Abstract: A composition and process to make polyurethane foam using a stable liquid catalyst composition comprising at least one liquid bismuth carboxylate catalyst and at least one liquid dialkyltin dicarboxylate complex are disclosed. The disclosed composition and process yield polyurethane foam having favorable properties, but requiring less metal. The polyurethane foams produced by this catalyst composition and method are useful for laminated boardstock, construction panels, appliance insulation, spray-applied insulation, seat cushions, and mattresses.

Abstract: A composition and process to make polyurethane foam using a stable liquid catalyst composition comprising at least one liquid bismuth carboxylate catalyst and at least one liquid dialkyltin dicarboxylate complex are disclosed. The disclosed composition and process yield polyurethane foam having favorable properties, but requiring less metal. The polyurethane foams produced by this catalyst composition and method are useful for laminated boardstock, construction panels, appliance insulation, spray-applied insulation, seat cushions, and mattresses.

Abstract: Catalyst compositions useful in the production of insulating polyurethane or polyisocyanurate foam are disclosed. The catalyst compositions impart increased stability of a mixture of the catalyst, a halogen-containing blowing agent, and a polyol. These catalyst compositions comprise of at least 10% of a tetraalkylguanidine and at least 10% of a tertiary amine catalyst with an isocyanate reactive group. These improved catalysts can be used with any halogenated blowing agent, and provide substantial stability benefits with the use of hydrofluoroolefins and hydrofluorochloroolefins. In an exemplary embodiment, a process includes providing a pre-mix comprising a hydrohaloolefin blowing agent, at least one polyol, water, and a catalyst comprising 10-50% tetramethylguanidine and 10-90% of one or more of an amine catalyst containing an isocyanate reactive group.

Abstract: A composition and process to make polyisocyanurate or polyurethane foam using a catalyst composition comprising at least one bismuth carboxylate catalyst and one or more co-catalysts selected from the group of alkali metal carboxylates and quaternary ammonium carboxylate salts, such that the resultant foam has improved insulation properties. The polyisocyanurate or polyurethane foams produced by this catalyst composition and method are useful for laminated boardstock, construction panels, appliance insulation, and spray-applied insulation.

Abstract: Catalyst compositions useful in the production of insulating polyurethane or polyisocyanurate foam are disclosed. The catalyst compositions impart increased stability of a mixture of the catalyst, a halogen-containing blowing agent, and a polyol. These catalyst compositions include amine/acid salts with a pH of <7.0 which can be used in combined with tertiary amine catalysts and metal-based or ammonium-based trimerization catalyst and at least one metal-based gel catalyst and optionally one or more of an additional catalyst described in (1) or (2). These improved catalysts can be used with any halogenated blowing agent, and provide substantial stability benefits with the use of hydrofluoroolefins and hydrofluorochloroolefins.

Abstract: Methods for preparing polyurethane flexible foam are described, wherein an organic polyisocyanate is reacted with an active hydrogen-containing component such as an organic polyol, in the presence of a urethane catalyst, a blowing agent, optionally a cell opener, and a siloxane-based surfactant composition as a stabilizer for the foam. The siloxane-based surfactant composition comprises a silanol-functionalized organosiloxane having general formula (I), wherein: the R groups are independently a C1-C3 alkyl, phenyl, or —OSi(R)3; provided that at least one R group is a hydroxyl (—OH) bonded directly to any silicon atom and X is an integer from 0-200.

Abstract: Alkylethoxylate alcohols or mixtures of alkyl alcohol ethoxylate with an average HLB value between 10 and 15 as compatibilizers for water blown polyurethane foam formulations that are substantially free of nonylphenol ethoxylates are disclosed. The HLB is defined as the mass percent of average structure of the compatibilizer that is hydrophilic, divided by 5. The compatibilizer is mixed into the B-side of the polyurethane formulation. The B-side of the spray foam formulations comprise polyol, water, amine catalyst, and the compatibilizer of the invention such that the water is present at about 2% to about 30% by weight of the B-side formulation, and the compatibilizer is present at about 1% to about 30% by weight of the B-side formulation. The B-side of the formulation may further comprise metal catalysts, flame retardants, silicone surfactants, cell openers, antioxidants, as well as other additives.

Abstract: The present invention is a process for forming an air gap within a substrate, the process comprising: providing a substrate; depositing a sacrificial material by deposition of at least one sacrificial material precursor; depositing a composite layer; removal of the porogen material in the composite layer to form a porous layer and contacting the layered substrate with a removal media to substantially remove the sacrificial material and provide the air gaps within the substrate; wherein the at least one sacrificial material precursor is selected from the group consisting of: an organic porogen; silicon, and a polar solvent soluble metal oxide and mixtures thereof.

Abstract: Catalyst compositions useful in the production of insulating polyurethane or polyisocyanurate foam are disclosed. The catalyst compositions impart increased stability of a mixture of the catalyst, a halogen-containing blowing agent, and a polyol. These catalyst compositions comprise of at least 10% of a tetraalkylguanidine and at least 10% of a tertiary amine catalyst with an isocyanate reactive group. These improved catalysts can be used with any halogenated blowing agent, and provide substantial stability benefits with the use of hydrofluoroolefins and hydrofluorochloroolefins. In an exemplary embodiment, a process includes providing a pre-mix comprising a hydrohaloolefin blowing agent, at least one polyol, water, and a catalyst comprising 10-50% tetra methylguanidine and 10-90% of one or more of an amine catalyst containing an isocyanate reactive group.

Abstract: A composition and process to make polyisocyanurate or polyurethane foam using a catalyst composition comprising at least one bismuth carboxylate catalyst and one or more co-catalysts selected from the group of alkali metal carboxylates and quaternary ammonium carboxylate salts, such that the resultant foam has improved insulation properties. The polyisocyanurate or polyurethane foams produced by this catalyst composition and method are useful for laminated boardstock, construction panels, appliance insulation, and spray-applied insulation.

Abstract: A chemical vapor deposition method for producing a porous organosilica glass film comprising: introducing into a vacuum chamber gaseous reagents including at least one precursor selected from the group consisting of an organosilane and an organosiloxane, and a porogen that is distinct from the precursor; applying energy to the gaseous reagents in the vacuum chamber to induce reaction of the gaseous reagents to deposit a preliminary film on the substrate, wherein the preliminary film contains the porogen; and removing from the preliminary film substantially all of the porogen to provide the porous film with pores and a dielectric constant less than 2.6.

Abstract: The present invention is a process for forming an air gap within a substrate, the process comprising: providing a substrate; depositing a sacrificial material by deposition of at least one sacrificial material precursor; depositing a composite layer; removal of the porogen material in the composite layer to form a porous layer and contacting the layered substrate with a removal media to substantially remove the sacrificial material and provide the air gaps within the substrate; wherein the at least one sacrificial material precursor is selected from the group consisting of: an organic porogen; silicon, and a polar solvent soluble metal oxide and mixtures thereof.

Abstract: The present invention is a process for forming an air gap within a substrate, the process comprising: providing a substrate; depositing a sacrificial material by deposition of at least one sacrificial material precursor; depositing a composite layer; removal of the porogen material in the composite layer to form a porous layer and contacting the layered substrate with a removal media to substantially remove the sacrificial material and provide the air gaps within the substrate; wherein the at least one sacrificial material precursor is selected from the group consisting of: an organic porogen; silicon, and a polar solvent soluble metal oxide and mixtures thereof.

Abstract: Catalyst compositions useful in the production of insulating polyurethane or polyisocyanurate foam are disclosed. The catalyst compositions impart increased stability of a mixture of the catalyst, a halogen-containing blowing agent, and a polyol. These catalyst compositions include amine/acid salts with a pH of <7.0 which can be used in combined with tertiary amine catalysts and metal-based or ammonium-based trimerization catalyst and at least one metal-based gel catalyst and optionally one or more of an additional catalyst described in (1) or (2). These improved catalysts can be used with any halogenated blowing agent, and provide substantial stability benefits with the use of hydrofluoroolefins and hydrofluorochloroolefins.

Abstract: A chemical vapor deposition method for producing a porous organosilica glass film comprising: introducing into a vacuum chamber gaseous reagents including at least one precursor selected from the group consisting of an organosilane and an organosiloxane, and a porogen that is distinct from the precursor, wherein the porogen is a C4 to C14 cyclic hydrocarbon compound having a non-branching structure and a degree of unsaturation equal to or less than 2; applying energy to the gaseous reagents in the vacuum chamber to induce reaction of the gaseous reagents to deposit a preliminary film on the substrate, wherein the preliminary film contains the porogen; and removing from the preliminary film substantially all of the labile organic material to provide the porous film with pores and a dielectric constant less than 2.6.

Abstract: The present invention is a process for forming an air gap within a substrate, the process comprising: providing a substrate; depositing a sacrificial material by deposition of at least one sacrificial material precursor; depositing a composite layer; removale of the porogen material in the composite layer to form a porous layer and contacting the layered substrate with a removal media to substantially remove the sacrificial material and provide the air gaps within the substrate; wherein the at least one sacrificial material precursor is selected from the group consisting of: an organic porogen; silicon, and a polar solvent soluble metal oxide and mixtures thereof.

Abstract: A chemical vapor deposition method for producing a porous organosilica glass film comprising: introducing into a vacuum chamber gaseous reagents including at least one precursor selected from the group consisting of an organosilane and an organosiloxane, and a porogen that is distinct from the precursor; applying energy to the gaseous reagents in the vacuum chamber to induce reaction of the gaseous reagents to deposit a preliminary film on the substrate, wherein the preliminary film contains the porogen; and removing from the preliminary film substantially all of the porogen to provide the porous film with pores and a dielectric constant less than 2.6.

Abstract: A porous organosilica glass (OSG) film consists of a single phase of a material represented by the formula SivOwCxHyFz, where v+w+x+y+z=100%, v is from 10 to 35 atomic %, w is from 10 to 65 atomic %, x is from 5 to 30 atomic %, y is from 10 to 50 atomic % and z is from 0 to 15 atomic %, wherein the film has pores and a dielectric constant less than 2.6.

Abstract: Alkylethoxylate alcohols or mixtures of alkyl alcohol ethoxylate with an average HLB value between 10 and 15 as compatibilizers for water blown polyurethane foam formulations that are substantially free of nonylphenol ethoxylates are disclosed. The HLB is defined as the mass percent of average structure of the compatibilizer that is hydrophilic, divided by 5. The compatiblilizer is mixed into the B-side of the polyurethane formulation. The B-side of the spray foam formulations comprise polyol, water, amine catalyst, and the compatibilizer of the invention such that the water is present at about 2% to about 30% by weight of the B-side formulation, and the compatibilizer is present at about 1% to about 30% by weight of the B-side formulation. The B-side of the formulation may further comprise metal catalysts, flame retardants, silicone surfactants, cell openers, antioxidants, as well as other additives.

Abstract: A chemical vapor deposition process for preparing a low dielectric constant organosilicate (OSG) having enhanced mechanical properties by adjusting the amount of organic groups, such as methyl groups, within the mixture is disclosed herein. In one embodiment of the present invention, the OSG film is deposited from a mixture comprising a first silicon-containing precursor that comprises from 3 to 4 Si—O bonds per Si atom, from 0 to 1 of bonds selected from the group consisting of Si—H, Si—Br, and Si—Cl bonds per Si atom and no Si—C bonds and a second silicon-containing precursor that comprises at least one Si—C bond per Si atom. In another embodiment of the present invention, the OSG film is deposited from a mixture comprising an asymmetric silicon-containing precursor. In either embodiment, the mixture may further contain a porogen precursor to provide a porous OSG film.