Abstract: Aspects of the present disclosure relate to a transfer device, system, and method for transferring an electronic component onto a placement position on a substrate. The transfer device is based on a fluidic process principle in which electronic components are transferred in a transfer liquid. In accordance with an aspect of the present disclosure, the transfer device further includes a plurality of acoustic transducers, and a controller for controlling the plurality of acoustic transducers. The controller is configured to control the plurality of acoustic transducers to create an acoustic trap in the transfer liquid for capturing an electronic component when it is released in the transfer liquid and to subsequently manipulate the position and/orientation of the acoustic trap for the purpose of positioning the electronic component at the placement position on the substrate.

Abstract: Aspects of the present disclosure relate to a system for transporting an electronic component. Further aspects of the present disclosure relate to a method for transporting an electronic component. According to an aspect of the present disclosure a system for transporting an electronic component is provided that includes a carrier for carrying the electronic component, and a transducer system including a plurality of transducers, the transducer system being configured for generating a levitation field in which the carrier levitates. The system also includes an input unit for arranging the electronic component onto the carrier, and an output unit for receiving the electronic component from the carrier. A controller is used for controlling the transducer system to change the levitation field for the purpose of moving the carrier from the input unit to the output unit.

Abstract: The disclosure relates to an apparatus for transferring a semiconductor die from an arrangement of semiconductor dies to a target and to a wafer stage to be used in such an apparatus. The wafer chuck includes a rotationally mounted curved shell on which the arrangement of semiconductor dies can be arranged, and the wafer stage includes a first motor for rotating the curved shell around a rotational axis. The curved configuration allows an improved throughput of the wafer stage. The film frame carrier used with this wafer stage comprises a ring-shaped body with an asymmetric bending stiffness allowing the ring-shaped body to be bent so that the mounting surface of the ring-shaped body changes from having a first shape to a second more concave shape and prevents or limits the ring-shaped body to be bent so that the shape of the mounting surface becomes more convex than the first shape.

Abstract: An apparatus for transferring a semiconductor die from an arrangement dies to a target is provided and relates to a wafer stage, and film frame carrier, and to an assembly including the film frame carrier and arrangement of dies. The wafer chuck includes a rotationally mounted curved shell on which the arrangement of semiconductor dies can be arranged. The wafer stage includes a motor for rotating the curved shell around a rotational axis. The configuration allows improved throughput of the wafer stage. The carrier used with this wafer stage includes a ring-shaped body with an asymmetric bending stiffness allowing the ring-shaped body to be bent so that the mounting surface of the ring-shaped body changes from a first shape to a second more concave shape and prevents or limits the ring-shaped body to be bent so that the mounting surface becomes more convex than the first shape.

Abstract: An optical imaging arrangement includes an optical element and a piezoelectric device. The optical element includes an optical element body carrying an optical surface on a front side of the optical element body. The piezoelectric device includes a first electrode and at least one piezoelectric element. The first electrode is configured to cooperate with the at least one piezoelectric element and at least one second electrode, when the at least one second electrode is located on a rear side of the optical element body and the at least one piezoelectric element is located between the first electrode and the at least one second electrode, the rear side of the optical element body being opposite to the front side of the optical element body. The first electrode is located on the front side of the optical element body, and the at least one piezoelectric element is formed by at least one piezoelectric section of the optical element body.

Abstract: A positioning system to position a structure comprises an actuator and a control unit to control the actuator in response to a position setpoint received by the control unit. The actuator comprises a magnet assembly comprises a magnet configured to provide a magnetic flux, and a coil assembly, wherein the coil assembly and the magnet assembly are movable relative to each other, the coil assembly comprising a coil, an actuation of the coil by a drive current providing for a force between the magnet assembly and the coil assembly. The magnet assembly comprises a further electric conductor, the further electric conductor comprising a non-ferromagnetic electrically conductive material, wherein the further electric conductor is magnetically coupled to the coil of the coil assembly and forms a short circuit path for an inductive electrical current induced in the further electric conductor as a result of an actuator current in the coil.

Abstract: A positioning system to position a structure comprises an actuator and a control unit to control the actuator in response to a position setpoint received by the control unit. The actuator comprises a magnet assembly comprises a magnet configured to provide a magnetic flux, and a coil assembly, wherein the coil assembly and the magnet assembly are movable relative to each other, the coil assembly comprising a coil, an actuation of the coil by a drive current providing for a force between the magnet assembly and the coil assembly. The magnet assembly comprises a further electric conductor, the further electric conductor comprising a non-ferromagnetic electrically conductive material, wherein the further electric conductor is magnetically coupled to the coil of the coil assembly and forms a short circuit path for an inductive electrical current induced in the further electric conductor as a result of an actuator current in the coil.

Abstract: An optical imaging arrangement includes an optical element and a piezoelectric device. The optical element includes an optical element body carrying an optical surface on a front side of the optical element body. The piezoelectric device includes a first electrode and at least one piezoelectric element. The first electrode is configured to cooperate with the at least one piezoelectric element and at least one second electrode, when the at least one second electrode is located on a rear side of the optical element body and the at least one piezoelectric element is located between the first electrode and the at least one second electrode, the rear side of the optical element body being opposite to the front side of the optical element body. The first electrode is located on the front side of the optical element body, and the at least one piezoelectric element is formed by at least one piezoelectric section of the optical element body.

Abstract: An optical imaging arrangement includes an optical element and a piezoelectric device. The optical element includes an optical element body carrying an optical surface on a front side of the optical element body. The piezoelectric device includes a first electrode and at least one piezoelectric element. The first electrode is configured to cooperate with the at least one piezoelectric element and at least one second electrode, when the at least one second electrode is located on a rear side of the optical element body and the at least one piezoelectric element is located between the first electrode and the at least one second electrode, the rear side of the optical element body being opposite to the front side of the optical element body. The first electrode is located on the front side of the optical element body, and the at least one piezoelectric element is formed by at least one piezoelectric section of the optical element body.

Abstract: The disclosure relates to an assembly in a microlithographic projection exposure apparatus, with an optical element and at least one weight compensating device, which includes at least one magnetic circuit. A magnetic field generated by this magnetic circuit brings about a force for compensating at least partially for the force of the weight acting on the optical element. The apparatus also includes a coil arrangement with a plurality of coils. The arrangement is energizable with electrical current to generate a compensating force acting on the optical element. This compensating force compensates at least partially for a parasitic force that is exerted by the magnetic circuit when there is movement of the optical element and does not contribute to the compensation for the force of the weight acting on the optical element.

Abstract: The disclosure relates to an assembly in a microlithographic projection exposure apparatus, with an optical element and at least one weight compensating device, which includes at least one magnetic circuit. A magnetic field generated by this magnetic circuit brings about a force for compensating at least partially for the force of the weight acting on the optical element. The apparatus also includes a coil arrangement with a plurality of coils. The arrangement is energizable with electrical current to generate a compensating force acting on the optical element. This compensating force compensates at least partially for a parasitic force that is exerted by the magnetic circuit when there is movement of the optical element and does not contribute to the compensation for the force of the weight acting on the optical element.

Abstract: An electromagnetic drive includes a stator, having a stator holder and an actuating element which is movable by electromagnetic interaction with the stator. The stator holder has at least two electrically conductive paths running separately from and adjacent to one another. In each case, the two paths running separately from and adjacent to one another form a path pair, and the paths of the path pair are connected to one another in electrically conductive fashion at their respective ends. The paths of the path pair are arranged such that the stator and/or the actuating element induces eddy currents acting in opposite directions in the paths.

Abstract: A semiconductor lithography projection exposure apparatus includes a projection lens which includes a manipulator. The manipulator includes an optical element; a base frame; a sensor frame arranged on the base frame; and a sensor arranged on the sensor frame. The manipulator is configured to correct wavefront aberrations of used optical radiation that pass through the optical element during the operation of the projection lens. The manipulator is arranged directly after an object plane of the apparatus along a path of the used optical radiation. The sensor is configured to measure a deformation or a deflection of the optical element. A coefficient of thermal expansion of the sensor frame is within 16 ppm/K of a coefficient of thermal expansion of the base frame.

Abstract: A projection exposure apparatus for semiconductor lithography includes a deformable optical element for the correction of wavefront aberrations. Actuating units for the deformation of the optical element are in mechanical contact with the optical element by way of contact regions. The contact regions are arranged in a regular or irregular arrangement outside an optically active region of the optical element. There are contact regions lying closest to the optically active region and remote contact regions.

Abstract: An optical imaging arrangement includes an optical element and a piezoelectric device. The optical element includes an optical element body carrying an optical surface on a front side of the optical element body. The piezoelectric device includes a first electrode and at least one piezoelectric element. The first electrode is configured to cooperate with the at least one piezoelectric element and at least one second electrode, when the at least one second electrode is located on a rear side of the optical element body and the at least one piezoelectric element is located between the first electrode and the at least one second electrode, the rear side of the optical element body being opposite to the front side of the optical element body. The first electrode is located on the front side of the optical element body, and the at least one piezoelectric element is formed by at least one piezoelectric section of the optical element body.

Abstract: An electromagnetic drive includes a stator, having a stator holder and an actuating element which is movable by electromagnetic interaction with the stator. The stator holder has at least two electrically conductive paths running separately from and adjacent to one another. In each case, the two paths running separately from and adjacent to one another form a path pair, and the paths of the path pair are connected to one another in electrically conductive fashion at their respective ends.

Abstract: A projection exposure apparatus for semiconductor lithography includes a deformable optical element for the correction of wavefront aberrations. Actuating units for the deformation of the optical element are in mechanical contact with the optical element by way of contact regions. The contact regions are arranged in a regular or irregular arrangement outside an optically active region of the optical element. There are contact regions lying closest to the optically active region and remote contact regions.

Abstract: A semiconductor lithography projection exposure apparatus includes a projection lens which includes a manipulator. The manipulator includes an optical element; a base frame; a sensor frame arranged on the base frame; and a sensor arranged on the sensor frame. The manipulator is configured to correct wavefront aberrations of used optical radiation that pass through the optical element during the operation of the projection lens. The manipulator is arranged directly after an object plane of the apparatus along a path of the used optical radiation. The sensor is configured to measure a deformation or a deflection of the optical element. A coefficient of thermal expansion of the sensor frame is within 16 ppm/K of a coefficient of thermal expansion of the base frame.

Abstract: The invention relates to an arrangement for mounting an optical element, in particular in an EUV projection exposure apparatus, comprising a weight force compensation device for exerting a compensation force on the optical element, wherein the compensation force at least partly compensates for the weight force acting on the optical element, wherein the weight force compensation device has a passive magnetic circuit for generating a force component of the compensation force acting on the optical element, and wherein at least one adjustment element is provided via which the force component generated by the passive magnetic circuit is continuously adjustable.

Abstract: The invention relates to an arrangement for mounting an optical element, in particular in an EUV projection exposure apparatus, comprising a weight force compensation device (103) for exerting a compensation force on the optical element (101), wherein said compensation force at least partly compensates for the weight force acting on the optical element (101), wherein the weight force compensation device (103) has a passive magnetic circuit for generating a force component of the compensation force acting on the optical element (101), and wherein at least one adjustment element (880) is provided by means of which the force component generated by the passive magnetic circuit is continuously adjustable.