Abstract: There are disclosed certain substituted pyrazine-2-carboxamides of Formula (I), and pharmaceutically acceptable salts thereof, together with compositions containing them and their use in therapy. The compounds are inhibitors of hematopoietic progenitor kinase 1 (HPK1) and are thereby particularly useful in the treatment or prophylaxis of cancer.

Abstract: The specification generally relates to compounds of Formula (I): or a stereoisomer or pharmaceutically salt thereof, wherein G, Ga, Gb, X, Y, R1, R2, Q1, Q2, and Q3 have any of the meanings defined herein, together with compositions containing them and their use in therapy. The compounds are inhibitors of the polymerase, DNA polymerase theta (Pol? or POLQ), and are thereby particularly useful in the treatment of cancer.

Abstract: There are disclosed certain substituted pyrazine-2-carboxamides of Formula (I), and pharmaceutically acceptable salts thereof, together with compositions containing them and their use in therapy. The compounds are inhibitors of hematopoietic progenitor kinase 1 (HPK1) and are thereby particularly useful in the treatment or prophylaxis of cancer.

Abstract: The specification generally relates to compounds of Formula (I): or a stereoisomer or pharmaceutically salt thereof, wherein G, Ga, Gb, X, Y, R1, R2, Q1, Q2, and Q3 have any of the meanings defined herein, together with compositions containing them and their use in therapy. The compounds are inhibitors of the polymerase, DNA polymerase theta (Pol? or POLQ), and are thereby particularly useful in the treatment of cancer.

Abstract: Disclosed are compounds of formula (I), or pharmaceutically acceptable salts thereof, pharmaceutical compositions comprising the same, and methods of treating cancer or a respiratory inflammatory disease using the same: wherein R1 is selected from hydrogen, —CH3 and —(C?O)CH(R1a)NH2; R1a is C1-C4 alkyl; Y is —(CH2)n— or —(C?O)—; n is an integer selected from 1 and 2; R2 is selected from hydrogen, —CH3 and —(C?X)R4 and R3 is hydrogen or —CH3; or R2 and R3, together with the nitrogen to which they are attached, are linked to form a 6-membered heterocyclic ring; X is NH or O; R4 is —CH3 or —[CH(R4a)]mNH2; m is an integer selected from 0 or 1; and R4a is hydrogen or C1-C6 alkyl.

Abstract: A metrology system for substrate processing includes an optical metrology station including a plurality of optical sensors to measure spectra from a plurality of measurement locations on a substrate. A plurality of fiber cables are connected to the plurality of optical sensors. A spectrometer is selectively connected to the plurality of fiber cables. A mass metrology station measures at least one of a mass or mass change of the substrate. A controller includes a modelling module to generate thickness values at the plurality of measurement locations based on the spectra from the plurality of measurement locations and a learned model. A spatial modelling module generates a spatial thickness distribution model for the substrate based on the thickness values at the plurality of measurement locations from the modelling module and the at least one of the mass or the mass change from the mass metrology station.

Abstract: A metrology system for substrate processing includes an optical metrology station including a plurality of optical sensors to measure spectra from a plurality of measurement locations on a substrate. A plurality of fiber cables are connected to the plurality of optical sensors. A spectrometer is selectively connected to the plurality of fiber cables. A mass metrology station measures at least one of a mass or mass change of the substrate. A controller includes a modelling module to generate thickness values at the plurality of measurement locations based on the spectra from the plurality of measurement locations and a learned model. A spatial modelling module generates a spatial thickness distribution model for the substrate based on the thickness values at the plurality of measurement locations from the modelling module and the at least one of the mass or the mass change from the mass metrology station.

Abstract: A mounting assembly includes a chassis for receiving electronic components. First and second wedge members are coupled to a base panel of the chassis and each include an angled surface oriented towards a common direction. A mounting plate is adapted to be secured to a supporting surface, including first and second wedge receiving elements including complementary angled surfaces adapted to receive to the angled surfaces of the first and second wedge members. An intermediate member couples the first and second wedge receiving elements to maintain a fixed distance therebetween, and clamping structure is accessible from at least one face panel. The clamping structure is adapted to move the first and second wedge members towards the respective first and second wedge receiving elements such that engagement of the respective angled surfaces with the respective complementary angled surfaces applies a clamping force to the first and second wedge members.