Abstract: A pulley arrangement for a belt drive including an input shaft having first end and second end. The first end of the input shaft is couplable to a gear box. Further, the pulley arrangement includes a pulley mounted coaxially on the input shaft having an inner pulley surface and an outer pulley surface. The pulley arrangement further includes at least one ring disc. The at least one ring disc is fastened coaxially to the inner pulley surface or the outer pulley surface. A plurality of air flow directing protrusions, grooves, or both protrusions and grooves extend from an inner diameter to an outer diameter of the ring disc, and a circumferential ring disc gap is provided between the at least one ring disc and the input shaft.

Abstract: A transmission device and an agricultural harvesting machine include a first drive input element, a second drive input element, a shift sleeve configured as a hollow shaft, and a drive output shaft. The shift sleeve is mounted axially displaceably on the drive output shaft and is configured to be moved by axial displacement into one of a first position, a second position, and a third shift position. An internal toothing is formed on each of the first drive input element and the second drive input element. An external toothing and an internal toothing are formed on the shift sleeve. An external toothing is formed on the drive output shaft.

Abstract: A corn head row unit gearbox includes an input shaft, that rotates about a first axis of rotation and that drives a set of bevel gears. The bevel gears transfer rotation of the input shaft into rotation of a set of gathering chain output shafts about a second axis of rotation, generally transverse to the first axis of rotation. The gathering chain drive shafts each rotate within a bushing mounted within a frame structure of the gearbox. The frame structure defines a bore that communicates with a bevel gear cavity, in which at least one of the sets of bevel gears rotates, and an interior of the bushings mounted on the gathering chain drive shafts. Rotation of the bevel gears carries lubricant to an inlet aperture on the bore and drives the lubricant through the bore into the bushings.

Abstract: A corn head row unit gearbox includes an input shaft, that rotates about a first axis of rotation and that drives a set of bevel gears. The bevel gears transfer rotation of the input shaft into rotation of a set of gathering chain output shafts about a second axis of rotation, generally transverse to the first axis of rotation. The gathering chain drive shafts each rotate within a bushing mounted within a frame structure of the gearbox. The frame structure defines a bore that communicates with a bevel gear cavity, in which at least one of the sets of bevel gears rotates, and an interior of the bushings mounted on the gathering chain drive shafts. Rotation of the bevel gears carries lubricant to an inlet aperture on the bore and drives the lubricant through the bore into the bushings.

Abstract: An silicon-containing antireflective coating (SiARC) material is applied on a substrate. The SiARC material which includes a base polymer and may include a boron silicate polymer including silsesquioxane. An etch sequence is utilized, which includes a first wet etch employing a basic solution, a second wet etch employing an acidic solution, and a third wet etch employing another basic solution. The first wet etch can be employed to break up the boron silicate polymer, and the second wet etch can remove the base polymer material, and the third wet etch can remove the residual boron silicate polymer and other residual materials. The SiARC material can be removed from a substrate employing the etch sequence, and the substrate can be reused for monitoring purposes.

Abstract: An adhesion promoter layer is formed on a surface of a substrate as an adhesion promoter layer, on which a photoresist is applied. The photoresist is lithographically exposed. Soluble portions of the lithographically exposed photoresist are dissolved in a developer solution including tetraalkylammonium hydroxide. Tetraalkylammonium hydroxide salts are formed in crystalline forms on surfaces of the substrate. A water-soluble acidic polymer layer is applied over the surfaces of the substrate to dissolve the tetraalkylammonium hydroxide salts. The water-soluble acidic polymer layer is rinsed off by water, thereby providing clean surfaces that do not include the tetraalkylammonium hydroxide salts on the substrate. Subsequent processes can be performed on the substrate, which is covered by remaining portions of the developed photoresist and has clean surfaces in regions not covered by the photoresist.

Abstract: An silicon-containing antireflective coating (SiARC) material is applied on a substrate. The SiARC material which includes a base polymer and may include a boron silicate polymer including silsesquioxane. An etch sequence is utilized, which includes a first wet etch employing a basic solution, a second wet etch employing an acidic solution, and a third wet etch employing another basic solution. The first wet etch can be employed to break up the boron silicate polymer, and the second wet etch can remove the base polymer material, and the third wet etch can remove the residual boron silicate polymer and other residual materials. The SiARC material can be removed from a substrate employing the etch sequence, and the substrate can be reused for monitoring purposes.

Abstract: An adhesion promoter layer is formed on a surface of a substrate as an adhesion promoter layer, on which a photoresist is applied. The photoresist is lithographically exposed. Soluble portions of the lithographically exposed photoresist are dissolved in a developer solution including tetraalkylammonium hydroxide. Tetraalkylammonium hydroxide salts are formed in crystalline forms on surfaces of the substrate. A water-soluble acidic polymer layer is applied over the surfaces of the substrate to dissolve the tetraalkylammonium hydroxide salts. The water-soluble acidic polymer layer is rinsed off by water, thereby providing clean surfaces that do not include the tetraalkylammonium hydroxide salts on the substrate. Subsequent processes can be performed on the substrate, which is covered by remaining portions of the developed photoresist and has clean surfaces in regions not covered by the photoresist.