Patents by Inventor Jean L. Domblides

Jean L. Domblides has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Chemical vapor infiltration method utilizing substantially diffusive conditions
    Patent number: 5217755
    Abstract: A porous substrate is placed inside an enclosure and a gas flow is injected into the enclosure under predetermined conditions of temperature and pressure to form a solid deposit within the accessible pores inside the substrate. A wall that is permeable to the gas flow is interposed on the path of the flow between its inlet into the enclosure and the substrate, the wall not being in contact with the substrate, thereby forming around the substrate a region which is free from strong turbulence so that infiltration is performed essentially under diffusion conditions, thereby minimizing the deposition gradient within the volume of the substrate.
    Type: Grant
    Filed: December 16, 1991
    Date of Patent: June 8, 1993
    Assignee: Societe Europeenne de Propulsion
    Inventors: Jacques Thebault, Jean L. Domblides, Lionel Vandenbulcke