Abstract: There is disclosed a capacitive sensor on a passivation layer of a semiconductor circuit such as an ASIC, and a method for manufacturing such sensor. The system and method may comprise: forming a bottom electrode layer and landing pad on a portion of the passivation layer located over active circuitry of the ASIC; forming a gas sensitive layer onto the bottom electrode layer and the landing pad; creating a via through the gas sensitive layer to expose a portion of the landing pad; forming a top electrode layer onto the gas sensitive layer, wherein the top electrode layer completely overlays a surface area of the bottom electrode layer, and wherein the forming process for the top electrode layer deposits a portion of the top electrode layer into the via hole, thereby forming an electrical connection between the top electrode layer and the landing pad.

Abstract: There is disclosed a capacitive sensor on a passivation layer of a semiconductor circuit such as an ASIC, and a method for manufacturing such sensor. The system and method may comprise: forming a bottom electrode layer and landing pad on a portion of the passivation layer located over active circuitry of the ASIC; forming a gas sensitive layer onto the bottom electrode layer and the landing pad; creating a via through the gas sensitive layer to expose a portion of the landing pad; forming a top electrode layer onto the gas sensitive layer, wherein the top electrode layer completely overlays a surface area of the bottom electrode layer, and wherein the forming process for the top electrode layer deposits a portion of the top electrode layer into the via hole, thereby forming an electrical connection between the top electrode layer and the landing pad.

Abstract: An electronic device comprises a semiconductor substrate (2) having a cavity (32) extending into the substrate (2), a membrane (8) formed over the semiconductor substrate so as to extend across the cavity (32) in the semiconductor substrate and an active region (14, 30) supported by the membrane (8) and positioned adjacent the cavity (32). The membrane (8) comprises a single dielectric layer formed of an oxy-nitride material.

Abstract: A chemical sensor (10) is formed in part by depositing a stack of dielectric and resistive layers (13-15) on a support substrate (11). A cavity (17) is then formed on a substrate (16) to provide thermal isolation to the chemical sensor (10). The stack of dielectric and resistive layers (13-15) is then bonded to the substrate (16) and the support substrate (11) is removed. A layer of chemical sensing material (30) is then formed on the uppermost dielectric layer (15). Openings (33) may be formed through the stack of dielectric and resistive layers (13-15) to further enhance the thermal isolation of the chemical sensor (10) from the substrate (16).

Abstract: A method for forming a semiconductor sensor device comprises providing a substrate (4) and forming a sacrificial layer (18) over the substrate. The sacrificial layer (18) is then patterned and etched to leave a portion (19) on the substrate (4). A first isolation layer (6) is formed over the substrate (4) and portion (19) of the sacrificial layer and a conductive layer (12), which provides a heater for the sensor device, is formed over the first isolation layer (6). The portion (19) of the sacrificial layer is then selectively etched to form a cavity (10) between the first isolation layer (6) and the substrate (4), the cavity (10) providing thermal isolation between the heater and the substrate.