Patents by Inventor Jason Shulman

Jason Shulman has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240122840
    Abstract: Personal care formulation is provided having multistage polymer, comprising: acrylate rich stage comprising: (a) structural units of monomer selected from C1-22 alkyl (meth)acrylates and structural units of first carbosiloxane monomer of formula (I); and (b) carbosiloxane rich stage, comprising: structural units of second carbosiloxane monomer of formula (I); wherein a is 0 to 3; wherein d is 0 or 1; wherein R1 is selected from hydrogen, C1-10 alkyl group and aryl group; wherein R2 is selected from hydrogen and C1-10 alkyl group; wherein R8 is —O—Si(CH3)3 group; wherein Y is selected from formula (II), (III) and (IV); wherein R4 and R6 are selected from hydrogen and methyl group; wherein R3 and R5 are C1-10 alkylene group; wherein R7 is C1-10 alkyl group; wherein b is 0 to 4 and wherein c is 0 or 1; and wherein the first and second carbosiloxane monomer of formula (I) are same or different.
    Type: Application
    Filed: November 18, 2020
    Publication date: April 18, 2024
    Inventors: Tian Lan, Fanwen Zeng, Xiaodong Lu, Inna Shulman, Michaeleen Pacholski, Isabelle Van Reeth, Helene Dihang, Tanvi S. Ratani, Jason Fisk, Tzu-Chi Kuo, Rachael M. Smith
  • Publication number: 20240124630
    Abstract: A multistage polymer is provided, having: acrylate rich stage comprising: (a) structural units of monomer selected from C1-22 alkyl (meth)acrylates and structural units of first carbosiloxane monomer of formula (I); and (b) carbosiloxane rich stage, comprising: structural units of second carbosiloxane monomer of formula (I); wherein a is 0 to 3; wherein d is 0 or 1; wherein R1 is selected from hydrogen, C1-10 alkyl group and aryl group; wherein R2 is selected from hydrogen and C1-10 alkyl group; wherein R8 is —O—Si(CH3)3 group; wherein Y is selected from formula (II), (III) and (IV); wherein R4 and R6 are selected from hydrogen and methyl group; wherein R3 and R5 are a C1-10 alkylene group; wherein R7 is C1-10 alkyl group; wherein b is 0 to 4 and wherein c is 0 or 1; and wherein the first and second carbosiloxane monomer of formula (I) are same or different.
    Type: Application
    Filed: November 18, 2020
    Publication date: April 18, 2024
    Inventors: Tian Lan, Fanwen Zeng, Xiaodong Lu, Inna Shulman, Tanvi S. Ratani, Jason Fisk, Tzu-Chi Kuo
  • Patent number: 7611969
    Abstract: A negative dielectric is induced by the application of a dc bias-electric field in aggregates of oxide nano-particles whose surfaces have been specially treated. The magnitude of the dielectric constant and the frequency where the negative dielectric constant occurs can be adjusted. Such material systems have profound implications in novel devices as well as in science development, e.g. unusual wave propagation, secured communication and ultra-high temperature superconductivity.
    Type: Grant
    Filed: February 17, 2006
    Date of Patent: November 3, 2009
    Assignee: University of Houston
    Inventors: Ching-Wu Chu, Feng Chen, Yu-Yi Xue, Jason Shulman, Stephen Tsui
  • Publication number: 20070109460
    Abstract: A negative dielectric is induced by the application of a dc bias-electric field in aggregates of oxide nano-particles whose surfaces have been specially treated. The magnitude of the dielectric constant and the frequency where the negative dielectric constant occurs can be adjusted. Such material systems have profound implications in novel devices as well as in science development, e.g. unusual wave propagation, secured communication and ultra-high temperature superconductivity.
    Type: Application
    Filed: February 17, 2006
    Publication date: May 17, 2007
    Inventors: Ching-Wu Chu, Feng Chen, Yu-Yi Xue, Jason Shulman, Stephen Tsui