Patents by Inventor Jayson W. Anton

Jayson W. Anton has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Constrained flexure mechanism and method for manufacturing the same
    Patent number: 12234867
    Abstract: The present disclosure relates to a flexure mechanism that includes a plurality of thin material structures, each thin material structure including a weak-link portion and a separable constraint portion. The separable constraint portion is linked to the weak-link portion and configured to stabilize the weak-link portion. Additionally, the plurality of thin material structures are stacked and secured together to form a laminar structure.
    Type: Grant
    Filed: February 16, 2022
    Date of Patent: February 25, 2025
    Assignee: UCHICAGO ARGONNE, LLC
    Inventors: Deming Shu, Steven P. Kearney, Jayson W. Anton, Ross J. Harder, Xianbo Shi, Tim M. Mooney, Lahsen Assoufid
  • CONSTRAINED FLEXURE MECHANISM AND METHOD FOR MANUFACTURING THE SAME
    Publication number: 20230258234
    Abstract: The present disclosure relates to a flexure mechanism that includes a plurality of thin material structures, each thin material structure including a weak-link portion and a separable constraint portion. The separable constraint portion is linked to the weak-link portion and configured to stabilize the weak-link portion. Additionally, the plurality of thin material structures are stacked and secured together to form a laminar structure.
    Type: Application
    Filed: February 16, 2022
    Publication date: August 17, 2023
    Inventors: Deming Shu, Steven P. Kearney, Jayson W. Anton, Ross J. Harder, Xianbo Shi, Tim M. Mooney, Lahsen Assoufid
  • METHOD AND MECHANICAL DESIGN OF A FLEXURE INTERFACE FOR ULTRA-HIGH-VACUUM NANOPOSITIONING INVAR BASE NEAR-ZERO-LENGTH FEEDTHROUGH
    Publication number: 20220399137
    Abstract: A method and a novel flexure interface apparatus are provided for ultrahigh-vacuum (UHV) applications for precision nanopositioning systems. An ultrahigh-vacuum (UHV) metrology base is integrated with an ultrahigh-vacuum (UHV) flange together including a precision and compact flexure interface structure defining a UHV metrology base near-zero-length feedthrough. The UHV metrology base is directly mounted to a flange mounting surface in air with nanopositioning and thermal stability. The precision and compact flexure interface structure has sufficient strength to hold the vacuum force and sufficiently flexible to survive with the thermal expansion stress during bakeout process.
    Type: Application
    Filed: June 14, 2021
    Publication date: December 15, 2022
    Inventors: Deming Shu, Steven P. Kearney, Jayson W. Anton, William F. Toter
  • Method and precision nanopositioning apparatus with compact vertical and horizontal linear nanopositioning flexure stages for implementing enhanced nanopositioning performance
    Patent number: 10663040
    Abstract: An enhanced method and precision nanopositioning apparatus for implementing enhanced nanopositioning performance is provided. The nanopositioning apparatus includes a vertical linear nanopositioning flexure stage and a horizontal linear nanopositioning flexure stage. The vertical linear nanopositioning flexure stage includes a stage base, a symmetrically configured flexure linear guiding mechanism with precision motion enhancement structure, and a stage carriage. The horizontal linear nanopositioning flexure stage is mounted on the stage carriage of the vertical linear nanopositioning flexure stage, and includes a middle-bar relative position control mechanism to enhance the stiffness of a flexure linear guiding mechanism.
    Type: Grant
    Filed: July 27, 2017
    Date of Patent: May 26, 2020
    Assignee: UChicago Argonne, LLC
    Inventors: Deming Shu, Barry Lai, Steven P. Kearney, Jayson W. Anton, Wenjun Liu, Jorg M. Maser, Christian Roehrig, Jonathan Z. Tischler
  • METHOD AND PRECISION NANOPOSITIONING APPARATUS WITH COMPACT VERTICAL AND HORIZONTAL LINEAR NANOPOSITIONING FLEXURE STAGES FOR IMPLEMENTING ENHANCED NANOPOSITIONING PERFORMANCE
    Publication number: 20190032759
    Abstract: An enhanced method and precision nanopositioning apparatus for implementing enhanced nanopositioning performance is provided. The nanopositioning apparatus includes a vertical linear nanopositioning flexure stage and a horizontal linear nanopositioning flexure stage. The vertical linear nanopositioning flexure stage includes a stage base, a symmetrically configured flexure linear guiding mechanism with precision motion enhancement structure, and a stage carriage. The horizontal linear nanopositioning flexure stage is mounted on the stage carriage of the vertical linear nanopositioning flexure stage, and includes a middle-bar relative position control mechanism to enhance the stiffness of a flexure linear guiding mechanism.
    Type: Application
    Filed: July 27, 2017
    Publication date: January 31, 2019
    Inventors: Deming Shu, Barry Lai, Stephen P. Kearney, Jayson W. Anton, Wenjun Liu, Jorg M. Maser, Christian Roehig, Jonathan Z. Tischler