles, Douglas Lynch
  • Patent number: 11719679
    Abstract: Gas exchange analysis methods and systems utilize a water vapor buffering component including a material configured to buffer water vapor in a flow of a gas, whereby fluctuations in the water vapor content in the flow of the gas are slowed for components downstream from the water vapor buffering component. Components downstream of the water vapor buffering component may include: a first water vapor sensor configured to receive the flow of the gas from the water vapor buffering component and configured to measure a first concentration of water vapor in the gas; a sample chamber configured to receive the gas exiting the water vapor buffering component or the first water vapor sensor and to hold a sample capable of adding or removing water vapor from the gas; and a second water vapor sensor configured to measure a second concentration of water vapor in the gas exiting the sample chamber.
    Type: Grant
    Filed: March 11, 2021
    Date of Patent: August 8, 2023
    Assignee: LI-COR, INC.
    Inventors: Mark A. Johnson, Robert D. Eckles, Douglas J. Lynch, Johnathan I. E. McCoy, Jason Hupp
  • Publication number: 20210293768
    Abstract: Gas exchange analysis methods and systems utilize a water vapor buffering component including a material configured to buffer water vapor in a flow of a gas, whereby fluctuations in the water vapor content in the flow of the gas are slowed for components downstream from the water vapor buffering component. Components downstream of the water vapor buffering component may include: a first water vapor sensor configured to receive the flow of the gas from the water vapor buffering component and configured to measure a first concentration of water vapor in the gas; a sample chamber configured to receive the gas exiting the water vapor buffering component or the first water vapor sensor and to hold a sample capable of adding or removing water vapor from the gas; and a second water vapor sensor configured to measure a second concentration of water vapor in the gas exiting the sample chamber.
    Type: Application
    Filed: March 11, 2021
    Publication date: September 23, 2021
    Inventors: Mark A. Johnson, Robert D. Eckles, Douglas J. Lynch, Johnathan I.E. McCoy, Jason Hupp
  • Publication number: 20210223173
    Abstract: Systems and method for minimizing the impact of water vapor or other interferent analyte on analyte concentration measurements in a gas exchange measurement system. A system is includes a gas source, first and second gas analyzers coupled to first and second gas flow lines and configured to measure first and second concentrations of a target analyte in the first and second gas flow lines, respectively, a sample chamber configured to hold a water saturable sample, and a water vapor selective element and having a first and second inputs fluidly coupling the gas source to first and second sides, respectively, of the water vapor selective element, and at least one output fluidly coupling the first side of the water vapor selective element to the first and second gas flow lines and a second output coupling the second side of the water vapor selective element to the second gas flow line.
    Type: Application
    Filed: November 30, 2020
    Publication date: July 22, 2021
    Inventors: Jason Hupp, Mark Johnson, Bob Eckles, Douglas Lynch