Abstract: Integrated read-only memory including nxm memory cells located at the intersections of m bit lines and n word lines in which binary information of a first type is represented by the presence of a connection to a transistor in a cell, the base of said transistor being connected to a word line while its emitter is connected to a bit line, and in which binary information of a second type is represented by the absence of a connection to a transistor in a cell, said memory being of the type in which reading is ensured by means of m read transistors the emitters of which are connected to the bit lines while their bases are connected to a reference voltage supply, the improvement comprising read transistors arranged into k adjacent sets of m/k consecutive elements, k being an integer submultiple of m, the transistors of each set being provided in the same collector epitaxial bed in a semiconductor substrate with a collector contact common to all the transistors, the collector contact of each set being connected to a

Abstract: A method and structure for correcting the voltage coefficient of resistance (VCR) of a resistor in a semiconductor body is described. The resistor may be diffused or ion implanted of one conductivity and formed in an isolated layer of the opposite type of conductivity. The layer is typically an epitaxial layer. A potential V.sub.1 is applied to one end of the resistor and a potential V.sub.2 being applied to the opposite end. The method provides means for controlling variations of the potential difference between the resistive region and the epitaxial layer, either to minimize them or to cause the distortions generated by such variations to be compensated for by equal distortions of opposite directions, such that the overall distortion will be equal to zero. There is provided means to cause the potential of the epitaxial layer to reach a suitable value, preferably a value that varies in the same manner as the average value of the resistor whose VCR is to be corrected.