Patents by Inventor Jason Stowers

Jason Stowers has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Photoresist compositions and methods for fabricating semiconductor devices using the same
    Patent number: 11599021
    Abstract: Provided herein are photoresist compositions and methods for fabricating semiconductor devices using the same. A photoresist composition may include an organometallic material, a fluorine-containing material, and an organic solvent.
    Type: Grant
    Filed: May 4, 2022
    Date of Patent: March 7, 2023
    Assignees: Samsung Electronics Co., Ltd., Inpria Corporation
    Inventors: Chawon Koh, Tsunehiro Nishi, Brian Cardineau, Sangyoon Woo, Jason Stowers, Soo Young Choi
  • PHOTORESIST COMPOSITIONS AND METHODS FOR FABRICATING SEMICONDUCTOR DEVICES USING THE SAME
    Publication number: 20220260906
    Abstract: Provided herein are photoresist compositions and methods for fabricating semiconductor devices using the same. A photoresist composition may include an organometallic material, a fluorine-containing material, and an organic solvent.
    Type: Application
    Filed: May 4, 2022
    Publication date: August 18, 2022
    Inventors: CHAWON KOH, TSUNEHIRO NISHI, BRIAN CARDINEAU, SANGYOON WOO, JASON STOWERS, SOO YOUNG CHOI
  • Photoresist compositions and methods for fabricating semiconductor devices using the same
    Patent number: 11327398
    Abstract: Provided herein are photoresist compositions and methods for fabricating semiconductor devices using the same. A photoresist composition may include an organometallic material, a fluorine-containing material, and an organic solvent.
    Type: Grant
    Filed: April 30, 2019
    Date of Patent: May 10, 2022
    Assignees: Samsung Electronics Co., Ltd., Inpria Corporation
    Inventors: Chawon Koh, Tsunehiro Nishi, Brian Cardineau, Sangyoon Woo, Jason Stowers, Soo Young Choi
  • PHOTORESIST COMPOSITIONS AND METHODS FOR FABRICATING SEMICONDUCTOR DEVICES USING THE SAME
    Publication number: 20200348594
    Abstract: Provided herein are photoresist compositions and methods for fabricating semiconductor devices using the same. A photoresist composition may include an organometallic material, a fluorine-containing material, and an organic solvent.
    Type: Application
    Filed: April 30, 2019
    Publication date: November 5, 2020
    Inventors: CHAWON KOH, TSUNEHIRO NISHI, Brian Cardineau, Sangyoon Woo, Jason Stowers, SOO YOUNG CHOI