Patents by Inventor Jason T. Bloking

Jason T. Bloking has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8852807
    Abstract: A compound comprising a composition Ax(M?1?aM?a)y(XD4)z, Ax(M?1?aM?a)y(DXD4)z, or Ax(M?1?aM?a)y(X2D7)z, (A1?aM?a)xM?y(XD4)z, (A1?aM?a)xM?y(DXD4)z, or (A1?aM?a)xM?y(X2D7)z. In the compound, A is at least one of an alkali metal and hydrogen, M? is a first-row transition metal, X is at least one of phosphorus, sulfur, arsenic, molybdenum, and tungsten, M? any of a Group IIA, IIIA, IVA, VA, VIA, VIIA, VIIIA, IB, IIB, IIIB, IVB, VB, and VIB metal, D is at least one of oxygen, nitrogen, carbon, or a halogen, 0.0001<a?0.1, and x, y, and z are greater than zero. The compound can be used in an electrochemical device including electrodes and storage batteries.
    Type: Grant
    Filed: February 24, 2012
    Date of Patent: October 7, 2014
    Assignee: Massachusetts Institute of Technology
    Inventors: Yet-Ming Chiang, Sung-Yoon Chung, Jason T. Bloking, Anna M. Andersson
  • Publication number: 20120214071
    Abstract: A compound comprising a composition Ax(M?1?aM?a)y(XD4)z, Ax(M?1?aM?a)y(DXD4)z, or Ax(M?1?aM?a)y(X2D7)z, (A1?aM?a)xM?y(XD4)z, (A1?aM?a)xM?y(DXD4)z, or (A1?aM?a)xM?y(X2D7)z. In the compound, A is at least one of an alkali metal and hydrogen, M? is a first-row transition metal, X is at least one of phosphorus, sulfur, arsenic, molybdenum, and tungsten, M? any of a Group IIA, IIIA, IVA, VA, VIA, VIIA, VIIIA, IB, IIB, IIIB, IVB, VB, and VIB metal, D is at least one of oxygen, nitrogen, carbon, or a halogen, 0.0001<a?0.1, and x, y, and z are greater than zero. The compound can be used in an electrochemical device including electrodes and storage batteries.
    Type: Application
    Filed: February 24, 2012
    Publication date: August 23, 2012
    Applicant: Massachusetts Institute of Technology
    Inventors: Yet-Ming Chiang, Sung-Yoon Chung, Jason T. Bloking, Anna M. Andersson
  • Patent number: 8148013
    Abstract: A compound comprising a composition Ax(M?1-aM?a)y(XD4)z, Ax(M?1-aM?a)y(DXD4)z, or Ax(M?1-aM?a)y(X2D7)z, and have values such that x, plus y(1?a) times a formal valence or valences of M?, plus ya times a formal valence or valence of M?, is equal to z times a formal valence of the XD4, X2D7, or DXD4 group; or a compound comprising a composition (A1-aM?a)xM?y(XD4)z, (A1-aM?a)xM?y(DXD4)z (A1-aM?a)xM?y(X2D7)z and have values such that (1?a)x plus the quantity ax times the formal valence or valences of M? plus y times the formal valence or valences of M? is equal to z times the formal valence of the XD4, X2D7 or DXD4 group. In the compound, A is at least one of an alkali metal and hydrogen, M? is a first-row transition metal, X is at least one of phosphorus, sulfur, arsenic, molybdenum, and tungsten, M? any of a Group IIA, IIIA, IVA, VA, VIA, VIIA, VIIIA, IB, IIB, IIIB, IVB, VB, and VIB metal, D is at least one of oxygen, nitrogen, carbon, or a halogen, 0.0001<a?0.1, and x, y, and z are greater than zero.
    Type: Grant
    Filed: September 17, 2007
    Date of Patent: April 3, 2012
    Assignee: Massachusetts Institute of Technology
    Inventors: Yet-Ming Chiang, Sung-Yoon Chung, Jason T. Bloking, Anna M. Andersson
  • Patent number: 7651587
    Abstract: A substrate processing system has a housing that defines a process chamber, a gas-delivery system, a high-density plasma generating system, a substrate holder, and a controller. The housing includes a sidewall and a dome positioned above the sidewall. The dome has physically separated and noncontiguous pieces. The gas-delivery system introduces e a gas into the process chamber through side nozzles positioned between two of the physically separated and noncontiguous pieces of the dome. The high-density plasma generating system is operatively coupled with the process chamber. The substrate holder is disposed within the process chamber and supports a substrate during substrate processing. The controller controls the gas-delivery system and the high-density plasma generating system.
    Type: Grant
    Filed: August 11, 2005
    Date of Patent: January 26, 2010
    Assignee: Applied Materials, Inc.
    Inventors: Siqing Lu, Qiwei Liang, Canfeng Lai, Robert T. Chen, Jason T. Bloking, Irene Chou, Steven H. Kim, Young S. Lee, Ellie Y. Yieh
  • Publication number: 20090311597
    Abstract: A compound comprising a composition Ax(M?1-aM?a)y(XD4)z, Ax(M?1-aM?a)y(DXD4)z, or Ax(M?1-aM?a)y(X2D7)z, and have values such that x, plus y(1?a) times a formal valence or valences of M?, plus ya times a formal valence or valence of M?, is equal to z times a formal valence of the XD4, X2D7, or DXD4 group; or a compound comprising a composition (A1-aM?a)xM?y(XD4)z, (A1-aM?a)xM?y(DXD4)z (A1-aM?a)xM?y(X2D7)z and have values such that (1?a)x plus the quantity ax times the formal valence or valences of M? plus y times the formal valence or valences of M? is equal to z times the formal valence of the XD4, X2D7 or DXD4 group. In the compound, A is at least one of an alkali metal and hydrogen, M? is a first-row transition metal, X is at least one of phosphorus, sulfur, arsenic, molybdenum, and tungsten, M? any of a Group IIA, IIIA, IVA, VA, VIA, VIIA, VIIIA, IB, IIB, IIIB, IVB, VB, and VIB metal, D is at least one of oxygen, nitrogen, carbon, or a halogen, 0.0001<a?0.1, and x, y, and z are greater than zero.
    Type: Application
    Filed: September 17, 2007
    Publication date: December 17, 2009
    Applicant: Massachusetts Institute of Technology
    Inventors: Yet-Ming Chiang, Sung-Yoon Chung, Jason T. Bloking, Anna M. Andersson
  • Patent number: 7338734
    Abstract: A compound comprising a composition Ax(M?1-aM?a)y(XD4)z, Ax(M?1-aM?a)y(DXD4)z, or Ax(M?1-aM?a)y(X2D7)z, and have values such that x, plus y(1-a) times a formal valence or valences of M?, plus ya times a formal valence or valence of M?, is equal to z times a formal valence of the XD4, X2D7, or DXD4 group; or a compound comprising a composition (A1-aM?a)xM?y(XD4)z, (A1-aM?a)xM?y(DXD4)z(A1-aM?a)xM?y(X2D7)z and have values such that (1-a)x plus the quantity ax times the formal valence or valences of M? plus y times the formal valence or valences of M? is equal to z times the formal valence of the XD4, X2D7 or DXD4 group. In the compound, A is at least one of an alkali metal and hydrogen, M? is a first-row transition metal, X is at least one of phosphorus, sulfur, arsenic, molybdenum, and tungsten, M? any of a Group IIA, IIIA, IVA, VA, VIA, VIIA, VIIIA, IB, IIB, IIIB, IVB, VB, and VIB metal, D is at least one of oxygen, nitrogen, carbon, or a halogen, 0.0001<a?0.1, and x, y, and z are greater than zero.
    Type: Grant
    Filed: December 23, 2002
    Date of Patent: March 4, 2008
    Assignee: Massachusetts Institute of Technology
    Inventors: Yet-Ming Chiang, Sung-Yoon Chung, Jason T. Bloking, Anna M. Andersson
  • Publication number: 20040005265
    Abstract: A compound comprising a composition Ax(M′1-aM″a)y(XD4)z, Ax(M′1-aM″a)y(DXD4)z, or Ax(M′1-aM″a)y(X2D7)z, and have values such that x, plus y(1-a) times a formal valence or valences of M′, plus ya times a formal valence or valence of M″, is equal to z times a formal valence of the XD4, X2D7, or DXD4 group; or a compound comprising a composition (A1-aM″a)xM′y(XD4)z, (A1-aM″a)xM′y(DXD4)z (A1-aM″a)xM′y(X2D7)z and have values such that (1-a)x plus the quantity ax times the formal valence or valences of M″ plus y times the formal valence or valences of M′ is equal to z times the formal valence of the XD4, X2D7 or DXD4 group.
    Type: Application
    Filed: December 23, 2002
    Publication date: January 8, 2004
    Applicant: Massachusetts Institute of Technology
    Inventors: Yet-Ming Chiang, Sung-Yoon Chung, Jason T. Bloking, Anna M. Andersson