Patents by Inventor Jason R. Dwyer

Jason R. Dwyer has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20230384261
    Abstract: Disclosed herein is the fabrication of a photo-regulated nanopore by covalently linking a photoswitch to the interior of a silicon-based membrane and related methods of translocating an analyte and distinguishing molecule types through such a nanopore.
    Type: Application
    Filed: March 14, 2023
    Publication date: November 30, 2023
    Inventors: Jason R Dwyer, James Hagan, Grace G.D. Han, Alejandra Gonzalez
  • Patent number: 10519035
    Abstract: The invention provides a method to form and functionalize monolayers on a silicon-rich silicon nitride surface or a silicon surface formed by a nanopore fabrication method known as dielectric breakdown. Thermal, photochemical and radical processing can be used to hydrosilylate nascent silicon and silicon nitride surfaces with various reagents. The conventional need for hydrofluoric acid etching prior to coupling functional groups to the surfaces is thereby completely avoided.
    Type: Grant
    Filed: February 20, 2018
    Date of Patent: December 31, 2019
    Assignee: Rhode Island Council On Postsecondary Education
    Inventors: Jason R. Dwyer, Y. M. Nuwan D. Y. Bandara, Buddini Iroshika Karawdeniya, Julie C. Whelan