Patents by Inventor Jason J. Lee

Jason J. Lee has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240126220
    Abstract: A building system including one or more memory devices configured to store instructions that, when executed on one or more processors, cause the one or more processors to collect building device data of a building device, generate a time correlated data stream for a data point, and generate a time correlated reliability data stream for the data point. The building device data includes a plurality of data samples of the data point. The time correlated data stream includes values of the plurality of data samples of the data point. The time correlated reliability data stream includes a plurality of reliability values time correlated to corresponding values of the plurality of data samples of the data point and indicating reliability of the values of the plurality of data samples of the data point.
    Type: Application
    Filed: December 20, 2023
    Publication date: April 18, 2024
    Applicant: Johnson Controls Tyco IP Holdings LLP
    Inventors: Kirk H. Drees, Donald R. Albinger, Shawn D. Schubert, Karl F. Reichenberger, Daniel M. Curtis, Andrew J. Boettcher, Jason T. Sawyer, Miguel Galvez, Walter Martin, Ryan A. Piaskowski, Vaidhyanathan Venkiteswaran, Clay G. Nesler, Siddharth Goyal, Thomas M. Seneczko, Young M. Lee, Sudhi R. Sinha
  • Patent number: 11930621
    Abstract: Some embodiments include a thermal ground plane comprising a first and second casing with folding and non-folding regions. The thermal ground plane may also include a vapor structure and a mesh. The mesh may be disposed on an interior surface of the second casing and the mesh include a plurality of arteries extending substantially parallel with a length of the thermal ground plane. The folding region of the first casing may have an out-of-plane wavy structure. The valleys and peaks of the out-of-plane wavy structure, for example, may extend across a width of the first active region substantially parallel with a width of the thermal ground plane.
    Type: Grant
    Filed: June 18, 2021
    Date of Patent: March 12, 2024
    Assignee: Kelvin Thermal Technologies, Inc.
    Inventors: Ryan J. Lewis, Yung-Cheng Lee, Ali Nematollahisarvestani, Jason W. West, Kyle Wagner
  • Patent number: 11927925
    Abstract: A building system including one or more memory devices configured to store instructions that, when executed on one or more processors, cause the one or more processors to collect building device data of a building device, the building device data comprising a plurality of data samples of a data point and generate a time correlated data stream for the data point, the time correlated data stream comprising values of the plurality of data samples of the data point. The instructions cause the one or more processors to generate a time correlated reliability data stream for the data point, the time correlated reliability data stream comprising a plurality of reliability values indicating reliability of the values of the plurality of data samples of the data point.
    Type: Grant
    Filed: November 15, 2019
    Date of Patent: March 12, 2024
    Assignee: Johnson Controls Tyco IP Holdings LLP
    Inventors: Kirk H. Drees, Donald R. Albinger, Shawn D. Schubert, Karl F. Reichenberger, Daniel M. Curtis, Andrew J. Boettcher, Jason T. Sawyer, Miguel Galvez, Walter Martin, Ryan A. Piaskowski, Vaidhyanathan Venkiteswaran, Clay G. Nesler, Siddharth Goyal, Thomas M. Seneczko, Young M. Lee, Sudhi R. Sinha
  • Publication number: 20240070093
    Abstract: Apparatuses and techniques for implementing an asymmetric read-write sequence for interconnected dies are described. The asymmetric read-write sequence refers to an asymmetric die-access sequence for read versus write operations. The “asymmetric” term refers to a difference in an order in which data is written to or read from interface and linked dies of the interconnected die architecture. The orders for the read and write operations can be chosen such that a delay associated with transferring data between the interconnected dies occurs as data passes between the interface die and a memory controller. With asymmetric read-write burst sequences, overall timing of the read and write operations of a memory device may be impacted less, if at all, by a timing delay associated with the interconnected die architecture.
    Type: Application
    Filed: August 30, 2022
    Publication date: February 29, 2024
    Applicant: Micron Technology, Inc.
    Inventors: Hyun Yoo Lee, Kang-Yong Kim, Jason McBride Brown, Venkatraghavan Bringivijayaraghavan, Vijayakrishna J. Vankayala
  • Patent number: 10503945
    Abstract: A method for glare reduction may be implemented by a graphical code reader. The graphical code reader includes an optic system, a plurality of light sources, and a control system. The control system is configured to determine that glare is present in an image captured by the optic system by identifying reflection from at least one of the plurality of light sources. The control system may take a corrective action to reduce the glare in subsequent images. The control system may be configured to take a first corrective action if a diffraction pattern is present at a periphery of the glare, and take a second corrective action if a diffraction pattern is not present at the periphery of the glare.
    Type: Grant
    Filed: February 5, 2019
    Date of Patent: December 10, 2019
    Assignee: THE CODE CORPORATION
    Inventors: Ming Lei, Jason J. Lee, Ryan Hoobler
  • Publication number: 20190340401
    Abstract: A method for glare reduction may be implemented by a graphical code reader. The graphical code reader includes an optic system, a plurality of light sources, and a control system. The control system is configured to determine that glare is present in an image captured by the optic system by identifying reflection from at least one of the plurality of light sources. The control system may take a corrective action to reduce the glare in subsequent images. The control system may be configured to take a first corrective action if a diffraction pattern is present at a periphery of the glare, and take a second corrective action if a diffraction pattern is not present at the periphery of the glare.
    Type: Application
    Filed: February 5, 2019
    Publication date: November 7, 2019
    Inventors: Ming Lei, Jason J. Lee, Ryan Hoobler
  • Patent number: 10449202
    Abstract: The methods, compositions, and kits of the invention are related to the discovery that lestaurtinib reduces levels and pathway activity of an SPOP substrate. Accordingly, described herein are methods and compositions for the use of lestaurtinib in downregulating one or more SPOP substrates or signaling pathway activities thereof in a subject in need thereof.
    Type: Grant
    Filed: July 18, 2017
    Date of Patent: October 22, 2019
    Assignee: CELESTRA LIFE SCIENCE LLC
    Inventors: Allen J. Lee, Jason J. Lee, David M. Lu, Ruey-Min Lee
  • Publication number: 20180307882
    Abstract: A method for glare reduction may be implemented by a graphical code reader. The graphical code reader includes an optic system, a plurality of light sources, and a control system. The control system is configured to determine that glare is present in an image captured by the optic system by identifying reflection from at least one of the plurality of light sources. The control system may take a corrective action to reduce the glare in subsequent images. The control system may be configured to take a first corrective action if a diffraction pattern is present at a periphery of the glare, and take a second corrective action if a diffraction pattern is not present at the periphery of the glare.
    Type: Application
    Filed: June 25, 2018
    Publication date: October 25, 2018
    Inventors: Ming Lei, Jason J. Lee, Ryan Hoobler
  • Patent number: 10036960
    Abstract: A photolithography method includes instructing an optical source to produce a pulsed light beam; scanning the pulsed light beam across a wafer of a lithography exposure apparatus to expose the wafer with the pulsed light beam; during scanning of the pulsed light beam across the wafer, receiving a characteristic of the pulsed light beam at the wafer; receiving a determined value of a physical property of a wafer for a particular pulsed light beam characteristic; and based on the pulsed light beam characteristic that is received during scanning and the received determined value of the physical property, modifying a performance parameter of the pulsed light beam during scanning across the wafer.
    Type: Grant
    Filed: June 20, 2017
    Date of Patent: July 31, 2018
    Assignee: Cymer, LLC
    Inventors: Ivan Lalovic, Omar Zurita, Gregory Allen Rechtsteiner, Paolo Alagna, Simon Hsieh, Jason J. Lee, Rostislav Rokitski, Rui Jiang
  • Patent number: 10007822
    Abstract: A method for glare reduction may be implemented by a graphical code reader. The graphical code reader includes an optic system, a plurality of light sources, and a control system. The control system is configured to determine that glare is present in an image captured by the optic system by identifying reflection from at least one of the plurality of light sources. The control system may take a corrective action to reduce the glare in subsequent images. The control system may be configured to take a first corrective action if a diffraction pattern is present at a periphery of the glare, and take a second corrective action if a diffraction pattern is not present at the periphery of the glare.
    Type: Grant
    Filed: April 17, 2017
    Date of Patent: June 26, 2018
    Assignee: The Code Corporation
    Inventors: Ming Lei, Jason J. Lee, Ryan Hoobler
  • Publication number: 20180117061
    Abstract: The methods, compositions, and kits of the invention are related to the discovery that lestaurtinib reduces levels and pathway activity of an SPOP substrate. Accordingly, described herein are methods and compositions for the use of lestaurtinib in downregulating one or more SPOP substrates or signaling pathway activities thereof in a subject in need thereof.
    Type: Application
    Filed: July 18, 2017
    Publication date: May 3, 2018
    Inventors: Allen J. Lee, Jason J. Lee, David M. Lu, Ruey-Min Lee
  • Publication number: 20180011409
    Abstract: A photolithography method includes instructing an optical source to produce a pulsed light beam; scanning the pulsed light beam across a wafer of a lithography exposure apparatus to expose the wafer with the pulsed light beam; during scanning of the pulsed light beam across the wafer, receiving a characteristic of the pulsed light beam at the wafer; receiving a determined value of a physical property of a wafer for a particular pulsed light beam characteristic; and based on the pulsed light beam characteristic that is received during scanning and the received determined value of the physical property, modifying a performance parameter of the pulsed light beam during scanning across the wafer.
    Type: Application
    Filed: June 20, 2017
    Publication date: January 11, 2018
    Inventors: Ivan Lalovic, Omar Zurita, Gregory Allen Rechtsteiner, Paolo Alagna, Simon Hsieh, Jason J. Lee, Rostislav Rokitski, Rui Jiang
  • Patent number: 9782418
    Abstract: The methods, compositions, and kits of the invention are related to the discovery that lestaurtinib reduces levels and pathway activity of an SPOP substrate. Accordingly, described herein are methods and compositions for the use of lestaurtinib in downregulating one or more SPOP substrates or signaling pathway activities thereof in a subject in need thereof.
    Type: Grant
    Filed: December 3, 2014
    Date of Patent: October 10, 2017
    Assignee: Celestra Life Science LLC
    Inventors: Allen J. Lee, Jason J. Lee, David M. Lu, Ruey-Min Lee
  • Publication number: 20170220834
    Abstract: A method for glare reduction may be implemented by a graphical code reader. The graphical code reader includes an optic system, a plurality of light sources, and a control system. The control system is configured to determine that glare is present in an image captured by the optic system by identifying reflection from at least one of the plurality of light sources. The control system may take a corrective action to reduce the glare in subsequent images. The control system may be configured to take a first corrective action if a diffraction pattern is present at a periphery of the glare, and take a second corrective action if a diffraction pattern is not present at the periphery of the glare.
    Type: Application
    Filed: April 17, 2017
    Publication date: August 3, 2017
    Inventors: Ming Lei, Jason J. Lee, Ryan Hoobler
  • Patent number: 9715180
    Abstract: A photolithography method includes instructing an optical source to produce a pulsed light beam; scanning the pulsed light beam across a wafer of a lithography exposure apparatus to expose the wafer with the pulsed light beam; during scanning of the pulsed light beam across the wafer, receiving a characteristic of the pulsed light beam at the wafer; receiving a determined value of a physical property of a wafer for a particular pulsed light beam characteristic; and based on the pulsed light beam characteristic that is received during scanning and the received determined value of the physical property, modifying a performance parameter of the pulsed light beam during scanning across the wafer.
    Type: Grant
    Filed: June 4, 2014
    Date of Patent: July 25, 2017
    Assignee: Cymer, LLC
    Inventors: Ivan Lalovic, Omar Zurita, Gregory Allen Rechtsteiner, Paolo Alagna, Simon Hsieh, Jason J. Lee, Rostislav Rokitski, Rui Jiang
  • Patent number: 9639727
    Abstract: A method for glare reduction may be implemented by a graphical code reader. The graphical code reader includes an optic system, a plurality of light sources, and a control system. The control system is configured to determine that glare is present in an image captured by the optic system by identifying reflection from at least one of the plurality of light sources. The control system may take a corrective action to reduce the glare in subsequent images. The control system may be configured to take a first corrective action if a diffraction pattern is present at a periphery of the glare, and take a second corrective action if a diffraction pattern is not present at the periphery of the glare.
    Type: Grant
    Filed: May 23, 2016
    Date of Patent: May 2, 2017
    Assignee: The Code Corporation
    Inventors: Ming Lei, Jason J. Lee, Ryan Hoobler
  • Publication number: 20160303140
    Abstract: The methods, compositions, and kits of the invention are related to the discovery that lestaurtinib reduces levels and pathway activity of an SPOP substrate. Accordingly, described herein are methods and compositions for the use of lestaurtinib in downregulating one or more SPOP substrates or signaling pathway activities thereof in a subject in need thereof.
    Type: Application
    Filed: December 3, 2014
    Publication date: October 20, 2016
    Inventors: Allen J. LEE, Jason J LEE, David M LU, Ruey-Min LEE
  • Publication number: 20160267305
    Abstract: A method for glare reduction may be implemented by a graphical code reader. The graphical code reader includes an optic system, a plurality of light sources, and a control system. The control system is configured to determine that glare is present in an image captured by the optic system by identifying reflection from at least one of the plurality of light sources. The control system may take a corrective action to reduce the glare in subsequent images. The control system may be configured to take a first corrective action if a diffraction pattern is present at a periphery of the glare, and take a second corrective action if a diffraction pattern is not present at the periphery of the glare.
    Type: Application
    Filed: May 23, 2016
    Publication date: September 15, 2016
    Inventors: Ming Lei, Jason J. Lee, Ryan Hoobler
  • Publication number: 20150070673
    Abstract: A photolithography method includes instructing an optical source to produce a pulsed light beam; scanning the pulsed light beam across a wafer of a lithography exposure apparatus to expose the wafer with the pulsed light beam; during scanning of the pulsed light beam across the wafer, receiving a characteristic of the pulsed light beam at the wafer; receiving a determined value of a physical property of a wafer for a particular pulsed light beam characteristic; and based on the pulsed light beam characteristic that is received during scanning and the received determined value of the physical property, modifying a performance parameter of the pulsed light beam during scanning across the wafer.
    Type: Application
    Filed: June 4, 2014
    Publication date: March 12, 2015
    Inventors: Ivan Lalovic, Omar Zurita, Gregory Allen Rechtsteiner, Paolo Alagna, Simon Hsieh, Jason J. Lee, Rostislav Rokitski, Rui Jiang
  • Patent number: 8011583
    Abstract: Certain exemplary embodiments can provide a method, which can comprise causing a report to be automatically generated. The report can be indicative of a result of a read of a mark. The result can be automatically determined to pass a verification test. The verification test can be performed on an image obtained via an imaging system.
    Type: Grant
    Filed: June 27, 2008
    Date of Patent: September 6, 2011
    Assignee: Microscan Systems, Inc.
    Inventors: Ming Lei, Jason J Lee, Richard G. Long