Patents by Inventor Jean-Eric Larcher
Jean-Eric Larcher has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11725662Abstract: A pumping method in a pumping system comprises: a main vacuum pump with a gas inlet port connected to a vacuum chamber and a gas outlet port leading into a conduit before coming out into the gas outlet of the pumping system, a non-return valve positioned in the conduit between the gas outlet port and the gas outlet, and an auxiliary vacuum pump connected in parallel to the non-return valve. The main vacuum pump is activated in order to pump the gases contained in the vacuum chamber through the gas outlet port, simultaneously the auxiliary vacuum pump is activated and continues to operate all the while that the main vacuum pump pumps the gases contained in the vacuum chamber and/or all the while that the main vacuum pump maintains a defined pressure in the vacuum chamber. Also included is a pumping system.Type: GrantFiled: May 6, 2020Date of Patent: August 15, 2023Assignee: Ateliers Busch SAInventors: Didier Müller, Jean-Eric Larcher, Théodore Iltchev
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Publication number: 20230003208Abstract: The present invention relates to a redundant vacuum pumping system (300) and a pumping method using this system, comprising a primary roots pump (302), a first pumping sub-system (310) and a second pumping sub-system (320), wherein the first pumping sub-system (310) and the second pumping sub-system (320) are arranged to pump in parallel the gas evacuated by the primary roots pump (302), the first pumping sub-system (310) comprising a first secondary roots pump (311) and a first positive displacement pump (312) and a first valve (313) positioned between the gas discharge outlet (302b) of the primary roots pump (302) and the gas suction inlet (311a) of the first secondary roots pump (311), and the second pumping sub-system (320) comprising a second secondary roots pump (311) and a second positive displacement pump (312) and a second valve (323) positioned between the gas discharge outlet (302b) of the primary roots pump (302) and the gas suction inlet (321a) of the second secondary roots pump (321).Type: ApplicationFiled: December 4, 2019Publication date: January 5, 2023Inventors: Paul Alers, Jeihong Kim, Jean-Eric Larcher
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Patent number: 10808730Abstract: The present invention relates to a pumping system to generate a vacuum (SP), comprising a main vacuum pump which is a claw pump (3) having a gas suction inlet (2) connected to a vacuum chamber (1) and a gas discharge outlet (4) leading into a gas evacuation conduit (5) in the direction of a gas exhaust outlet (8) outside the pumping system. The pumping system comprises a non-return valve (6) positioned between the gas discharge outlet (4) and the gas exhaust outlet (8), and an auxiliary vacuum pump (7) connected in parallel to the non-return valve. In a pumping method by means of this pumping system (SP), the main vacuum pump (3) is started up in order to pump the gases contained in the vacuum chamber (1) and to discharge these gases through its gas discharge outlet (4), simultaneously to which the auxiliary vacuum pump (7) is started up.Type: GrantFiled: October 2, 2014Date of Patent: October 20, 2020Assignee: Ateliers Busch SAInventors: Didier Müller, Jean-Eric Larcher, Théodore Iltchev
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Publication number: 20200318640Abstract: A pumping method in a pumping system comprises: a main vacuum pump with a gas inlet port connected to a vacuum chamber and a gas outlet port leading into a conduit before coming out into the gas outlet of the pumping system, a non-return valve positioned in the conduit between the gas outlet port and the gas outlet, and an auxiliary vacuum pump connected in parallel to the non-return valve. The main vacuum pump is activated in order to pump the gases contained in the vacuum chamber through the gas outlet port, simultaneously the auxiliary vacuum pump is activated and continues to operate all the while that the main vacuum pump pumps the gases contained in the vacuum chamber and/or all the while that the main vacuum pump maintains a defined pressure in the vacuum chamber. Also included is a pumping system.Type: ApplicationFiled: May 6, 2020Publication date: October 8, 2020Inventors: Didier Müller, Jean-Eric Larcher, Théodore lltchev
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Patent number: 10760573Abstract: The present invention relates to a pumping method in a pumping system (SP, SPP) comprising: a main lubricated rotary vane vacuum pump (3) with a gas inlet port (2) connected to a vacuum chamber (1) and a gas outlet port (4) leading into a conduit (5) before coming out into the gas outlet (8) of the pumping system (SP, SPP), a non-return valve (6) positioned in the conduit (5) between the gas outlet port (4) and the gas outlet (8), and an auxiliary lubricated rotary vane vacuum pump (7) connected in parallel to the non-return valve (6).Type: GrantFiled: June 27, 2014Date of Patent: September 1, 2020Assignee: Ateliers Busch SAInventors: Didier Müller, Jean-Eric Larcher, Théodore Iltchev
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Patent number: 10260502Abstract: The present invention relates to a pumping method in a pumping system (SP) comprising: a primary dry screw-type vacuum pump (3) with a gas entry orifice (2) connected to a vacuum chamber (1) and a gas exit orifice (4) leading into a conduit (5) before coming out into the gas outlet (8) of the pumping system (SP), a non-return valve (6) positioned in the conduit (5) between the gas exit orifice (4) and the gas outlet (8), and an ejector (7) connected in parallel to the non-return valve (6).Type: GrantFiled: April 7, 2014Date of Patent: April 16, 2019Assignee: Ateliers Busch SAInventors: Didier Müller, Jean-Eric Larcher, Théodore Iltchev
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Publication number: 20170298935Abstract: The present invention relates to a pumping system to generate a vacuum (SP), comprising a main vacuum pump which is a dry screw pump (3) having a gas suction inlet (2) connected to a vacuum chamber (1) and a gas discharge outlet (4) leading into a gas evacuation conduit (5) in the direction of a gas exhaust outlet (8) outside the pumping system. The pumping system comprises a non-return valve (6) positioned between the gas discharge outlet (4) and the gas exhaust outlet (8), and an auxiliary vacuum pump (7) connected in parallel to the non-return valve. In a pumping method by means of this pumping system (SP), the main vacuum pump (3) is started up in order to pump the gases contained in the vacuum chamber (1) and to discharge these gases through its gas discharge outlet (4), simultaneously to which the auxiliary vacuum pump (7) is started up.Type: ApplicationFiled: September 26, 2014Publication date: October 19, 2017Inventors: Didier MÜLLER, Jean-Eric LARCHER, Théodore ILTCHEV
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Publication number: 20170284394Abstract: The present invention relates to a pumping system to generate a vacuum (SP), comprising a main vacuum pump which is a claw pump (3) having a gas suction inlet (2) connected to a vacuum chamber (1) and a gas discharge outlet (4) leading into a gas evacuation conduit (5) in the direction of a gas exhaust outlet (8) outside the pumping system. The pumping system comprises a non-return valve (6) positioned between the gas discharge outlet (4) and the gas exhaust outlet (8), and an auxiliary vacuum pump (7) connected in parallel to the non-return valve. In a pumping method by means of this pumping system (SP), the main vacuum pump (3) is started up in order to pump the gases contained in the vacuum chamber (1) and to discharge these gases through its gas discharge outlet (4), simultaneously to which the auxiliary vacuum pump (7) is started up.Type: ApplicationFiled: October 2, 2014Publication date: October 5, 2017Inventors: Didier MÜLLER, Jean-Eric LARCHER, Théodore ILTCHEV
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Publication number: 20170122321Abstract: The present invention relates to a pumping method in a pumping system (SP, SPP) comprising: a main lubricated rotary vane vacuum pump (3) with a gas inlet port (2) connected to a vacuum chamber (1) and a gas outlet port (4) leading into a conduit (5) before coming out into the gas outlet (8) of the pumping system (SP, SPP), a non-return valve (6) positioned in the conduit (5) between the gas outlet port (4) and the gas outlet (8), and an auxiliary lubricated rotary vane vacuum pump (7) connected in parallel to the non-return valve (6).Type: ApplicationFiled: June 27, 2014Publication date: May 4, 2017Inventors: Didier Müller, Jean-Eric Larcher, Théodore Iltchev
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Publication number: 20170089339Abstract: The present invention relates to a pumping method in a pumping system (SP) comprising: a primary dry screw-type vacuum pump (3) with a gas entry orifice (2) connected to a vacuum chamber (1) and a gas exit orifice (4) leading into a conduit (5) before coming out into the gas outlet (8) of the pumping system (SP), a non-return valve (6) positioned in the conduit (5) between the gas exit orifice (4) and the gas outlet (8), and an ejector (7) connected in parallel to the non-return valve (6).Type: ApplicationFiled: April 7, 2014Publication date: March 30, 2017Inventors: Didier Müller, Jean-Eric LARCHER, Théodore ILTCHEV
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Publication number: 20170045051Abstract: The present invention relates to a pumping method in a pumping system (SP, SPP) comprising: a primary lubricated rotary vane vacuum pump (3) with a gas inlet port (2) connected to a vacuum chamber (1) and a gas outlet port (4) leading into a conduit (5) before coming out into the gas outlet (8) of the pumping system (SP, SPP), a non-return valve (6) positioned in the conduit (5) between the gas outlet port (4) and the gas outlet (8), and an ejector (7) connected in parallel to the non-return valve (6). According to this method, the primary lubricated rotary vane vacuum pump (3) is set into action in order to pump the gases contained in the vacuum chamber (1) through the gas outlet port (4).Type: ApplicationFiled: May 1, 2014Publication date: February 16, 2017Inventors: Didier MÜLLER, Jean-Eric LARCHER, Théodore ILTCHEV
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Patent number: 8803104Abstract: An ionization cell for a mass spectrometer (2) includes: an ionization housing (10) having a first and a second electron input groove (11, 26) and one side (16) of which has an output groove (15) for passing ionized particles (14a, 14b, 14c) therethrough, a first working filament (13) placed opposite the first electron input groove (11) and intended to be supplied to produce an electron beam (12), and a second backup filament (22) placed opposite the second electron input groove (26) and intended to be supplied in the event the first working filament (13) fails so as to produce the electron beam, the input groove (26) being placed outside a front region (F) located opposite the first input groove (11). The invention also relates to a leak detector with a mass spectrometer, which includes such an above-described ionization cell.Type: GrantFiled: March 10, 2010Date of Patent: August 12, 2014Assignee: Adixen Vacuum ProductsInventors: Laurent Ducimetiere, Cyrille Nomine, Jean-Eric Larcher
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Publication number: 20110315875Abstract: An ionization cell for a mass spectrometer (2) includes: an ionization housing (10) having a first and a second electron input groove (11, 26) and one side (16) of which has an output groove (15) for passing ionized particles (14a, 14b, 14c) therethrough, a first working filament (13) placed opposite the first electron input groove (11) and intended to be supplied to produce an electron beam (12), and a second backup filament (22) placed opposite the second electron input groove (26) and intended to be supplied in the event the first working filament (13) fails so as to produce the electron beam, the input groove (26) being placed outside a front region (F) located opposite the first input groove (11). The invention also relates to a leak detector with a mass spectrometer, which includes such an above-described ionization cell.Type: ApplicationFiled: March 10, 2010Publication date: December 29, 2011Applicant: ADIXEN VACUUM PRODUCTSInventors: Laurent Ducimetiere, Cyrille Nomine, Jean-Eric Larcher