Patents by Inventor Jasper Frans Mathijs van Rens

Jasper Frans Mathijs van Rens has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20230335374
    Abstract: Systems and methods of observing a sample using a charged-particle beam apparatus in voltage contrast mode are disclosed. The charged-particle beam apparatus comprises a charged-particle source, an optical source, a charged-particle detector configured to detect charged particles, and a controller having circuitry configured to apply a first signal to cause the optical source to generate the optical pulse, apply a second signal to the charged-particle detector to detect the second plurality of charged particles, and adjust a time delay between the first and the second signals. In some embodiments, the controller having circuitry may be further configured to acquire a plurality of images of a structure, to determine an electrical characteristic of the structure based on the rate of gray level variation of the plurality of images of the structure, and to simulate, using a model, a physical characteristic of the structure based on the determined electrical characteristic.
    Type: Application
    Filed: July 27, 2021
    Publication date: October 19, 2023
    Applicant: ASML Netherlands B.V.
    Inventors: Benoit Herve GAURY, Jun JIANG, Bruno LA FONTAINE, Shakeeb Bin HASAN, Kenichi KANAI, Jasper Frans Mathijs VAN RENS, Cyrus Emil TABERY, Long MA, Oliver Desmond PATTERSON, Jian ZHANG, Chih-Yu JEN, Yixiang WANG
  • Publication number: 20230298852
    Abstract: A method of measuring a delay time of a propagation of a signal in a line in a circuit structure, the method comprises irradiating the line by pulses of a charged particle beam, wherein a pulse repetition frequency of the pulses of the charged particle beam is varied. The method further comprises measuring, for each of the pulse repetition frequencies, a secondary charged particle emission responsive to the irradiating the line by the pulses of the charged particle beam at the respective pulse repetition frequency, and deriving the delay time of the line based on the secondary charged particle emission responsive to the varying of the pulse repetition frequency.
    Type: Application
    Filed: March 10, 2023
    Publication date: September 21, 2023
    Applicant: ASML Netherlands B.V.
    Inventors: Benoit Herve GAURY, Jasper Frans Mathijs VAN RENS
  • Patent number: 11328892
    Abstract: Disclosed herein are radio frequency (RF) cavities and systems including such RF cavities. The RF cavities are characterized as having an insert with at least one sidewall coated with a material to prevent charge build up without affecting RF input power and that is heat and vacuum compatible. One example RF cavity includes a dielectric insert, the dielectric insert having an opening extending from one side of the dielectric insert to another to form a via, and a coating layer disposed on an inner surface of the dielectric insert, the inner surface facing the via, wherein the coating layer has a thickness and a resistivity, the thickness less than a thickness threshold, and the resistivity greater than a resistivity threshold, wherein the thickness and resistivity thresholds are based partly on operating parameters of the RF cavity.
    Type: Grant
    Filed: August 6, 2020
    Date of Patent: May 10, 2022
    Assignee: FEI Company
    Inventors: Erik Rene Kieft, Pleun Dona, Jasper Frans Mathijs van Rens, Wouter Verhoeven, Peter Mutsaers, Jom Luiten, Ond{hacek over (r)}ej Ba{hacek over (c)}o
  • Publication number: 20210043410
    Abstract: Disclosed herein are radio frequency (RF) cavities and systems including such RF cavities. The RF cavities are characterized as having an insert with at least one sidewall coated with a material to prevent charge build up without affecting RF input power and that is heat and vacuum compatible. One example RF cavity includes a dielectric insert, the dielectric insert having an opening extending from one side of the dielectric insert to another to form a via, and a coating layer disposed on an inner surface of the dielectric insert, the inner surface facing the via, wherein the coating layer has a thickness and a resistivity, the thickness less than a thickness threshold, and the resistivity greater than a resistivity threshold, wherein the thickness and resistivity thresholds are based partly on operating parameters of the RF cavity.
    Type: Application
    Filed: August 6, 2020
    Publication date: February 11, 2021
    Applicant: FEI Company
    Inventors: Erik Rene Kieft, Pleun Dona, Jasper Frans Mathijs van Rens, Wouter Verhoeven, Peter Mutsaers, Jom Luiten, Ondrej Baco
  • Patent number: 9984852
    Abstract: An apparatus for performing charged particle spectroscopy, comprising: A source, for producing a pulsed beam of charged particles that propagate along a beam path; A specimen holder, for holding a specimen at an irradiation position in said beam path; A detector arrangement, for performing energy-differentiated detection of charged particles that traverse said specimen, wherein, between said source and said detector arrangement, said beam path successively traverses: An energizing cavity, for applying a time-dependent accelerating field to said beam; A primary drift space; Said irradiation position; A temporal focusing cavity, for converting an energy differential in said beam into a time-of-flight differential; A secondary drift space.
    Type: Grant
    Filed: November 29, 2016
    Date of Patent: May 29, 2018
    Assignee: FEI Company
    Inventors: Otger Jan Luiten, Petrus Henricus Antonius Mutsaers, Jasper Frans Mathijs van Rens, Wouter Verhoeven, Erik René Kieft