Abstract: Improved high density, hard tip arrays for use in patterning are provided. An article comprises a handle chip; and a silicon nitride membrane bonded to at least a portion of the handle chip. The silicon nitride membrane comprises an array of a plurality of silicon nitride tips extending directly from a surface of the silicon nitride membrane. Another article comprises an elastomeric backing member; and an array of tips disposed on the elastomeric backing member. The tips of the array comprise a refractory material. Methods of making such articles are also provided.

Abstract: Improved actuated probes suitable for scanning probe lithography or microscopy, and especially direct-write nanolithography and method of fabrication thereof. In one embodiment, thermomechanically actuated cantilevers with oxide-sharpened microcast tips are inexpensively fabricated by a process that comprises low-temperature wafer bonding, such as (gold) thermocompressive bonding, eutectic or adhesive bonding. Also provided is a flexcircuit that electrically interconnects the actuated probes to external circuitry and mechanically couples them to the instrument actuator. An improved scanning probe lithography instrument, hardware and software, can be built around the actuated cantilevers and the flexcircuit. Finally, provided is an improved microfluidic circuit to deliver chemical compounds to the tips of (actuated) probes and a fabrication method for tall, high-aspect-ratio tips.

Abstract: An apparatus for leveling an array of microscopic pens with respect to a substrate surface is provided. The apparatus includes an array of microscopic pens; a substrate having a substrate surface; a controllable arm comprising a spherical ball on an end thereof; a force sensor configured to measure a force exerted on the array or the substrate surface at each of the plurality of positions; one or more actuators configured to drive the array and/or the substrate to vary a relative distance and a relative tilting between the array and the substrate surface; and a controller configured to determine a planar offset of the array with respect to the substrate and initiate a leveling of the array with respect to the substrate based on the planar offset. Methods are also provided.

Abstract: An apparatus for leveling an array of microscopic pens relative to a substrate surface or measuring a relative tilting therebetween includes an actuator configured to drive one of the array or the substrate to vary a distance therebetween, one or more force sensors configured to measure a force between the array and the surface, and a device configured calculate a force curve parameter of the force over the distance or time. The apparatus is configured to level the array relative to the surface by varying a relative tilting between the array and the substrate surface based on the force curve parameter or to measure the relative tilting based on the force curve parameter. Methods and software also are provided.

Abstract: Devices for leveling an object for patterning a substrate surface, including an array of scanning probe tips, are provided. A device may include a support structure adapted to mount an object, the object having a plurality of protrusions adapted to form a pattern on a surface of a substrate upon contact of the object to the surface; and at least one flexible joint assembly mounted to the support structure and adapted to allow the object to achieve a parallel orientation with respect to the surface upon contact of the object to the surface. Also provided are apparatuses and kits incorporating the devices and methods of making and using the devices and apparatuses.

Abstract: Patterning and direct writing of nanoparticle inks formulated to provide conductive lines upon annealing. Patterning methods include stamp and tip based methods including microcontact printing and DPN printing. Ink viscosity, metal content, and density can be controlled to provide good results. Low temperature of annealing can be used to generate volume resistivities comparable to bulk resistivity. Long lines can be drawn. Addressable patterning can be achieved.