Abstract: A tool for use with Quick Release (QR) fasteners, and related methods and kits. The tool generally includes an elongate main body with a fastener-receiving area. The fastener-receiving area is configured to simultaneously support the head of the QR fastener and depress the button of the QR fastener. The fastener-receiving area includes a slot that is distally and downwardly open, two shoulders that bound the slot, and a ventral surface. The QR fastener is inserted into the slot so that the head of the QR fastener rests on the first and second shoulders, the collar portion of the QR fastener extends through the slot, and the ventral surface depresses the button of the QR fastener. With the button depressed in this fashion, the retention feature of the QR fastener is released, which allows the worker to manipulate the QR fastener by moving the tool.

Abstract: A tool for use with Quick Release (QR) fasteners, and related methods and kits. The tool generally includes an elongate main body with a fastener-receiving area. The fastener-receiving area is configured to simultaneously support the head of the QR fastener and depress the button of the QR fastener. The fastener-receiving area includes a slot that is distally and downwardly open, two shoulders that bound the slot, and a ventral surface. The QR fastener is inserted into the slot so that the head of the QR fastener rests on the first and second shoulders, the collar portion of the QR fastener extends through the slot, and the ventral surface depresses the button of the QR fastener. With the button depressed in this fashion, the retention feature of the QR fastener is released, which allows the worker to manipulate the QR fastener by moving the tool.

Abstract: A substrate assembly may include an outer halo, the outer halo comprising a first material and defining a first aperture. The substrate assembly may also include a halo ring, comprising a second material and disposed at least partially within the first aperture. The halo ring may define a second aperture, concentrically positioned within the first aperture, wherein the halo ring is coupled to accommodate a substrate therein.

Abstract: A gas injection system for an ion beam device, the gas injection system including an extraction plate, an extraction aperture formed in the extraction plate for allowing passage of an ion beam, a first gas distributor removably fastened to the extraction plate on a first side of the extraction aperture, the first gas distributor having a gas orifice formed therein, a second gas distributor removably fastened to the extraction plate on a second side of the extraction aperture opposite the first side, the second gas distributor having a gas orifice formed therein, a first gas conduit extending through the extraction plate between the first gas distributor and a gas manifold mounted to the extraction plate, and a second gas conduit extending through the extraction plate between the second gas distributor the gas manifold, and a residue removal gas source connected to the gas manifold.

Abstract: A gas injection system, including an extraction plate having an extraction aperture for allowing passage of an ion beam through the extraction plate, the extraction plate further having a gas slot for expulsion of a residue removal gas from the extraction plate. The gas injection system may include a gas conduit extending through the extraction plate between the gas slot and a gas manifold, a gas source connected in fluid communication with the gas manifold, the gas source containing the residue removal gas. The gas manifold may include a valve adjustable between a first position, wherein the residue removal gas is allowed to flow into the extraction plate, and a second portion, wherein the residue removal gas can be vented from the extraction plate. The gas injection system may further include a manifold cover coupled to the gas manifold.

Abstract: A gas injection system for an ion beam device, the gas injection system including an extraction plate, an extraction aperture formed in the extraction plate for allowing passage of an ion beam, a first gas distributor removably fastened to the extraction plate on a first side of the extraction aperture, the first gas distributor having a gas orifice formed therein, a second gas distributor removably fastened to the extraction plate on a second side of the extraction aperture opposite the first side, the second gas distributor having a gas orifice formed therein, a first gas conduit extending through the extraction plate between the first gas distributor and a gas manifold mounted to the extraction plate, and a second gas conduit extending through the extraction plate between the second gas distributor the gas manifold, and a residue removal gas source connected to the gas manifold.

Abstract: Methods and systems are provided for air conditioning, capturing combustion contaminants, desalination, and other processes using liquid desiccants.

Abstract: A computer-readable storage medium storing instructions executable by a processor for resolving permissions using role activation operators to evaluate permissions assigned to a user in a role context inheritance hierarchy. The stored instructions comprise several steps: a step of retrieving a plurality of activated roles within a role context that match roles assigned to a user, wherein one or more permissions in the role context inherit from one or more permissions in a parent role context in a role context permission inheritance hierarchy; a step of determining an aggregate permission for each of the plurality of activated roles, wherein a role activation operator determines how an activated role is evaluated; a step of processing the aggregate permissions for the plurality of activated roles; and a step of resolving a final permission for the user.

Abstract: A processing system and method for chemically treating a substrate, wherein the processing system comprises a temperature controlled chemical treatment chamber, and an independently temperature controlled substrate holder for supporting a substrate for chemical treatment. The substrate is exposed to a gaseous chemistry, without plasma, under controlled conditions including wall temperature, surface temperature and gas pressure. The chemical treatment of the substrate chemically alters exposed surfaces on the substrate.

Abstract: A processing system and method for chemically treating a substrate, wherein the processing system comprises a temperature controlled chemical treatment chamber, and an independently temperature controlled substrate holder for supporting a substrate for chemical treatment. The substrate holder is thermally insulated from the chemical treatment chamber. The substrate is exposed to a gaseous chemistry, without plasma, under controlled conditions including wall temperature, surface temperature and gas pressure. The chemical treatment of the substrate chemically alters exposed surfaces on the substrate.

Abstract: A method for resolving permissions using role activation operators to evaluate permissions assigned to a user in a role context inheritance hierarchy. The method comprises several steps. A step of retrieving a plurality of activated roles within a role context that match roles assigned to a user, wherein one or more permissions in the role context inherit from one or more permissions in a parent role context in a role context permission inheritance hierarchy. A step of determining an aggregate permission for each of the plurality of activated roles, wherein a role activation operator determines how an activated role is evaluated. A step of processing the aggregate permissions for the plurality of activated roles. A step of resolving a final permission for the user.

Abstract: A processing system and method for chemical oxide removal, wherein the processing system includes a process chamber having a lower chamber portion configured to chemically treat a substrate and an upper chamber portion configured to thermally treat the substrate, and a substrate lifting assembly configured to transport the substrate between the lower chamber portion and the upper chamber portion. The lower chamber portion includes a chemical treatment environment that provides a temperature controlled substrate holder for supporting the substrate for chemical treatment. The substrate is exposed to a gaseous chemistry, such as HF/NH3, under controlled conditions including surface temperature and gas pressure. The upper chamber portion includes a thermal treatment environment that provides a heating assembly configured to elevate the temperature of the substrate.

Abstract: A chemical oxide removal (COR) processing system is presented, wherein the COR processing system includes a first treatment chamber and a second treatment chamber. The first treatment chamber comprises a chemical treatment chamber that provides a temperature controlled chamber having a protective barrier. The second treatment chamber comprises a heat treatment chamber that provides a temperature-controlled chamber having a protective barrier.

Abstract: A computer-readable storage medium storing instructions executable by a processor for resolving permissions using role activation operators to evaluate permissions assigned to a user in a role context inheritance hierarchy. The stored instructions comprise several steps: a step of retrieving a plurality of activated roles within a role context that match roles assigned to a user, wherein one or more permissions in the role context inherit from one or more permissions in a parent role context in a role context permission inheritance hierarchy; a step of determining an aggregate permission for each of the plurality of activated roles, wherein a role activation operator determines how an activated role is evaluated; a step of processing the aggregate permissions for the plurality of activated roles; and a step of resolving a final permission for the user.

Abstract: A method for resolving permissions using role activation operators to evaluate permissions assigned to a user in a role context inheritance hierarchy. The method comprises several steps. A step of retrieving a plurality of activated roles within a role context that match roles assigned to a user, wherein one or more permissions in the role context inherit from one or more permissions in a parent role context in a role context permission inheritance hierarchy. A step of determining an aggregate permission for each of the plurality of activated roles, wherein a role activation operator determines how an activated role is evaluated. A step of processing the aggregate permissions for the plurality of activated roles. A step of resolving a final permission for the user.

Abstract: A chemical processing system includes a processing chamber containing a chemical processing region and a gas injection system. The gas injection system includes at least one first gas injection orifice and at least one second gas injection orifice in communication with the chemical processing region to expose a substrate to mixed first and second process gases. Other embodiments of the chemical processing system can include a sensor to sense a mixing rate of the process gases or a shroud defining a portion of the at least one first gas injection orifice to control mixing of the process gases. A method of mixing process gas in a chemical processing region of a chemical processing system is provided in which a first process gas and a second process gas are injected into the chemical processing region and mixed. A mixture rate is sensed and used to control the mixing.

Abstract: A baffle plate assembly, configured to be coupled to a substrate holder in a plasma processing system, comprises a baffle plate having one or more openings to permit the passage of gas there through, wherein the coupling of the baffle plate to the substrate holder facilitates auto-centering of the baffle plate in the plasma processing system. For example, a centering ring mounted in the substrate holder can comprise a centering feature configured to couple with a mating feature on the baffle plate. After initial assembly of the plasma processing system, the baffle plate can be replaced and centered within the plasma processing system without disassembly and re-assembly of the substrate holder.

Abstract: A processing system and method for chemical oxide removal (COR), wherein the processing system comprises a first treatment chamber and a second treatment chamber, wherein the first and second treatment chambers are coupled to one another. The first treatment chamber comprises a chemical treatment chamber that provides a temperature controlled chamber, and an independently temperature controlled substrate holder for supporting a substrate for chemical treatment. The substrate is exposed to a gaseous chemistry, such as HF/NH3, under controlled conditions including surface temperature and gas pressure. The second treatment chamber comprises a heat treatment chamber that provides a temperature controlled chamber, thermally insulated from the chemical treatment chamber. The heat treatment chamber provides a substrate holder for controlling the temperature of the substrate to thermally process the chemically treated surfaces on the substrate.

Abstract: A dual chamber apparatus including a first chamber and a second chamber which is configured to be coupled to the first chamber at an interface. Each of the first chamber and the second chamber has a transfer opening located at the interface. An insulating plate is located on one of the first chamber and the second chamber at the interface and is configured to have a low thermal conductivity such that the first chamber and the second chamber can be independently controlled at different temperatures when the first chamber and the second chamber are coupled together. Additionally, the apparatus may include an alignment device and/or a fastening device for fastening the first chamber to the second chamber. In embodiments, the insulating plate may be constructed of Teflon. Further, the first chamber may be a chemical oxide removal treatment chamber and the second chamber may be a heat treatment chamber.

Abstract: A gate valve assembly provides vacuum isolation between a first treatment system and a second treatment system. The gate valve assembly includes an actuator rotatably coupled to at least one of the first treatment system and the second treatment system, and configured to operate an actuator assembly that has an actuator arm slidably coupled to the actuator. The actuator arm has a distal end coupled to an isolation gate through a vacuum feed-through, wherein the vacuum feed-through is configured to preserve vacuum with the first treatment system and the second treatment system. The isolation gate is configured to rotate about the gate hinge when the actuator arm is translated, and to close a transfer slot between the first treatment system and the second treatment system, or open the transfer slot between the first treatment system and the second treatment system.