Patents by Inventor Jean-Philippe USELDING

Jean-Philippe USELDING has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • ENDBLOCK FOR ROTATABLE TARGET WITH ELECTRICAL CONNECTION BETWEEN COLLECTOR AND ROTOR AT PRESSURE LESS THAN ATMOSPHERIC PRESSURE
    Publication number: 20180037984
    Abstract: An endblock for a rotatable sputtering target, such as a rotatable magnetron sputtering target, is provided. A sputtering apparatus, including one or more such endblock(s), includes locating the electrical contact(s) (e.g., brush(es)) between the collector and rotor in the endblock(s) in an area under vacuum (as opposed to in an area at atmospheric pressure).
    Type: Application
    Filed: October 18, 2017
    Publication date: February 8, 2018
    Inventors: Gilbert GALAN, Jean-Philippe USELDING, Guy COMANS, Marcel SCHLOREMBERG
  • Endblock for rotatable target with electrical connection between collector and rotor at pressure less than atmospheric pressure
    Patent number: 9809876
    Abstract: An endblock for a rotatable sputtering target, such as a rotatable magnetron sputtering target, is provided. A sputtering apparatus, including one or more such endblock(s), includes locating the electrical contact(s) (e.g., brush(es)) between the collector and rotor in the endblock(s) in an area under vacuum (as opposed to in an area at atmospheric pressure).
    Type: Grant
    Filed: January 13, 2014
    Date of Patent: November 7, 2017
    Assignee: Centre Luxembourgeois de Recherches pour le Verre et la Ceramique (C.R.V.C.) SaRL
    Inventors: Gilbert Galan, Jean-Philippe Uselding, Guy Comans, Marcel Schloremberg
  • ENDBLOCK FOR ROTATABLE TARGET WITH ELECTRICAL CONNECTION BETWEEN COLLECTOR AND ROTOR AT PRESSURE LESS THAN ATMOSPHERIC PRESSURE
    Publication number: 20150197847
    Abstract: An endblock for a rotatable sputtering target, such as a rotatable magnetron sputtering target, is provided. A sputtering apparatus, including one or more such endblock(s), includes locating the electrical contact(s) (e.g., brush(es)) between the collector and rotor in the endblock(s) in an area under vacuum (as opposed to in an area at atmospheric pressure).
    Type: Application
    Filed: January 13, 2014
    Publication date: July 16, 2015
    Applicant: Centre Luxembourgeois de Recherches pour le Verre et la Ceramique (C.R.V.C.) SaRL
    Inventors: Gilbert GALAN, Jean-Philippe USELDING, Guy COMANS, Marcel SCHLOREMBERG