Abstract: Systems and methods are provided for generating microscale structures and/or nanoscale structures, surface profiles, and surface chemistries on medical devices. Embodiments disclosed herein utilize exposure of pulsed laser radiation on to a surface of a material by a pulsed laser. The pulsed laser according to embodiments disclosed herein is configured to emit at least one laser pulse toward the surface and thereby modify the profile of the surface in order to selectively promote or inhibit bioactivity and medical functionality of the material. By selectively promoting or inhibiting bioactivity of the material, enhanced biointegration at a cellular level may be achieved. For example, modifying the surface profile and/or surface chemistry of a first substrate material can improve adhesive and/or chemical bonding of the first material to a bioactive second coating material.

Abstract: A embodiment of the invention includes providing a system and method in accordance with an embodiment of the invention including processing a target surface of interest to adjust interfacial material characteristics such as increasing surface area and/or chemical interaction properties via laser texturizing such as via increasing porosity. An embodiment can include an ultrashort pulse laser (USPL), wherein laser pulses are of a duration of femtoseconds, and adapting the USPL's laser energy output irradiance to athermally convert the target surface of interest's material into a plasma state for re-deposition on the target surface; applying the exemplary embodiment's laser beam energy in a raster pattern across the target surface, wherein the USPL is adapted to nano-structure or texturize the target surface to produce a region having a surface covered by texturized structures that can include nano structures increasing adhesion or chemical reaction properties of the target surface.

Abstract: Embodiments disclosed herein generally relate to modifying a material's surface chemistry and surface profile using a pulsed laser. In embodiments, a system comprises: a material, the material including a surface portion having a surface chemistry; an enclosure, the enclosure containing a gaseous mixture having a non-atmospheric composition; and a pulsed laser configured to emit at least one laser pulse, the at least one laser pulse being directed to pass through the gaseous mixture onto the surface portion thereby modifying the surface chemistry of the surface portion.

Abstract: Embodiments disclosed herein generally relate to modifying a material's surface chemistry and surface profile using a pulsed laser. In embodiments, a system comprises: a material, the material including a surface portion having a surface chemistry; an enclosure, the enclosure containing a gaseous mixture having a non-atmospheric composition; and a pulsed laser configured to emit at least one laser pulse, the at least one laser pulse being directed to pass through the gaseous mixture onto the surface portion thereby modifying the surface chemistry of the surface portion.

Abstract: A embodiment of the invention includes providing a system and method in accordance with an embodiment of the invention including processing a target surface of interest to adjust interfacial material characteristics such as increasing surface area and/or chemical interaction properties via laser texturizing such as via increasing porosity. An embodiment can include an ultrashort pulse laser (USPL), wherein laser pulses are of a duration of femtoseconds, and adapting the USPL's laser energy output irradiance to athermally convert the target surface of interest's material into a plasma state for re-deposition on the target surface; applying the exemplary embodiment's laser beam energy in a raster pattern across the target surface, wherein the USPL is adapted to nano-structure or texturize the target surface to produce a region having a surface covered by texturized structures that can include nano structures increasing adhesion or chemical reaction properties of the target surface.