Patents by Inventor Jean-Michel Simmonet

Jean-Michel Simmonet has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7145185
    Abstract: The invention concerns a voltage-controlled triac-type component, formed in a N-type substrate (1) comprising first and second vertical thyristors (Th1, Th2), a first electrode (A2) of the first thyristor, on the front side of the component, corresponding to a first N-type region (6) formed in a first P-type box (5), the first box corresponding to a first electrode (A2) of the second thyristor, the first box containing a second N-type region (8); and a pilot structure comprising, above an extension of a second electrode region (4) of the second thyristor, a second P-type box (11) containing third and fourth N-type regions, the third region (12) and a portion of the second box (11) being connected to a gate terminal (G), the fourth region (13) being connected to the second region (8).
    Type: Grant
    Filed: December 27, 2002
    Date of Patent: December 5, 2006
    Assignee: STMicroelectronics S.A.
    Inventor: Jean-Michel Simmonet
  • Publication number: 20050017263
    Abstract: The invention concerns a voltage-controlled triac-type component, formed in a N-type substrate (1) comprising first and second vertical thyristors (Th1, Th2), a first electrode (A2) of the first thyristor, on the front side of the component, corresponding to a first N-type region (6) formed in a first P-type box (5), the first box corresponding to a first electrode (A2) of the second thyristor, the first box containing a second N-type region (8); and a pilot structure comprising, above an extension of a second electrode region (4) of the second thyristor, a second P-type box (11) containing third and fourth N-type regions, the third region (12) and a portion of the second box (11) being connected to a gate terminal (G), the fourth region (13) being connected to the second region (8).
    Type: Application
    Filed: December 27, 2002
    Publication date: January 27, 2005
    Inventor: Jean-Michel Simmonet
  • Publication number: 20020000565
    Abstract: The present invention relates to a bidirectional breakover component including a lightly-doped N-type substrate, an upper P-type region extending over practically the entire upper surface of the component except its circumference, a lower P-type uniform layer on the lower surface side of the component, substantially complementary N-type regions respectively formed in the upper region and in the lower layer, a peripheral P-type well, an overdoped P-type region at the upper surface of the well, and lightly-doped N-type regions between the circumference of the upper region and the well.
    Type: Application
    Filed: October 27, 1999
    Publication date: January 3, 2002
    Inventor: JEAN-MICHEL SIMMONET
  • Patent number: 5986289
    Abstract: The present invention relates to a bidirectional breakover component including a lightly-doped N-type substrate, an upper P-type region extending over practically the entire upper surface of the component except its circumference, a lower P-type uniform layer on the lower surface side of the component, substantially complementary N-type regions respectively formed in the upper region and in the lower layer, a peripheral P-type well, an overdoped P-type region at the upper surface of the well, and lightly-doped N-type regions between the circumference of the upper region and the well.
    Type: Grant
    Filed: September 24, 1997
    Date of Patent: November 16, 1999
    Assignee: SGS-Thomson Microelectronics S.A.
    Inventor: Jean-Michel Simmonet
  • Patent number: 5914502
    Abstract: A monolithic assembly of thyristors having a common cathode and a single gate includes a lightly-doped substrate, several anode regions, on the front surface side, a cathode gate layer on the rear surface side of the substrate, a cathode layer on the rear surface side of the layer coated with a cathode metallization, a well extending from the front surface to the layer, a gate metallization formed on the upper surface of the well, and means for increasing the leakage resistance between the cathode layer and the cathode gate layer.
    Type: Grant
    Filed: July 10, 1997
    Date of Patent: June 22, 1999
    Assignee: SGS-Thomson Microelectronics S.A.
    Inventor: Jean-Michel Simmonet