Patents by Inventor Jayesh Natvarlal Mistry

Jayesh Natvarlal Mistry has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method of removing residual wax from silicon wafer polishing plate
    Patent number: 5922135
    Abstract: A process for removing waxes from silicon wafer polishing plates is provided. The process includes the steps of providing submersion baths of an alkali soap, de-ionized rinse water, sodium hydroxide, and additional de-ionized rinse water, in which polishing plates are exposed. The process eliminates the use of methylene chloride from the process.
    Type: Grant
    Filed: September 4, 1998
    Date of Patent: July 13, 1999
    Assignee: SEH America, Inc.
    Inventor: Jayesh Natvarlal Mistry