Abstract: A method for glare reduction may be implemented by a graphical code reader. The graphical code reader includes an optic system, a plurality of light sources, and a control system. The control system is configured to determine that glare is present in an image captured by the optic system by identifying reflection from at least one of the plurality of light sources. The control system may take a corrective action to reduce the glare in subsequent images. The control system may be configured to take a first corrective action if a diffraction pattern is present at a periphery of the glare, and take a second corrective action if a diffraction pattern is not present at the periphery of the glare.

Abstract: A method for glare reduction may be implemented by a graphical code reader. The graphical code reader includes an optic system, a plurality of light sources, and a control system. The control system is configured to determine that glare is present in an image captured by the optic system by identifying reflection from at least one of the plurality of light sources. The control system may take a corrective action to reduce the glare in subsequent images. The control system may be configured to take a first corrective action if a diffraction pattern is present at a periphery of the glare, and take a second corrective action if a diffraction pattern is not present at the periphery of the glare.

Abstract: The methods, compositions, and kits of the invention are related to the discovery that lestaurtinib reduces levels and pathway activity of an SPOP substrate. Accordingly, described herein are methods and compositions for the use of lestaurtinib in downregulating one or more SPOP substrates or signaling pathway activities thereof in a subject in need thereof.

Abstract: A method for glare reduction may be implemented by a graphical code reader. The graphical code reader includes an optic system, a plurality of light sources, and a control system. The control system is configured to determine that glare is present in an image captured by the optic system by identifying reflection from at least one of the plurality of light sources. The control system may take a corrective action to reduce the glare in subsequent images. The control system may be configured to take a first corrective action if a diffraction pattern is present at a periphery of the glare, and take a second corrective action if a diffraction pattern is not present at the periphery of the glare.

Abstract: A photolithography method includes instructing an optical source to produce a pulsed light beam; scanning the pulsed light beam across a wafer of a lithography exposure apparatus to expose the wafer with the pulsed light beam; during scanning of the pulsed light beam across the wafer, receiving a characteristic of the pulsed light beam at the wafer; receiving a determined value of a physical property of a wafer for a particular pulsed light beam characteristic; and based on the pulsed light beam characteristic that is received during scanning and the received determined value of the physical property, modifying a performance parameter of the pulsed light beam during scanning across the wafer.

Abstract: A method for glare reduction may be implemented by a graphical code reader. The graphical code reader includes an optic system, a plurality of light sources, and a control system. The control system is configured to determine that glare is present in an image captured by the optic system by identifying reflection from at least one of the plurality of light sources. The control system may take a corrective action to reduce the glare in subsequent images. The control system may be configured to take a first corrective action if a diffraction pattern is present at a periphery of the glare, and take a second corrective action if a diffraction pattern is not present at the periphery of the glare.

Abstract: The methods, compositions, and kits of the invention are related to the discovery that lestaurtinib reduces levels and pathway activity of an SPOP substrate. Accordingly, described herein are methods and compositions for the use of lestaurtinib in downregulating one or more SPOP substrates or signaling pathway activities thereof in a subject in need thereof.

Abstract: A photolithography method includes instructing an optical source to produce a pulsed light beam; scanning the pulsed light beam across a wafer of a lithography exposure apparatus to expose the wafer with the pulsed light beam; during scanning of the pulsed light beam across the wafer, receiving a characteristic of the pulsed light beam at the wafer; receiving a determined value of a physical property of a wafer for a particular pulsed light beam characteristic; and based on the pulsed light beam characteristic that is received during scanning and the received determined value of the physical property, modifying a performance parameter of the pulsed light beam during scanning across the wafer.

Abstract: The methods, compositions, and kits of the invention are related to the discovery that lestaurtinib reduces levels and pathway activity of an SPOP substrate. Accordingly, described herein are methods and compositions for the use of lestaurtinib in downregulating one or more SPOP substrates or signaling pathway activities thereof in a subject in need thereof.

Abstract: A method for glare reduction may be implemented by a graphical code reader. The graphical code reader includes an optic system, a plurality of light sources, and a control system. The control system is configured to determine that glare is present in an image captured by the optic system by identifying reflection from at least one of the plurality of light sources. The control system may take a corrective action to reduce the glare in subsequent images. The control system may be configured to take a first corrective action if a diffraction pattern is present at a periphery of the glare, and take a second corrective action if a diffraction pattern is not present at the periphery of the glare.

Abstract: A photolithography method includes instructing an optical source to produce a pulsed light beam; scanning the pulsed light beam across a wafer of a lithography exposure apparatus to expose the wafer with the pulsed light beam; during scanning of the pulsed light beam across the wafer, receiving a characteristic of the pulsed light beam at the wafer; receiving a determined value of a physical property of a wafer for a particular pulsed light beam characteristic; and based on the pulsed light beam characteristic that is received during scanning and the received determined value of the physical property, modifying a performance parameter of the pulsed light beam during scanning across the wafer.

Abstract: A method for glare reduction may be implemented by a graphical code reader. The graphical code reader includes an optic system, a plurality of light sources, and a control system. The control system is configured to determine that glare is present in an image captured by the optic system by identifying reflection from at least one of the plurality of light sources. The control system may take a corrective action to reduce the glare in subsequent images. The control system may be configured to take a first corrective action if a diffraction pattern is present at a periphery of the glare, and take a second corrective action if a diffraction pattern is not present at the periphery of the glare.

Abstract: The methods, compositions, and kits of the invention are related to the discovery that lestaurtinib reduces levels and pathway activity of an SPOP substrate. Accordingly, described herein are methods and compositions for the use of lestaurtinib in downregulating one or more SPOP substrates or signaling pathway activities thereof in a subject in need thereof.

Abstract: A method for glare reduction may be implemented by a graphical code reader. The graphical code reader includes an optic system, a plurality of light sources, and a control system. The control system is configured to determine that glare is present in an image captured by the optic system by identifying reflection from at least one of the plurality of light sources. The control system may take a corrective action to reduce the glare in subsequent images. The control system may be configured to take a first corrective action if a diffraction pattern is present at a periphery of the glare, and take a second corrective action if a diffraction pattern is not present at the periphery of the glare.

Abstract: A photolithography method includes instructing an optical source to produce a pulsed light beam; scanning the pulsed light beam across a wafer of a lithography exposure apparatus to expose the wafer with the pulsed light beam; during scanning of the pulsed light beam across the wafer, receiving a characteristic of the pulsed light beam at the wafer; receiving a determined value of a physical property of a wafer for a particular pulsed light beam characteristic; and based on the pulsed light beam characteristic that is received during scanning and the received determined value of the physical property, modifying a performance parameter of the pulsed light beam during scanning across the wafer.

Abstract: Certain exemplary embodiments can provide a method, which can comprise causing a report to be automatically generated. The report can be indicative of a result of a read of a mark. The result can be automatically determined to pass a verification test. The verification test can be performed on an image obtained via an imaging system.

Abstract: Certain exemplary embodiments can provide a method, which can comprise causing a report to be automatically generated. The report can be indicative of a result of a read of a mark. The result can be automatically determined to pass a verification test. The verification test can be performed on an image obtained via an imaging system.

Abstract: A hand-held imager which is capable of reading both linear and two dimensional symbologies, which can perform focusing and illuminating steps quickly and accurately so as to eliminate variation in the position of the imager relative to the code becoming a negative factor, in which can operate in environment where the imager is anywhere from 1.5 inches to 16 inches from the code. The imager includes an imaging system having a focusing system, an illumination system, and a two-dimensional photodetector which forms an image of the coded symbology. After achieving targeting of the coded symbology, the scanning system adjusts the focus between multiple different focuses, and utilizes a portion of the two-dimensional photodetector to determine the optimum focus. Upon the determination of optimum focus, the focusing system is returned to the focusing configuration established in the initial focusing step, and an image is created using the entire two-dimensional photodetector.

Abstract: SMT Serial ATA signal connectors mounted to printed circuit boards are protected from excessive stress applied by a mating signal connector, such as during connection and disconnection of a mating signal connector cable or by forces applied to a connected cable, with a protective housing that fits as a separate piece to the mounted signal connector to align an opening that allows connection of the mating cable connector to the mounting tongue of the mounted signal connector. The inner surface walls of the protective housing absorb forces applied at the mating signal connector to reduce the risk of breakage of the mating tongue or of the mounting of the signal connector to the printed circuit board, such as mounting only by solder of the electrical connections or mounting with board locks.

Abstract: A hand-held imager which is capable of reading both linear and two dimensional symbologies, which can perform focusing and illuminating steps quickly and accurately so as to eliminate variation in the position of the imager relative to the code becoming a negative factor. The imager includes an imaging system having a focusing system, an illumination system, and a two-dimensional photodetector which forms an image of the coded symbology. After achieving targeting of the coded symbology, the scanning system adjusts the focus and illumination between multiple different focuses, and utilizes a portion of the two-dimensional photodetector to determine the optimum focus and illumination. Upon the determination of optimum focus and illumination, and an image is created using the entire two-dimensional photodetector. Predefined multiple sets of illuminating parameters intensity, exposure and gain can be used to determine the proper focus and illumination.