Patents by Inventor Jea-Hyoung Lee

Jea-Hyoung Lee has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8288289
    Abstract: A method of fabricating a semiconductor device, the method including providing a substrate; forming an underlying layer on the substrate; forming a sacrificial layer on the underlying layer; forming an opening in the sacrificial layer by patterning the sacrificial layer such that the opening exposes a predetermined region of the underlying layer; forming a mask layer in the opening; forming an oxide mask by partially or completely oxidizing the mask layer; removing the sacrificial layer; and etching the underlying layer using the oxide mask as an etch mask to form an underlying layer pattern.
    Type: Grant
    Filed: January 28, 2011
    Date of Patent: October 16, 2012
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Jun-Ho Jeong, Jang-Eun Lee, Se-Chung Oh, Suk-Hun Choi, Jea-Hyoung Lee, Woo-Jin Kim, Woo-Chang Lim
  • Publication number: 20110189851
    Abstract: A method of fabricating a semiconductor device, the method including providing a substrate; forming an underlying layer on the substrate; forming a sacrificial layer on the underlying layer; forming an opening in the sacrificial layer by patterning the sacrificial layer such that the opening exposes a predetermined region of the underlying layer; forming a mask layer in the opening; forming an oxide mask by partially or completely oxidizing the mask layer; removing the sacrificial layer; and etching the underlying layer using the oxide mask as an etch mask to form an underlying layer pattern.
    Type: Application
    Filed: January 28, 2011
    Publication date: August 4, 2011
    Inventors: Jun-Ho JEONG, Jang-Eun Lee, Se-Chung Oh, Suk-Hun Choi, Jea-Hyoung Lee, Woo-Jin Kim, Woo-Chang Lim