Patents by Inventor Je-Gwon Lee

Je-Gwon Lee has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 12152972
    Abstract: A system for determining a filter for evaluating a dissolution quality of a binder solution for a secondary battery electrode according to the present technology includes: a pressure container which accommodates a binder solution; a pressure medium supply source which supplies pressure medium of a predetermined pressure to the pressure container; a filter which is connected to the pressure container by a pipe; a flow rate measuring unit which measures a flow rate of the binder solution filtered by the filter; and a determination unit which measures a time point when a flow rate reaches a specific value predetermined in consideration of an initial flow rate by repeating measurement of the flow rate using each filter having a different pore size, and determines a filter having a filter size in an optimal pore size range based on the time point.
    Type: Grant
    Filed: February 2, 2022
    Date of Patent: November 26, 2024
    Assignee: LG ENERGY SOLUTION, LTD.
    Inventors: Hye Jin Sim, Joo Yong Park, Sung Soo Yoon, Je Gwon Lee, Hyeon Jeong Kang, Young Seok Kim
  • Patent number: 12084538
    Abstract: A method for producing a polymer containing metal atoms or halogen atoms at the terminals thereof with excellent efficiency while minimizing or eliminating side reactions or the like is provided. The method can also freely control molecular weight characteristics of the polymer.
    Type: Grant
    Filed: July 16, 2018
    Date of Patent: September 10, 2024
    Assignee: LG Chem, Ltd.
    Inventors: Yoon Hyung Hur, Je Gwon Lee, Sung Soo Yoon, No Jin Park, Eun Young Choi, Se Jin Ku, Mi Sook Lee, Hyung Ju Ryu, Na Na Kang, Eung Chang Lee
  • Publication number: 20240219291
    Abstract: The present technology relates to an adhesion strength measurement system for a wet electrode specimen that can evaluate the adhesion strength of an electrode specimen impregnated with an electrolyte solution, and an adhesion strength measurement method for a wet electrode specimen using the same. The adhesion strength measurement system includes: a test substrate; an electrode specimen attached to the test substrate; a fixing jig configured to fix the test substrate so that the electrode specimen attached to the test substrate is immersed in an electrolyte solution; and an adhesion strength measurement unit configured to measure a force at which a mixture layer of the electrode specimen is peeled off by applying a tensile force to the gripped electrode specimen, the adhesion strength measurement unit including a grip part configured to grip one region of the electrode specimen.
    Type: Application
    Filed: March 15, 2022
    Publication date: July 4, 2024
    Applicant: LG ENERGY SOLUTION, LTD.
    Inventors: Hye Jin SIM, Woo Ha KIM, Sung Soo YOON, Je Gwon LEE, Ji Hee YOON, Joo Yong PARK, Hyeon Jeong KANG, Young Seok KIM
  • Patent number: 12006384
    Abstract: The present application relates to a pinning composition, a laminate comprising the same, and a method for producing the same. The pinning composition of the present application can impart directionality and location selection properties to a polymer membrane comprising a self-assembly structure of a block copolymer. The pinning composition of the present application exhibits excellent reaction selectivity, whereby it can form a vertical lamella structure with a high degree of alignment. In addition, the pinning composition of the present application may be suitable for application to low temperature processes.
    Type: Grant
    Filed: October 29, 2018
    Date of Patent: June 11, 2024
    Assignee: LG Chem, Ltd.
    Inventors: Se Jin Ku, Mi Sook Lee, Na Na Kang, Eung Chang Lee, Sung Soo Yoon, No Jin Park, Je Gwon Lee, Eun Young Choi, Hyung Ju Ryu, Yoon Hyung Hur
  • Patent number: 11732072
    Abstract: A neutral layer composition and a neutral layer formed from the same are disclosed herein. In some embodiments, a neutral layer composition includes a random copolymer having a unit represented by Formula 1, and a unit containing an aromatic structure having one or more halogen atoms, wherein the molar amount of the unit represented by Formula 1 is present in a range of 9 mol % to 32 mol %, based on the total molar amount of the copolymer. The neutral layer can effectively control orientation characteristics of various block copolymers deposited thereon.
    Type: Grant
    Filed: July 16, 2018
    Date of Patent: August 22, 2023
    Inventors: Se Jin Ku, Mi Sook Lee, Na Na Kang, Eung Chang Lee, Sung Soo Yoon, No Jin Park, Je Gwon Lee, Eun Young Choi, Hyung Ju Ryu, Yoon Hyung Hur
  • Patent number: 11732098
    Abstract: The present application relates to a block copolymer and a use thereof. The present application can provide a laminate which is capable of forming a highly aligned block copolymer on a substrate and thus can be effectively applied to production of various patterned substrates, and a method for producing a patterned substrate using the same.
    Type: Grant
    Filed: October 8, 2021
    Date of Patent: August 22, 2023
    Inventors: Mi Sook Lee, Se Jin Ku, No Jin Park, Jung Keun Kim, Je Gwon Lee, Hyung Ju Ryu, Eun Young Choi
  • Publication number: 20230175943
    Abstract: According to a system and method for evaluating the dissolution quality of a binder solution for a secondary battery electrode, by preparing an electrode slurry with a binder solution having a predetermined amount or more of cumulative filtration amount or a predetermined level or less of flow rate reduction rate, the quality of an electrode for a secondary battery may be improved.
    Type: Application
    Filed: March 21, 2022
    Publication date: June 8, 2023
    Applicant: LG ENERGY SOLUTION, LTD.
    Inventors: Young Seok KIM, Joo Yong PARK, Sung Soo YOON, Je Gwon LEE, Hye Jin SIM, Hyeon Jeong KANG
  • Patent number: 11613599
    Abstract: Methods for forming a laminate are provided. The method provides a highly aligned block copolymer without orientation defects, coordination number defects distance defects and the like on a substrate, thereby providing a laminate which can be effectively applied to the production of various patterned substrates, and a method for producing a patterned substrate using the same.
    Type: Grant
    Filed: November 7, 2018
    Date of Patent: March 28, 2023
    Inventors: Eung Chang Lee, Mi Sook Lee, Se Jin Ku, Na Na Kang, Hyung Ju Ryu, Sung Soo Yoon, No Jin Park, Je Gwon Lee, Eun Young Choi, Yoon Hyung Hur
  • Patent number: 11530283
    Abstract: A laminate and a method for producing a patterned substrate using the same are disclosed herein. In some embodiments, a laminate includes a substrate, and a stripe pattern having first and second polymer lines alternately and repeatedly disposed on the substrate, wherein the first polymer line comprises a first polymer having a first polymerized unit having a ring structure connected to a main chain and a second polymerized unit represented by Formula 1. The method may be applied to manufacture of devices, such as electronic devices, or of applications, such as integrated optical systems, guidance and detection patterns of magnetic domain memories, flat panel displays, liquid crystal displays (LCDs), thin film magnetic heads or organic light emitting diodes, and may be used to build a pattern on a surface used in manufacture of discrete track media, such as integrated circuits, bit-patterned media and/or magnetic storage devices such as hard drives.
    Type: Grant
    Filed: September 17, 2018
    Date of Patent: December 20, 2022
    Inventors: Na Na Kang, Se Jin Ku, Mi Sook Lee, Eung Chang Lee, Eun Young Choi, Sung Soo Yoon, No Jin Park, Je Gwon Lee, Hyung Ju Ryu, Yoon Hyung Hur
  • Patent number: 11506972
    Abstract: The present application relates to a method for preparing a patterned substrate. The method may be applied to a process of manufacturing devices such as, for example, electronic devices and integrated circuits, or other applications, such as manufacture of integrated optical systems, guidance and detection patterns of magnetic domain memories, flat panel displays, liquid crystal displays (LCDs), thin film magnetic heads or organic light emitting diodes, and the like, and may also be used to build a pattern on a surface used in manufacture of discrete track media, such as integrated circuits, bit-patterned media and/or magnetic storage devices such as hard drives.
    Type: Grant
    Filed: December 13, 2017
    Date of Patent: November 22, 2022
    Inventors: Mi Sook Lee, Se Jin Ku, No Jin Park, Jung Keun Kim, Je Gwon Lee, Eun Young Choi, Hyung Ju Ryu, Sung Soo Yoon
  • Publication number: 20220317010
    Abstract: A system for determining a filter for evaluating a dissolution quality of a binder solution for a secondary battery electrode according to the present technology includes: a pressure container which accommodates a binder solution; a pressure medium supply source which supplies pressure medium of a predetermined pressure to the pressure container; a filter which is connected to the pressure container by a pipe; a flow rate measuring unit which measures a flow rate of the binder solution filtered by the filter; and a determination unit which measures a time point when a flow rate reaches a specific value predetermined in consideration of an initial flow rate by repeating measurement of the flow rate using each filter having a different pore size, and determines a filter having a filter size in an optimal pore size range based on the time point.
    Type: Application
    Filed: February 2, 2022
    Publication date: October 6, 2022
    Applicant: LG ENERGY SOLUTION, LTD.
    Inventors: Hye Jin SIM, Joo Yong PARK, Sung Soo YOON, Je Gwon LEE, Hyeon Jeong KANG, Young Seok KIM
  • Patent number: 11299596
    Abstract: The present application relates to a block copolymer and a use thereof. The present application can provide a laminate which is capable of forming a highly aligned block copolymer on a substrate and thus can be effectively applied to production of various patterned substrates, and a method for producing a patterned substrate using the same.
    Type: Grant
    Filed: November 29, 2017
    Date of Patent: April 12, 2022
    Inventors: Mi Sook Lee, Se Jin Ku, No Jin Park, Jung Keun Kim, Je Gwon Lee, Eun Young Choi, Hyung Ju Ryu, Sung Soo Yoon
  • Patent number: 11299572
    Abstract: The present application can provide a block copolymer and a use thereof. The block copolymer of the present application can have excellent self-assembly properties or phase separation characteristics and excellent etching selectivity, and various other functions as required can be freely imparted thereto.
    Type: Grant
    Filed: November 29, 2017
    Date of Patent: April 12, 2022
    Inventors: Je Gwon Lee, No Jin Park, Jung Keun Kim, Eun Young Choi, Se Jin Ku, Mi Sook Lee, Hyung Ju Ryu, Sung Soo Yoon
  • Publication number: 20220025138
    Abstract: The present application relates to a block copolymer and a use thereof. The present application can provide a laminate which is capable of forming a highly aligned block copolymer on a substrate and thus can be effectively applied to production of various patterned substrates, and a method for producing a patterned substrate using the same.
    Type: Application
    Filed: October 8, 2021
    Publication date: January 27, 2022
    Applicant: LG Chem, Ltd.
    Inventors: Mi Sook Lee, Se Jin Ku, No Jin Park, Jung Keun Kim, Je Gwon Lee, Hyung Ju Ryu, Eun Young Choi
  • Patent number: 11193036
    Abstract: A neutral layer composition, which is capable of forming a neutral layer that can effectively control orientation characteristics of various block copolymers is provided.
    Type: Grant
    Filed: July 16, 2018
    Date of Patent: December 7, 2021
    Inventors: Eun Young Choi, No Jin Park, Je Gwon Lee, Yoon Hyung Hur, Sung Soo Yoon
  • Patent number: 11174360
    Abstract: The present application relates to a block copolymer and a use thereof. The present application can provide a laminate which is capable of forming a highly aligned block copolymer on a substrate and thus can be effectively applied to production of various patterned substrates, and a method for producing a patterned substrate using the same.
    Type: Grant
    Filed: November 29, 2017
    Date of Patent: November 16, 2021
    Inventors: Mi Sook Lee, Se Jin Ku, No Jin Park, Jung Keun Kim, Je Gwon Lee, Hyung Ju Ryu, Eun Young Choi
  • Patent number: 11155666
    Abstract: The present application may provide a block copolymer and a use thereof. The block copolymer of the present application has excellent self-assembly properties or phase separation characteristics, to which various functions to be required can also be freely imparted.
    Type: Grant
    Filed: November 29, 2017
    Date of Patent: October 26, 2021
    Inventors: No Jin Park, Jung Keun Kim, Je Gwon Lee, Sung Soo Yoon, Se Jin Ku, Mi Sook Lee, Eun Young Choi, Hyung Ju Ryu
  • Patent number: 11078318
    Abstract: The present application may provide a block copolymer and a use thereof. The block copolymer of the present application has excellent self-assembly properties or phase separation characteristics, to which various functions to be required can also be freely imparted.
    Type: Grant
    Filed: November 29, 2017
    Date of Patent: August 3, 2021
    Inventors: Hyung Ju Ryu, Je Gwon Lee, Se Jin Ku, Eun Young Choi, Sung Soo Yoon, No Jin Park, Jung Keun Kim, Mi Sook Lee
  • Patent number: 11059947
    Abstract: A method for producing a polymer film is disclosed herein. The method is capable of effectively forming a polymer film on a substrate, where the polymer film comprises highly aligned block copolymers without orientation defects, coordination number defects, distance defects, and the like. The method can be applied to production of various patterned substrates.
    Type: Grant
    Filed: May 29, 2019
    Date of Patent: July 13, 2021
    Inventors: Hyung Ju Ryu, Se Jin Ku, Mi Sook Lee, Sung Soo Yoon, No Jin Park, Jung Keun Kim, Je Gwon Lee, Eun Young Choi
  • Patent number: 11027532
    Abstract: The present application relates to a laminate, a method for preparing same and a use of the laminate. The present application can provide a method for forming a film, which comprises a self-assembled block copolymer, to have excellent uniformity in thickness even when the film is formed over a large area, a laminate comprising a polymer film formed by means of the method, and a use of same.
    Type: Grant
    Filed: June 13, 2016
    Date of Patent: June 8, 2021
    Inventors: Eun Young Choi, Se Jin Ku, Sung Soo Yoon, No Jin Park, Jung Keun Kim, Je Gwon Lee, Mi Sook Lee