Patents by Inventor Je-bum Yoon

Je-bum Yoon has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • EXPOSURE APPARATUS AND EXPOSING METHOD USING THE APPARATUS
    Publication number: 20110294074
    Abstract: An exposure apparatus and an exposing method using the apparatus. The exposure apparatus includes a photomask having a plurality of optical sources attached to a substrate.
    Type: Application
    Filed: May 31, 2011
    Publication date: December 1, 2011
    Inventors: Ji-Eun LEE, In-Sung Kim, Jeong-Ho Yeo, Chang-Min Park, Je-Bum Yoon
  • E-beam lithography system for synchronously irradiating a plurality of photomasks and method of fabricating photomasks using the same
    Patent number: 7723702
    Abstract: Disclosed is an E-beam lithography system for synchronously irradiating surfaces of a plurality of substrates. The E-beam lithography system may include a loading unit loading and unloading substrates, an alignment chamber aligning the substrates, a transfer chamber transferring the substrates from the loading unit or chambers, a lithography chamber radiating one or more electron beams onto the substrates, and a vacuum chamber creating a vacuum in the chambers. A stage may be installed in the lithography chamber such that the substrates may be mounted on the stage and radiated with one or more electron beams.
    Type: Grant
    Filed: January 23, 2007
    Date of Patent: May 25, 2010
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Je-bum Yoon, Cha-won Koh, Myoung-ho Jung, Gi-sung Yeo, Sang-jin Kim
  • E-beam lithography system for synchronously irradiating a plurality of photomasks and method of fabricating photomasks using the same
    Publication number: 20070181828
    Abstract: Disclosed is an E-beam lithography system for synchronously irradiating surfaces of a plurality of substrates. The E-beam lithography system may include a loading unit loading and unloading substrates, an alignment chamber aligning the substrates, a transfer chamber transferring the substrates from the loading unit or chambers, a lithography chamber radiating one or more electron beams onto the substrates, and a vacuum chamber creating a vacuum in the chambers. A stage may be installed in the lithography chamber such that the substrates may be mounted on the stage and radiated with one or more electron beams.
    Type: Application
    Filed: January 23, 2007
    Publication date: August 9, 2007
    Inventors: Je-bum Yoon, Cha-won Koh, Myoung-ho Jung, Gi-sung Yeo, Sang-jin Kim