Abstract: Methods for treating polymeric substrates by placing the substrate in a gaseous mixture and subjecting it to a dielectric barrier electrical discharge. The gaseous mixture, which has a pressure around atmospheric, contains a carrier gas, a reducing gas and an oxidizing gas. The amount of the oxidizing gas in the gas mixture is between about 50 ppm and about 2000 ppm by volume, while the amount of the reducing gas in the gas mixture is between about 50 ppm and 30000 ppm by volume.

Abstract: The invention concerns a method for the surface treatment of polymeric substrates whereby the substrate is subjected to a dielectric barrier electrical discharge, in a gaseous mixture comprising a carrier gas, and a reducing and/or oxidising gas, at a pressure substantially equal to atmospheric pressure. The invention is characterised in that it comprises the following implementing conditions: when the mixture comprises an oxidising gas, the oxidising gas content in the mixture ranges between 50 to 2000 ppm by volume; when the mixture comprises a reducing gas, the reducing gas content in the mixture ranges between 50 to 30000 ppm by volume.

Abstract: Optimization of an installation in which an operation is performed that requires control over the atmosphere inside a chamber (3), the operation being performed in the presence of a gaseous mixture capable of giving off emissions, the optimization being obtained by the presence of inlet (5) and outlet (8) devices external to the chamber to oppose the ingress of air into the chamber and the exit of gaseous emissions; and of an extraction device (4) comprising means (42) for regulating the flow rate to maintain an approximately zero pressure differential between the inside and the outside of the chamber.

Abstract: Optimization of an installation in which an operation is performed that requires control over the atmosphere inside a chamber (3), the operation being performed in the presence of a gaseous mixture capable of giving off emissions, the optimization being obtained by the presence of inlet (5) and outlet (8) devices external to the chamber to oppose the ingress of air into the chamber and the exit of gaseous emissions; and of an extraction device (4) comprising means (42) for regulating the flow rate to maintain an approximately zero pressure differential between the inside and the outside of the chamber.

Abstract: Process and apparatus for the separation of at least one gas from an entering gaseous mixture (1), of the type in which a membrane separation is conducted with at least two successive membrane separators in the following manner: the entering mixture is passed through a first membrane separator (2) operating at a first operating temperature and all or a portion of the residual mixture (5) from this first membrane separator is passed through a second membrane separator (3) operating at a second operating temperature. A mixture enriched in the gas is obtained from the permeate outlet (6, 4) of each of these two separators. Two separators are used whose selectivities for the gas are different. These may be membranes of different type, or membranes of the same type, if the first operating temperature is different from the second operating temperature.