Patents by Inventor Jason SHIEN

Jason SHIEN has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • OPTIMIZATION OF SOURCE AND BANDWIDTH FOR NEW AND EXISTING PATTERNING DEVICES
    Publication number: 20180356734
    Abstract: A method to improve a lithographic process of imaging a portion of a design layout onto a substrate using a lithographic apparatus, the method including: computing a multi-variable cost function, the multi-variable cost function being a function a plurality of design variables that represent characteristics of the lithographic process; and reconfiguring one or more of the characteristics of the lithographic process by adjusting one or more of the design variables until a certain termination condition is satisfied; wherein a bandwidth of a radiation source of the lithographic apparatus is allowed to change during the reconfiguration.
    Type: Application
    Filed: November 30, 2016
    Publication date: December 13, 2018
    Applicants: CYMER, LLC, ASML NETHERLANDS B.V.
    Inventors: Willard Earl CONLEY, Wei-An HSIEH, Tsann-Bim CHIOU, Jason SHIEN