Patents by Inventor Jea Sik Lee

Jea Sik Lee has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7504344
    Abstract: A method of forming a hydrocarbon-containing polymer film on a semiconductor substrate by a capacitively-coupled plasma CVD apparatus. The method includes the steps of: vaporizing a hydrocarbon-containing liquid monomer (C?H?X?, wherein ? and ? are natural numbers of 5 or more; ? is an integer including zero; X is O, N or F) having a boiling point of about 20° C. to about 350° C. which is not substituted by a vinyl group or an acetylene group; introducing the vaporized gas into a CVD reaction chamber inside which a substrate is placed; and forming a hydrocarbon-containing polymer film on the substrate by plasma polymerization of the gas.
    Type: Grant
    Filed: June 30, 2005
    Date of Patent: March 17, 2009
    Assignee: ASM Japan K.K.
    Inventors: Nobuo Matsuki, Yoshinori Morisada, Seijiro Umemoto, Jea Sik Lee
  • Patent number: 7470633
    Abstract: A method forms a hydrocarbon-containing polymer film on a semiconductor substrate by a capacitively-coupled plasma CVD apparatus. The method includes the steps of: vaporizing a hydrocarbon-containing liquid monomer (C?H?X?, wherein ? and ? are natural numbers of 5 or more; ? is an integer including zero; X is O, N or F) having a boiling point of about 20° C. to about 350° C.; introducing the vaporized gas into a CVD reaction chamber inside which a substrate is placed; and forming a hydrocarbon-containing polymer film on the substrate by plasma polymerization of the gas.
    Type: Grant
    Filed: September 20, 2006
    Date of Patent: December 30, 2008
    Assignee: ASM Japan K.K.
    Inventors: Nobuo Matsuki, Yoshinori Morisada, Seijiro Umemoto, Jea Sik Lee