Patents by Inventor Jassy S. J. Wang

Jassy S. J. Wang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7135523
    Abstract: A method for making a series of nanoscale microstructures, including helical microstructures and cylindrical microstrustures. This method includes the steps of: (1) forming a chiral block copolymer containing a plurality of chiral first polymer blocks and a second polymer blocks wherein the chiral first polymer blocks have a volume fraction ranging from 20 to 49%; (2) causing a phase separation in the chiral block copolymer. In a preferred embodiment, the chiral block copolymer is poly(styrene)-poly(L-lactide) (PS-PLLA) chiral block copolymer, and the copolymerization process is a living copolymerization process which includes the following steps: (a) mixing styrene with BPO and 4-OH-TEMPO to form 4-hydroxy-TEMPO-terminated polystyrene; and (2) mixing the 4-hydroxy-TEMPO-terminated polystyrene with [?3-EDBP)Li2]2[(?3-nBu)Li(0.5Et2O)]2 and L-lactide in an organic solvent preferably CH2Cl2 to form the poly(styrene)-poly(L-lactide) chiral block copolymer.
    Type: Grant
    Filed: March 12, 2004
    Date of Patent: November 14, 2006
    Assignee: Industrial Technology Research Institute
    Inventors: Rong-Ming Ho, Yeo-Wan Chiang, Chu-Chieh Lin, Bao-Tsan Ko, Yi-Chun Chen, Tsai-Ming Chung, Hsi-Hsin Shih, Jassy S. J. Wang