Abstract: A liquid nitrogen temperature micro-wiggler assembly consists of a stack of micro-wiggler elements. Each micro-wiggler element has a sandwich structure consisting of a non-metallic substrate, a superconducting layer on top of the substrate and a conductive layer on top of the superconducting layer. The undulating magnetic field produced by the micro-wiggler assembly, when supplied with a current, interacts with the electron beam passing through an isolated tube in the center of the micro-wiggler assembly and transverse to it, resulting in the production of optical radiation.

Abstract: A coating technique for beam tubes which employs a laser to ablate a target material and produce a plasma plume containing ions of the target material which adhere to the inner wall surface of the tube forming a thin film. The device employed in the coating process includes a pulse laser, a turning mirror used to direct the laser radiation, a window attached to tubing whose function is to evacuate the setup and to support a rail on which a carriage carrying the target material and optical elements for focusing the laser light onto the targets are mounted. During the coating process, the beam tube and the rail support tubes are evacuated to a lower pressure to remove ambient air. The apparatus is then filled with an inert gas. The laser is pulsed for a predetermined duration to ablate the target material for coating the vicinal surfaces of the beam tube.

Abstract: A process for large area hardening of photoresists or polymer films placed on substrates is disclosed. The process requires the use of a short duration (<1 us.) pulsed electron beam produced in soft vacuum by an abnormal glow discharge. The pulsed electron beam interacts with the patterned photoresist/polymer resist so as to harden or stabilize the patterns thereon by electron induced cross-linking. The use of a soft vacuum environment allows for both thermal as well as chemically induced hardening.

Abstract: A cold cathode glow discharge electron gun operating in the abnormal glow region produces a wide area collimated electron beam employed for flood exposure of thin film materials through electron beam transmission masks, resulting in spatially localized exposure and patterning of the thin film materials.