Abstract: Methods and apparatus for matching an impedance of a process chamber with an impedance of an RF power source. In some embodiments, a method comprises dynamically matching a load impedance of the process chamber with an impedance matching circuit coupled between an RF power source and the process chamber, the impedance matching circuit configured to compensate for changes in the load impedance to match an impedance of the RF power source over a wide range of load impedances; filtering power feeding back from the process chamber with a first filter positioned between the matching circuit and the process chamber, the first filter configured as a wide bandpass filter; and filtering residual signals with a second filter positioned between the matching circuit and the RF power source, the second filter configured as a low pass filter.