Abstract: A surgical training device for use with a thoracic tissue model includes a base having a thoracic tissue model receiving area. A first rib mounting member is slidably coupled to the base adjacent a first side of the thoracic tissue model receiving area and a second rib mounting member is slidably coupled to the base adjacent a second side of the thoracic tissue model receiving area opposite the first side. A plurality of simulated ribs each have a first end coupled to the first rib mounting member and a second end coupled to the second rib mounting member, and are repositionable between right and left thoracic configurations.

Abstract: An endobronchial tool training device may include a simulated human lung main airway network, and at least one training cartridge removably coupled to the simulated human lung main airway network. The training cartridge may include a body of simulated lung tissue having at least one simulated abnormality, and a simulated human lung branch airway network. An endobronchial tool is steerable through the simulated human lung main airway network and into the simulated human lung branch airway network to a position adjacent at least one simulated abnormality.

Abstract: A surgical training device for use with a thoracic tissue model includes a base having a thoracic tissue model receiving area. A first rib mounting member is slidably coupled to the base adjacent a first side of the thoracic tissue model receiving area and a second rib mounting member is slidably coupled to the base adjacent a second side of the thoracic tissue model receiving area opposite the first side. A plurality of simulated ribs each have a first end coupled to the first rib mounting member and a second end coupled to the second rib mounting member, and are repositionable between right and left thoracic configurations.

Abstract: A surgical training model for simulating gynecological surgery may include a simulated human uterus. A first inner portion may include harvested porcine uterus and a second outer portion may include harvested porcine tissue that surrounds the first inner portion. The simulated human uterus may be sized and shaped to replicate a human uterus. A simulated human broad ligament may include porcine tissue.

Abstract: A surgical training system may include a model base having at least one channel therein and opening outwardly to a top surface. A model insert may be removably coupled to the top surface of the model base. The model insert may include tissue for surgical training and a plurality of connectors coupled to the tissue and slidably received within the at least one channel.

Abstract: A polishing head is tested in a test station having a pedestal for supporting a test wafer and a controllable pedestal actuator to move a pedestal central wafer support surface and a test wafer toward the polishing head. In another aspect of the present description, the test wafer may be positioned using a positioner having a first plurality of test wafer engagement members positioned around the pedestal central wafer support surface. In another aspect, the wafer position may have a second plurality of test wafer engagement members positioned around an outer wafer support surface disposed around the pedestal central wafer support surface and adapted to support a test wafer. The second plurality of test wafer engagement members may be distributed about a second circumference of the ring member, the second circumference having a wider diameter than the first circumference. Additional embodiments and aspects are described and claimed.

Abstract: A polishing head is tested in a test station having a pedestal for supporting a test wafer and a controllable pedestal actuator to move a pedestal central wafer support surface and a test wafer toward the polishing head. In another aspect of the present description, the test wafer may be positioned using a positioner having a first plurality of test wafer engagement members positioned around the pedestal central wafer support surface. In another aspect, the wafer position may have a second plurality of test wafer engagement members positioned around an outer wafer support surface disposed around the pedestal central wafer support surface and adapted to support a test wafer. The second plurality of test wafer engagement members may be distributed about a second circumference of the ring member, the second circumference having a wider diameter than the first circumference. Additional embodiments and aspects are described and claimed.

Abstract: A polishing head is tested in a test station having a pedestal for supporting a test wafer and a controllable pedestal actuator to move a pedestal central wafer support surface and a test wafer toward the polishing head. In another aspect of the present description, the test wafer may be positioned using a positioner having a first plurality of test wafer engagement members positioned around the pedestal central wafer support surface. In another aspect, the wafer position may have a second plurality of test wafer engagement members positioned around an outer wafer support surface disposed around the pedestal central wafer support surface and adapted to support a test wafer. The second plurality of test wafer engagement members may be distributed about a second circumference of the ring member, the second circumference having a wider diameter than the first circumference. Additional embodiments and aspects are described and claimed.

Abstract: A polishing layer of a polishing has a window member with a top surface positioned a predetermined distance below the polishing surface. A transparent layer can be positioned below the polishing layer and supporting the window member.

Abstract: A polishing head is tested in a test station having a pedestal for supporting a test wafer and a controllable pedestal actuator to move a pedestal central wafer support surface and a test wafer toward the polishing head. In another aspect of the present description, the test wafer may be positioned using a positioner having a first plurality of test wafer engagement members positioned around the pedestal central wafer support surface. In another aspect, the wafer position may have a second plurality of test wafer engagement members positioned around an outer wafer support surface disposed around the pedestal central wafer support surface and adapted to support a test wafer. The second plurality of test wafer engagement members may be distributed about a second circumference of the ring member, the second circumference having a wider diameter than the first circumference. Additional embodiments and aspects are described and claimed.

Abstract: A polishing layer of a polishing has a window member with a top surface positioned a predetermined distance below the polishing surface. A transparent layer can be positioned below the polishing layer arid supporting the window member.

Abstract: A polishing layer of a polishing has a window member with a top surface positioned a predetermined distance below the polishing surface. A transparent layer can be positioned below the polishing layer and supporting the window member.

Abstract: A polishing layer of a polishing has a window member with a top surface positioned a predetermined distance below the polishing surface. A transparent layer can be positioned below the polishing layer and supporting the window member.