Patents by Inventor Jason Michael Neidrich
Jason Michael Neidrich has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
-
Patent number: 8253844Abstract: A system and method for exposing different parts of a single field of view for various and differing lengths of time while capturing an image is provided. For astrophotography, unwanted light pollution or over-saturation bleeding from nearby or obtrusive stars may be greatly reduced or eliminated while still capturing the image of the nearby brighter star in the same field of view. Also, a system and method for real-time contrast control while capturing an image to optimize signal-to-noise ratio for various parts of the captured image, is provided. An embodiment of the present invention provides such techniques by using spatial light modulator devices, such as a digital micro-mirror device, to controllably mask different portions of light from an image that expose film or a charge-coupled device. A system and method for a way to use a spatial light modulator device as an active and controllable mask for photolithography, is provided.Type: GrantFiled: August 9, 2010Date of Patent: August 28, 2012Assignee: Texas Instruments IncorporatedInventor: Jason Michael Neidrich
-
Patent number: 8153353Abstract: A method and a material for creating an antireflective coating on an integrated circuit. A preferred embodiment comprises applying a dark polymer material on a reflective surface, curing the dark polymer material, and roughening a top surface of the dark polymer material. The roughening can be achieved by ashing the dark polymer material in an ash chamber. The dark polymer material, preferably a black matrix resin or a polyimide black matrix resin, when ashed in an oxygen rich atmosphere for a short period of time, forms a surface that is capable of absorbing light as well as randomly refracting light it does not absorb. A protective cap layer may be formed on top of the ashed dark polymer material to provide protection for the dark polymer material.Type: GrantFiled: October 8, 2009Date of Patent: April 10, 2012Assignee: Texas Instruments IncorporatedInventor: Jason Michael Neidrich
-
Publication number: 20100295984Abstract: A system and method for exposing different parts of a single field of view for various and differing lengths of time while capturing an image is provided. For astrophotography, unwanted light pollution or over-saturation bleeding from nearby or obtrusive stars may be greatly reduced or eliminated while still capturing the image of the nearby brighter star in the same field of view. Also, a system and method for real-time contrast control while capturing an image to optimize signal-to-noise ratio for various parts of the captured image, is provided. An embodiment of the present invention provides such techniques by using spatial light modulator devices, such as a digital micro-mirror device, to controllably mask different portions of light from an image that expose film or a charge-coupled device. A system and method for a way to use a spatial light modulator device as an active and controllable mask for photolithography, is provided.Type: ApplicationFiled: August 9, 2010Publication date: November 25, 2010Applicant: TEXAS INSTRUMENTS INCORPORATEDInventor: Jason Michael Neidrich
-
Publication number: 20100025715Abstract: A method and a material for creating an antireflective coating on an integrated circuit. A preferred embodiment comprises applying a dark polymer material on a reflective surface, curing the dark polymer material, and roughening a top surface of the dark polymer material. The roughening can be achieved by ashing the dark polymer material in an ash chamber. The dark polymer material, preferably a black matrix resin or a polyimide black matrix resin, when ashed in an oxygen rich atmosphere for a short period of time, forms a surface that is capable of absorbing light as well as randomly refracting light it does not absorb. A protective cap layer may be formed on top of the ashed dark polymer material to provide protection for the dark polymer material.Type: ApplicationFiled: October 8, 2009Publication date: February 4, 2010Applicant: TEXAS INSTRUMENTS INCORPORATEDInventor: Jason Michael Neidrich
-
Patent number: 7601486Abstract: A method and a material for creating an antireflective coating on an integrated circuit. A preferred embodiment comprises applying a dark polymer material on a reflective surface, curing the dark polymer material, and roughening a top surface of the dark polymer material. The roughening can be achieved by ashing the dark polymer material in an ash chamber. The dark polymer material, preferably a black matrix resin or a polyimide black matrix resin, when ashed in an oxygen rich atmosphere for a short period of time, forms a surface that is capable of absorbing light as well as randomly refracting light it does not absorb. A protective cap layer may be formed on top of the ashed dark polymer material to provide protection for the dark polymer material.Type: GrantFiled: December 15, 2005Date of Patent: October 13, 2009Assignee: Texas Instruments IncorporatedInventor: Jason Michael Neidrich
-
Patent number: 7449693Abstract: System and method for detecting and imaging radiation. A preferred embodiment comprises a substrate with electronic circuitry to detect changes in a transduction signal, an intermediate conductive layer disposed above and electrically connected to the electronic circuitry, and a lower separation layer with a high coefficient of thermal resistance that partially separates the intermediate conductive layer from the electronic circuitry. The preferred embodiment also includes a top layer disposed above the intermediate conductive layer and an absorptive layer overlying the top layer, with the absorptive layer being electrically connected to the intermediate conductive layer. The absorptive layer produces a transduction signal that is proportional to an amount of radiation incident on the absorptive layer. The vertical fabrication of the radiation sensor allows for sensor arrays with a good fill factor, permitting the creation of sensor arrays with high resolution while maintaining low costs.Type: GrantFiled: June 12, 2006Date of Patent: November 11, 2008Assignee: Texas Instruments IncorporatedInventors: Patrick Ian Oden, Jason Michael Neidrich
-
Publication number: 20070284531Abstract: System and method for detecting and imaging radiation. A preferred embodiment comprises a substrate with electronic circuitry to detect changes in a transduction signal, an intermediate conductive layer disposed above and electrically connected to the electronic circuitry, and a lower separation layer with a high coefficient of thermal resistance that partially separates the intermediate conductive layer from the electronic circuitry. The preferred embodiment also includes a top layer disposed above the intermediate conductive layer and an absorptive layer overlying the top layer, with the absorptive layer being electrically connected to the intermediate conductive layer. The absorptive layer produces a transduction signal that is proportional to an amount of radiation incident on the absorptive layer. The vertical fabrication of the radiation sensor allows for sensor arrays with a good fill factor, permitting the creation of sensor arrays with high resolution while maintaining low costs.Type: ApplicationFiled: June 12, 2006Publication date: December 13, 2007Inventors: Patrick Ian Oden, Jason Michael Neidrich
-
Patent number: 7158180Abstract: A system and method for exposing different parts of a single field of view for various and differing lengths of time while capturing an image is provided. For astrophotography, unwanted light pollution or over-saturation bleeding from nearby or obtrusive stars may be greatly reduced or eliminated while still capturing the image of the nearby brighter star in the same field of view. Also, a system and method for real-time contrast control while capturing an image to optimize signal-to-noise ratio for various parts of the captured image, is provided. An embodiment of the present invention provides such techniques by using spatial light modulator devices, such as a digital micro-mirror device, to controllably mask different portions of light from an image that expose film or a charge-coupled device. A system and method for a way to use a spatial light modulator device as an active and controllable mask for photolithography, is provided.Type: GrantFiled: December 31, 2001Date of Patent: January 2, 2007Assignee: Texas Instruments IncorporatedInventor: Jason Michael Neidrich
-
Publication number: 20030122955Abstract: A system and method for exposing different parts of a single field of view for various and differing lengths of time while capturing an image is provided. For astrophotography, unwanted light pollution or over-saturation bleeding from nearby or obtrusive stars may be greatly reduced or eliminated while still capturing the image of the nearby brighter star in the same field of view. Also, a system and method for real-time contrast control while capturing an image to optimize signal-to-noise ratio for various parts of the captured image, is provided. An embodiment of the present invention provides such techniques by using spatial light modulator devices, such as a digital micro-mirror device, to controllably mask different portions of light from an image that expose film or a charge-coupled device. A system and method for a way to use a spatial light modulator device as an active and controllable mask for photolithography, is provided.Type: ApplicationFiled: December 31, 2001Publication date: July 3, 2003Inventor: Jason Michael Neidrich