Abstract: A sample holding device for use in transverse illumination of a sample or sub-components of a sample comprising: a support substrate comprising a sample well adapted to contain and be compatible with said sample wherein said well is provided on at least one wall with an angled reflective surface adjacent said sample well which when in use directs a transverse light beam from a light source through a sample contained within said sample well to provide substantially transverse illumination of a sample contained therein and imaging the sample using a single objective.

Abstract: Accurate localization of isolated particles is important in single particle based super-resolution microscopy. It allows the imaging of biological samples with nanometer-scale resolution using a simple fluorescence microscopy setup. Nevertheless, conventional techniques for localizing single particles can take minutes to hours of computation time because they require up to a million localizations to form an image. In contrast, the present particle localization techniques use wavelet-based image decomposition and image segmentation to achieve nanometer-scale resolution in two dimensions within seconds to minutes. This two-dimensional localization can be augmented with localization in a third dimension based on a fit to the imaging system's point-spread function (PSF), which may be asymmetric along the optical axis. For an astigmatic imaging system, the PSF is an ellipse whose eccentricity and orientation varies along the optical axis.

Abstract: According to one aspect, the invention concerns a method for microscopy of a thick sample arranged on a sample support, with edge-illumination of the sample. The method comprises, in particular, emitting at least one illumination beam (1), forming, from the illumination beam, an illumination surface, focusing the illumination surface in the sample by means of a microscope lens (120) and deflecting the illumination surface originating from the microscope lens, in order to form a transverse illumination surface, located in a plane substantially perpendicular to the optical axis of the microscope lens.

Abstract: A sample holding device for use in transverse illumination of a sample or sub-components of a sample comprising: a support substrate comprising a sample well adapted to contain and be compatible with said sample wherein said well is provided on at least one wall with an angled reflective surface adjacent said sample well which when in use directs a transverse light beam from a light source through a sample contained within said sample well to provide substantially transverse illumination of a sample contained therein and imaging the sample using a single objective.

Abstract: According to one aspect, the invention concerns a method for microscopy of a thick sample arranged on a sample support, with edge-illumination of the sample. The method comprises, in particular, emitting at least one illumination beam (1), forming, from the illumination beam, an illumination surface, focusing the illumination surface in the sample by means of a microscope lens (120) and deflecting the illumination surface originating from the microscope lens, in order to form a transverse illumination surface, located in a plane substantially perpendicular to the optical axis of the microscope lens.

Abstract: Accurate localization of isolated particles is important in single particle based super-resolution microscopy. It allows the imaging of biological samples with nanometer-scale resolution using a simple fluorescence microscopy setup. Nevertheless, conventional techniques for localizing single particles can take minutes to hours of computation time because they require up to a million localizations to form an image. In contrast, the present particle localization techniques use wavelet-based image decomposition and image segmentation to achieve nanometer-scale resolution in two dimensions within seconds to minutes. This two-dimensional localization can be augmented with localization in a third dimension based on a fit to the imaging system's point-spread function (PSF), which may be asymmetric along the optical axis. For an astigmatic imaging system, the PSF is an ellipse whose eccentricity and orientation varies along the optical axis.

Abstract: Accurate localization of isolated particles is important in single particle based super-resolution microscopy. It allows the imaging of biological samples with nanometer-scale resolution using a simple fluorescence microscopy setup. Nevertheless, conventional techniques for localizing single particles can take minutes to hours of computation time because they require up to a million localizations to form an image. In contrast, the present particle localization techniques use wavelet-based image decomposition and image segmentation to achieve nanometer-scale resolution in two dimensions within seconds to minutes. This two-dimensional localization can be augmented with localization in a third dimension based on a fit to the imaging system's point-spread function (PSF), which may be asymmetric along the optical axis. For an astigmatic imaging system, the PSF is an ellipse whose eccentricity and orientation varies along the optical axis.

Abstract: Accurate localization of isolated particles is important in single particle based super-resolution microscopy. It allows the imaging of biological samples with nanometer-scale resolution using a simple fluorescence microscopy setup. Nevertheless, conventional techniques for localizing single particles can take minutes to hours of computation time because they require up to a million localizations to form an image. In contrast, the present particle localization techniques use wavelet-based image decomposition and image segmentation to achieve nanometer-scale resolution in two dimensions within seconds to minutes. This two-dimensional localization can be augmented with localization in a third dimension based on a fit to the imaging system's point-spread function (PSF), which may be asymmetric along the optical axis. For an astigmatic imaging system, the PSF is an ellipse whose eccentricity and orientation varies along the optical axis.