Abstract: The present disclosure concern fragments of the chondroadherin (CHAD) polypeptide which are generated during the proteolytic cleavage of the third leucine repeat motif of the CHAD polypeptide. Such fragments are generated and thus associated with the onset and progression of intervertebral disc degeneration and can be used to assess the risk of a subject to develop intervertebral disc degeneration or to determine if the subject is afflicted by intervertebral disc degeneration. The fragments can also be used to screen for potential therapeutic agents for preventing, treating and/or alleviating the symptoms associated with intervertebral disc degeneration.

Abstract: A method of removing residues from an integrated device, in particular residues resulting from processing in HF vapor, is disclosed wherein the fabricated device is exposed to dry water vapor for a period of time sufficient to dissolve the residues in the dry water vapor.

Abstract: A vertebral prosthesis (10) comprising opposed ends (14,16) interconnected by a tubular side wall (12), which enclose a cavity therewithin. An inlet port (18) in fluid flow communication with the cavity permits injection of a hardenable fluid into the cavity. The tubular side wall has an expanding bellows configuration which allows for expansion of the vertebral prosthesis in an axial direction (23) such that the ends are displaced away from each other when the cavity is filled with the hardenable fluid, thereby axially expanding the vertebral prosthesis from a collapsed position to an expanded position in order to fill a space between adjacent vertebral bodies (11,13). The vertebral prosthesis (10) has an expansion ratio, defined by a total axial height of the vertebral prosthesis in the expanded position divided by a total axial height of the vertebral prosthesis in the collapsed position, that is greater that 200 percent.

Abstract: A method of removing residues from an integrated device, in particular residues resulting from processing in HF vapor, is disclosed wherein the fabricated device is exposed to dry water vapor for a period of time sufficient to dissolve the residues in the dry water vapor.