Patents by Inventor Jea-Roung LIM

Jea-Roung LIM has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Deposition apparatus, deposition method using the same, and manufacturing method of organic light-emitting display apparatus
    Patent number: 9525156
    Abstract: A deposition method using a deposition apparatus includes: depositing a first deposition layer on substrates in first process chambers of a first deposition cluster; transferring a substrate of the substrates in one of the first process chambers into a first transfer chamber of the first deposition cluster, which is connected to each of the first process chambers; transferring the substrate within the first transfer chamber of the first deposition cluster into a connection chamber, which is connected to the first transfer chamber and first and second gas supply lines; supplying a gas into the connection chamber through the second gas supply line to change an inside pressure of the connection chamber from a preset first pressure into a preset second pressure, which is different from an atmospheric pressure; and transferring the substrate within the connection chamber into a second transfer chamber of a second deposition cluster.
    Type: Grant
    Filed: March 10, 2014
    Date of Patent: December 20, 2016
    Assignee: SAMSUNG DISPLAY CO., LTD.
    Inventor: Jea-Roung Lim
  • DEPOSITION APPARATUS, DEPOSITION METHOD USING THE SAME, AND MANUFACTURING METHOD OF ORGANIC LIGHT-EMITTING DISPLAY APPARATUS
    Publication number: 20150044800
    Abstract: A deposition method using a deposition apparatus includes: depositing a first deposition layer on substrates in first process chambers of a first deposition cluster; transferring a substrate of the substrates in one of the first process chambers into a first transfer chamber of the first deposition cluster, which is connected to each of the first process chambers; transferring the substrate within the first transfer chamber of the first deposition cluster into a connection chamber, which is connected to the first transfer chamber and first and second gas supply lines; supplying a gas into the connection chamber through the second gas supply line to change an inside pressure of the connection chamber from a preset first pressure into a preset second pressure, which is different from an atmospheric pressure; and transferring the substrate within the connection chamber into a second transfer chamber of a second deposition cluster.
    Type: Application
    Filed: March 10, 2014
    Publication date: February 12, 2015
    Applicant: Samsung Display Co., LTD.
    Inventor: Jea-Roung LIM