Patents by Inventor Jason J. Lee
Jason J. Lee has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240126220Abstract: A building system including one or more memory devices configured to store instructions that, when executed on one or more processors, cause the one or more processors to collect building device data of a building device, generate a time correlated data stream for a data point, and generate a time correlated reliability data stream for the data point. The building device data includes a plurality of data samples of the data point. The time correlated data stream includes values of the plurality of data samples of the data point. The time correlated reliability data stream includes a plurality of reliability values time correlated to corresponding values of the plurality of data samples of the data point and indicating reliability of the values of the plurality of data samples of the data point.Type: ApplicationFiled: December 20, 2023Publication date: April 18, 2024Applicant: Johnson Controls Tyco IP Holdings LLPInventors: Kirk H. Drees, Donald R. Albinger, Shawn D. Schubert, Karl F. Reichenberger, Daniel M. Curtis, Andrew J. Boettcher, Jason T. Sawyer, Miguel Galvez, Walter Martin, Ryan A. Piaskowski, Vaidhyanathan Venkiteswaran, Clay G. Nesler, Siddharth Goyal, Thomas M. Seneczko, Young M. Lee, Sudhi R. Sinha
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Patent number: 11930621Abstract: Some embodiments include a thermal ground plane comprising a first and second casing with folding and non-folding regions. The thermal ground plane may also include a vapor structure and a mesh. The mesh may be disposed on an interior surface of the second casing and the mesh include a plurality of arteries extending substantially parallel with a length of the thermal ground plane. The folding region of the first casing may have an out-of-plane wavy structure. The valleys and peaks of the out-of-plane wavy structure, for example, may extend across a width of the first active region substantially parallel with a width of the thermal ground plane.Type: GrantFiled: June 18, 2021Date of Patent: March 12, 2024Assignee: Kelvin Thermal Technologies, Inc.Inventors: Ryan J. Lewis, Yung-Cheng Lee, Ali Nematollahisarvestani, Jason W. West, Kyle Wagner
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Patent number: 11927925Abstract: A building system including one or more memory devices configured to store instructions that, when executed on one or more processors, cause the one or more processors to collect building device data of a building device, the building device data comprising a plurality of data samples of a data point and generate a time correlated data stream for the data point, the time correlated data stream comprising values of the plurality of data samples of the data point. The instructions cause the one or more processors to generate a time correlated reliability data stream for the data point, the time correlated reliability data stream comprising a plurality of reliability values indicating reliability of the values of the plurality of data samples of the data point.Type: GrantFiled: November 15, 2019Date of Patent: March 12, 2024Assignee: Johnson Controls Tyco IP Holdings LLPInventors: Kirk H. Drees, Donald R. Albinger, Shawn D. Schubert, Karl F. Reichenberger, Daniel M. Curtis, Andrew J. Boettcher, Jason T. Sawyer, Miguel Galvez, Walter Martin, Ryan A. Piaskowski, Vaidhyanathan Venkiteswaran, Clay G. Nesler, Siddharth Goyal, Thomas M. Seneczko, Young M. Lee, Sudhi R. Sinha
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Publication number: 20240070093Abstract: Apparatuses and techniques for implementing an asymmetric read-write sequence for interconnected dies are described. The asymmetric read-write sequence refers to an asymmetric die-access sequence for read versus write operations. The “asymmetric” term refers to a difference in an order in which data is written to or read from interface and linked dies of the interconnected die architecture. The orders for the read and write operations can be chosen such that a delay associated with transferring data between the interconnected dies occurs as data passes between the interface die and a memory controller. With asymmetric read-write burst sequences, overall timing of the read and write operations of a memory device may be impacted less, if at all, by a timing delay associated with the interconnected die architecture.Type: ApplicationFiled: August 30, 2022Publication date: February 29, 2024Applicant: Micron Technology, Inc.Inventors: Hyun Yoo Lee, Kang-Yong Kim, Jason McBride Brown, Venkatraghavan Bringivijayaraghavan, Vijayakrishna J. Vankayala
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Patent number: 10503945Abstract: A method for glare reduction may be implemented by a graphical code reader. The graphical code reader includes an optic system, a plurality of light sources, and a control system. The control system is configured to determine that glare is present in an image captured by the optic system by identifying reflection from at least one of the plurality of light sources. The control system may take a corrective action to reduce the glare in subsequent images. The control system may be configured to take a first corrective action if a diffraction pattern is present at a periphery of the glare, and take a second corrective action if a diffraction pattern is not present at the periphery of the glare.Type: GrantFiled: February 5, 2019Date of Patent: December 10, 2019Assignee: THE CODE CORPORATIONInventors: Ming Lei, Jason J. Lee, Ryan Hoobler
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Publication number: 20190340401Abstract: A method for glare reduction may be implemented by a graphical code reader. The graphical code reader includes an optic system, a plurality of light sources, and a control system. The control system is configured to determine that glare is present in an image captured by the optic system by identifying reflection from at least one of the plurality of light sources. The control system may take a corrective action to reduce the glare in subsequent images. The control system may be configured to take a first corrective action if a diffraction pattern is present at a periphery of the glare, and take a second corrective action if a diffraction pattern is not present at the periphery of the glare.Type: ApplicationFiled: February 5, 2019Publication date: November 7, 2019Inventors: Ming Lei, Jason J. Lee, Ryan Hoobler
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Patent number: 10449202Abstract: The methods, compositions, and kits of the invention are related to the discovery that lestaurtinib reduces levels and pathway activity of an SPOP substrate. Accordingly, described herein are methods and compositions for the use of lestaurtinib in downregulating one or more SPOP substrates or signaling pathway activities thereof in a subject in need thereof.Type: GrantFiled: July 18, 2017Date of Patent: October 22, 2019Assignee: CELESTRA LIFE SCIENCE LLCInventors: Allen J. Lee, Jason J. Lee, David M. Lu, Ruey-Min Lee
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Publication number: 20180307882Abstract: A method for glare reduction may be implemented by a graphical code reader. The graphical code reader includes an optic system, a plurality of light sources, and a control system. The control system is configured to determine that glare is present in an image captured by the optic system by identifying reflection from at least one of the plurality of light sources. The control system may take a corrective action to reduce the glare in subsequent images. The control system may be configured to take a first corrective action if a diffraction pattern is present at a periphery of the glare, and take a second corrective action if a diffraction pattern is not present at the periphery of the glare.Type: ApplicationFiled: June 25, 2018Publication date: October 25, 2018Inventors: Ming Lei, Jason J. Lee, Ryan Hoobler
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Patent number: 10036960Abstract: A photolithography method includes instructing an optical source to produce a pulsed light beam; scanning the pulsed light beam across a wafer of a lithography exposure apparatus to expose the wafer with the pulsed light beam; during scanning of the pulsed light beam across the wafer, receiving a characteristic of the pulsed light beam at the wafer; receiving a determined value of a physical property of a wafer for a particular pulsed light beam characteristic; and based on the pulsed light beam characteristic that is received during scanning and the received determined value of the physical property, modifying a performance parameter of the pulsed light beam during scanning across the wafer.Type: GrantFiled: June 20, 2017Date of Patent: July 31, 2018Assignee: Cymer, LLCInventors: Ivan Lalovic, Omar Zurita, Gregory Allen Rechtsteiner, Paolo Alagna, Simon Hsieh, Jason J. Lee, Rostislav Rokitski, Rui Jiang
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Patent number: 10007822Abstract: A method for glare reduction may be implemented by a graphical code reader. The graphical code reader includes an optic system, a plurality of light sources, and a control system. The control system is configured to determine that glare is present in an image captured by the optic system by identifying reflection from at least one of the plurality of light sources. The control system may take a corrective action to reduce the glare in subsequent images. The control system may be configured to take a first corrective action if a diffraction pattern is present at a periphery of the glare, and take a second corrective action if a diffraction pattern is not present at the periphery of the glare.Type: GrantFiled: April 17, 2017Date of Patent: June 26, 2018Assignee: The Code CorporationInventors: Ming Lei, Jason J. Lee, Ryan Hoobler
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Publication number: 20180117061Abstract: The methods, compositions, and kits of the invention are related to the discovery that lestaurtinib reduces levels and pathway activity of an SPOP substrate. Accordingly, described herein are methods and compositions for the use of lestaurtinib in downregulating one or more SPOP substrates or signaling pathway activities thereof in a subject in need thereof.Type: ApplicationFiled: July 18, 2017Publication date: May 3, 2018Inventors: Allen J. Lee, Jason J. Lee, David M. Lu, Ruey-Min Lee
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Publication number: 20180011409Abstract: A photolithography method includes instructing an optical source to produce a pulsed light beam; scanning the pulsed light beam across a wafer of a lithography exposure apparatus to expose the wafer with the pulsed light beam; during scanning of the pulsed light beam across the wafer, receiving a characteristic of the pulsed light beam at the wafer; receiving a determined value of a physical property of a wafer for a particular pulsed light beam characteristic; and based on the pulsed light beam characteristic that is received during scanning and the received determined value of the physical property, modifying a performance parameter of the pulsed light beam during scanning across the wafer.Type: ApplicationFiled: June 20, 2017Publication date: January 11, 2018Inventors: Ivan Lalovic, Omar Zurita, Gregory Allen Rechtsteiner, Paolo Alagna, Simon Hsieh, Jason J. Lee, Rostislav Rokitski, Rui Jiang
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Patent number: 9782418Abstract: The methods, compositions, and kits of the invention are related to the discovery that lestaurtinib reduces levels and pathway activity of an SPOP substrate. Accordingly, described herein are methods and compositions for the use of lestaurtinib in downregulating one or more SPOP substrates or signaling pathway activities thereof in a subject in need thereof.Type: GrantFiled: December 3, 2014Date of Patent: October 10, 2017Assignee: Celestra Life Science LLCInventors: Allen J. Lee, Jason J. Lee, David M. Lu, Ruey-Min Lee
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Publication number: 20170220834Abstract: A method for glare reduction may be implemented by a graphical code reader. The graphical code reader includes an optic system, a plurality of light sources, and a control system. The control system is configured to determine that glare is present in an image captured by the optic system by identifying reflection from at least one of the plurality of light sources. The control system may take a corrective action to reduce the glare in subsequent images. The control system may be configured to take a first corrective action if a diffraction pattern is present at a periphery of the glare, and take a second corrective action if a diffraction pattern is not present at the periphery of the glare.Type: ApplicationFiled: April 17, 2017Publication date: August 3, 2017Inventors: Ming Lei, Jason J. Lee, Ryan Hoobler
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Patent number: 9715180Abstract: A photolithography method includes instructing an optical source to produce a pulsed light beam; scanning the pulsed light beam across a wafer of a lithography exposure apparatus to expose the wafer with the pulsed light beam; during scanning of the pulsed light beam across the wafer, receiving a characteristic of the pulsed light beam at the wafer; receiving a determined value of a physical property of a wafer for a particular pulsed light beam characteristic; and based on the pulsed light beam characteristic that is received during scanning and the received determined value of the physical property, modifying a performance parameter of the pulsed light beam during scanning across the wafer.Type: GrantFiled: June 4, 2014Date of Patent: July 25, 2017Assignee: Cymer, LLCInventors: Ivan Lalovic, Omar Zurita, Gregory Allen Rechtsteiner, Paolo Alagna, Simon Hsieh, Jason J. Lee, Rostislav Rokitski, Rui Jiang
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Patent number: 9639727Abstract: A method for glare reduction may be implemented by a graphical code reader. The graphical code reader includes an optic system, a plurality of light sources, and a control system. The control system is configured to determine that glare is present in an image captured by the optic system by identifying reflection from at least one of the plurality of light sources. The control system may take a corrective action to reduce the glare in subsequent images. The control system may be configured to take a first corrective action if a diffraction pattern is present at a periphery of the glare, and take a second corrective action if a diffraction pattern is not present at the periphery of the glare.Type: GrantFiled: May 23, 2016Date of Patent: May 2, 2017Assignee: The Code CorporationInventors: Ming Lei, Jason J. Lee, Ryan Hoobler
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Publication number: 20160303140Abstract: The methods, compositions, and kits of the invention are related to the discovery that lestaurtinib reduces levels and pathway activity of an SPOP substrate. Accordingly, described herein are methods and compositions for the use of lestaurtinib in downregulating one or more SPOP substrates or signaling pathway activities thereof in a subject in need thereof.Type: ApplicationFiled: December 3, 2014Publication date: October 20, 2016Inventors: Allen J. LEE, Jason J LEE, David M LU, Ruey-Min LEE
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Publication number: 20160267305Abstract: A method for glare reduction may be implemented by a graphical code reader. The graphical code reader includes an optic system, a plurality of light sources, and a control system. The control system is configured to determine that glare is present in an image captured by the optic system by identifying reflection from at least one of the plurality of light sources. The control system may take a corrective action to reduce the glare in subsequent images. The control system may be configured to take a first corrective action if a diffraction pattern is present at a periphery of the glare, and take a second corrective action if a diffraction pattern is not present at the periphery of the glare.Type: ApplicationFiled: May 23, 2016Publication date: September 15, 2016Inventors: Ming Lei, Jason J. Lee, Ryan Hoobler
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Publication number: 20150070673Abstract: A photolithography method includes instructing an optical source to produce a pulsed light beam; scanning the pulsed light beam across a wafer of a lithography exposure apparatus to expose the wafer with the pulsed light beam; during scanning of the pulsed light beam across the wafer, receiving a characteristic of the pulsed light beam at the wafer; receiving a determined value of a physical property of a wafer for a particular pulsed light beam characteristic; and based on the pulsed light beam characteristic that is received during scanning and the received determined value of the physical property, modifying a performance parameter of the pulsed light beam during scanning across the wafer.Type: ApplicationFiled: June 4, 2014Publication date: March 12, 2015Inventors: Ivan Lalovic, Omar Zurita, Gregory Allen Rechtsteiner, Paolo Alagna, Simon Hsieh, Jason J. Lee, Rostislav Rokitski, Rui Jiang
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Patent number: 8011583Abstract: Certain exemplary embodiments can provide a method, which can comprise causing a report to be automatically generated. The report can be indicative of a result of a read of a mark. The result can be automatically determined to pass a verification test. The verification test can be performed on an image obtained via an imaging system.Type: GrantFiled: June 27, 2008Date of Patent: September 6, 2011Assignee: Microscan Systems, Inc.Inventors: Ming Lei, Jason J Lee, Richard G. Long