Patents by Inventor Jean Barreiro

Jean Barreiro has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • RF plasma reactor having a distribution chamber with at least one grid
    Patent number: 9045828
    Abstract: A plasma reactor has a reactor vessel and a pair of electrodes in the form of spaced apart and oppositely disposed metallic surfaces defining therebetween a plasma discharge space. At least one of the metallic surfaces is the surface of a metallic plate having a plurality of gas feed openings extending through the metallic surface towards said discharge space and from a distribution chamber extending along the plate opposite the discharge space. The distribution chamber has a wall opposite and distant from the plate and includes a gas inlet arrangement with a plurality of gas inlet openings distributed along the wall and connected to one or more gas feed lines to the reactor. A gas flow resistant coefficient between the one or more gas feed lines and at least a predominant portion of the connected inlet openings are at least substantially equal.
    Type: Grant
    Filed: October 23, 2007
    Date of Patent: June 2, 2015
    Assignee: TEL Solar AG
    Inventors: Emmanuel Turlot, Jean-Baptiste Chevrier, Jacques Schmitt, Jean Barreiro
  • RF Plasma Reactor Having a Distribution Chamber with at Least One Grid
    Publication number: 20080093341
    Abstract: A plasma reactor has a reactor vessel and a pair of electrodes in the form of spaced apart and oppositely disposed metallic surfaces defining therebetween a plasma discharge space. At least one of the metallic surfaces is the surface of a metallic plate having a plurality of gas feed openings extending through the metallic surface towards said discharge space and from a distribution chamber extending along the plate opposite the discharge space. The distribution chamber has a wall opposite and distant from the plate and includes a gas inlet arrangement with a plurality of gas inlet openings distributed along the wall and connected to one or more gas feed lines to the reactor. A gas flow resistant coefficient between the one or more gas feed lines and at least a predominant portion of the connected inlet openings are at least substantially equal.
    Type: Application
    Filed: October 23, 2007
    Publication date: April 24, 2008
    Applicant: Unaxis Balzers Aktiengesellschaft
    Inventors: Emmanuel Turlot, Jean-Baptiste Chevrier, Jacques Schmitt, Jean Barreiro
  • RF plasma reactor having a distribution chamber with at least one grid
    Patent number: 7306829
    Abstract: A plasma reactor has a reactor vessel and a pair of electrodes in the form of spaced apart and oppositely disposed metallic surfaces defining therebetween a plasma discharge space. At least one of the metallic surfaces is the surface of a metallic plate having a plurality of gas feed openings extending through the metallic surface towards said discharge space and from a distribution chamber extending along the plate opposite the discharge space. The distribution chamber has a wall opposite and distant from the plate and includes a gas inlet arrangement with a plurality of gas inlet openings distributed along the wall and connected to one or more gas feed lines to the reactor. A gas flow resistant coefficient between the one or more gas feed lines and at least a predominant portion of the connected inlet openings are at least substantially equal.
    Type: Grant
    Filed: November 21, 2002
    Date of Patent: December 11, 2007
    Assignee: Unaxis Balzers Aktiengesellschaft
    Inventors: Emmanuel Turlot, Jean-Baptiste Chevrier, Jacques Schmitt, Jean Barreiro
  • RF plasma reactor
    Publication number: 20030070761
    Abstract: A plasma reactor has a reactor vessel and a pair of electrodes in the form of spaced apart and oppositely disposed metallic surfaces defining therebetween a plasma discharge space. At least one of the metallic surfaces is the surface of a metallic plate having a plurality of gas feed openings extending through the metallic surface towards said discharge space and from a distribution chamber extending along the plate opposite the discharge space. The distribution chamber has a wall opposite and distant from the plate and includes a gas inlet arrangement with a plurality of gas inlet openings distributed along the wall and connected to one or more gas feed lines to the reactor. A gas flow resistant coefficient between the one or more gas feed lines and at least a predominant portion of the connected inlet openings are at least substantially equal.
    Type: Application
    Filed: November 21, 2002
    Publication date: April 17, 2003
    Applicant: Unaxis Balzers Aktiengesellschaft
    Inventors: Emmanuel Turlot, Jean-Baptiste Chevrier, Jacques Schmitt, Jean Barreiro
  • Design of gas injection for the electrode in a capacitively coupled RF plasma reactor
    Patent number: 6502530
    Abstract: A plasma reactor has a reactor vessel and a pair of electrodes in the form of spaced apart and oppositely disposed metallic surfaces defining therebetween a plasma discharge space. At least one of the metallic surfaces is the surface of a metallic plate having a plurality of gas feed openings extending through the metallic surface towards said discharge space and from a distribution chamber extending along the plate opposite the discharge space. The distribution chamber has a wall opposite and distant from the plate and includes a gas inlet arrangement with a plurality of gas inlet openings distributed along the wall and connected to one or more gas feed lines to the reactor. A gas flow resistant coefficient between the one or more gas feed lines and at least a predominant portion of the connected inlet openings are at least substantially equal.
    Type: Grant
    Filed: April 26, 2000
    Date of Patent: January 7, 2003
    Assignee: Unaxis Balzers Aktiengesellschaft
    Inventors: Emmanuel Turlot, Jean-Baptiste Chevrier, Jacques Schmitt, Jean Barreiro