Patents by Inventor Jean-Philippe Xavier Van Damme
Jean-Philippe Xavier Van Damme has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11036148Abstract: A patterning device cooling system for thermally conditioning a patterning device of a lithographic apparatus, wherein the patterning device in use, is being irradiated by exposure radiation, wherein the patterning device cooling system comprises: a thermal conditioner configured to thermally condition the patterning device; and a controller configured to control the thermal conditioner to thermally condition the patterning device dependent on an amount of the exposure radiation absorbed by the patterning device.Type: GrantFiled: December 2, 2019Date of Patent: June 15, 2021Assignee: ASML NETHERLANDS B.V.Inventors: Hakki Ergün Cekli, Güneş Nakìbo{hacek over (g)}lu, Frank Johannes Jacobus Van Boxtel, Jean-Philippe Xavier Van Damme, Richard Johannes Franciscus Van Haren
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Patent number: 10908517Abstract: The invention relates to a setpoint generator for moving a patterning device of a lithographic apparatus, the patterning device being capable of imparting a radiation beam with a pattern in its cross-section to form a patterned radiation beam, wherein the setpoint generator comprises a finite number of movement profiles for the patterning device, and wherein the setpoint generator is configured to select one of the finite number of movement profiles based on a desired movement profile and to output the selected movement profile as a setpoint for the patterning device.Type: GrantFiled: April 18, 2018Date of Patent: February 2, 2021Assignee: ASML Netherlands B.V.Inventors: Jean-Philippe Xavier Van Damme, Laurentius Johannes Adrianus Van Bokhoven, Petrus Franciscus Van Gils, Gerben Pieterse
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Publication number: 20200174381Abstract: The invention relates to a setpoint generator for moving a patterning device of a lithographic apparatus, the patterning device being capable of imparting a radiation beam with a pattern in its cross-section to form a patterned radiation beam, wherein the setpoint generator comprises a finite number of movement profiles for the patterning device, and wherein the setpoint generator is configured to select one of the finite number of movement profiles based on a desired movement profile and to output the selected movement profile as a setpoint for the patterning device.Type: ApplicationFiled: April 18, 2018Publication date: June 4, 2020Applicant: ASML Netherlands B.V.Inventors: Jean-Philippe Xavier VAN DAMME, Laurentius Johannes Adrianus VAN BOKHOVEN, Petrus Franciscus VAN GILS, Gerben PIETERSE
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Patent number: 10642166Abstract: A patterning apparatus for a lithographic apparatus, the patterning apparatus including a patterning device support structure configured to support a patterning device having a planar surface; a patterning device conditioning system including a first gas outlet configured to provide a first gas flow over the planar surface in use and a second gas outlet configured to provide a second gas flow over the planar surface in use, wherein the first gas outlet and the second gas outlet are arranged at different distances perpendicular to the planar surface; and a control system configured to independently control a first momentum of gas exiting the first gas outlet and a second momentum of gas exiting the second gas outlet or to independently vary the first gas flow and/or the second gas flow over the planar surface of the patterning device.Type: GrantFiled: July 22, 2019Date of Patent: May 5, 2020Assignees: ASML Holding N.V., ASML Netherlands B.V.Inventors: Güneş Nakíbo{hacek over (g)}lu, Lowell Lane Baker, Ruud Hendrikus Martinus Johannes Bloks, Hakki Ergün Cekli, Geoffrey Alan Schultz, Laurentius Johannes Adrianus Van Bokhoven, Frank Johannes Jacobus Van Boxtel, Jean-Philippe Xavier Van Damme, Christopher Charles Ward
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Publication number: 20200103767Abstract: A patterning device cooling system for thermally conditioning a patterning device of a lithographic apparatus, wherein the patterning device in use, is being irradiated by exposure radiation, wherein the patterning device cooling system comprises: a thermal conditioner configured to thermally condition the patterning device; and a controller configured to control the thermal conditioner to thermally condition the patterning device dependent on an amount of the exposure radiation absorbed by the patterning device.Type: ApplicationFiled: December 2, 2019Publication date: April 2, 2020Applicant: ASML NETHERLANDS B.V.Inventors: Hakki Ergün CEKLI, Günes NAKIBOGLU, Frank Johannes Jacobus VAN BOXTEL, Jean-Philippe Xavier VAN DAMME, Richard Johannes Franciscu VAN HAREN
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Patent number: 10495986Abstract: A patterning device cooling system for thermally conditioning a patterning device of a lithographic apparatus, wherein the patterning device in use, is being irradiated by exposure radiation, wherein the patterning device cooling system has: a thermal conditioner configured to thermally condition the patterning device; and a controller configured to control the thermal conditioner to thermally condition the patterning device dependent on an amount of the exposure radiation absorbed by the patterning device.Type: GrantFiled: February 16, 2017Date of Patent: December 3, 2019Assignee: ASML NETHERLANDS B.V.Inventors: Hakki Ergün Cekli, Güneş Nakibo{hacek over (g)}lu, Frank Johannes Jacobus Van Boxtel, Jean-Philippe Xavier Van Damme, Richard Johannes Franciscus Van Haren
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Publication number: 20190346777Abstract: A patterning apparatus for a lithographic apparatus, the patterning apparatus including a patterning device support structure configured to support a patterning device having a planar surface; a patterning device conditioning system including a first gas outlet configured to provide a first gas flow over the planar surface in use and a second gas outlet configured to provide a second gas flow over the planar surface in use, wherein the first gas outlet and the second gas outlet are arranged at different distances perpendicular to the planar surface; and a control system configured to independently control a first momentum of gas exiting the first gas outlet and a second momentum of gas exiting the second gas outlet or to independently vary the first gas flow and/or the second gas flow over the planar surface of the patterning device.Type: ApplicationFiled: July 22, 2019Publication date: November 14, 2019Applicants: ASML NETHERLANDS B. V., ASML HOLDING N. V.Inventors: Günes NAKÍBOGLU, Lowell Lane Baker, Ruud Hendrikus Martinus Johannes BLOKS, Hakki Ergun CEKLI, Geoffrey Alan SCHULTZ, Laurentius Johannes Adrianus VAN BOKHOVEN, Frank Johannes Jacobus VAN BOXTEL, Jean-Philippe Xavier VAN DAMME, Christopher Charles WARD
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Patent number: 10459354Abstract: A lithographic apparatus including a support to support a patterning device, a substrate table to hold a substrate, and a projection system to project a radiation beam patterned by the patterning device onto a target portion of the substrate. A transparent layer is provided to protect the pattering device. The apparatus further includes a transparent layer deformation-determining device to determine a deformation profile of the transparent layer, the deformation profile of the transparent layer expressing a deformation of the transparent layer during a scanning movement of the lithographic apparatus, and a compensator device which is configured to control the projection system, the substrate table and/or the support in response to the deformation profile of the transparent layer to compensate for the deformation of the transparent layer during the scanning movement of the apparatus.Type: GrantFiled: March 24, 2016Date of Patent: October 29, 2019Assignee: ASML Netherlands B.V.Inventors: Kevin Van De Ruit, Bart Dinand Paarhuis, Jean-Philippe Xavier Van Damme, Johannes Onvlee, Cornelis Melchior Brouwer
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Patent number: 10394139Abstract: A patterning apparatus for a lithographic apparatus, the patterning apparatus including a patterning device support structure configured to support a patterning device having a planar surface; a patterning device conditioning system including a first gas outlet configured to provide a first gas flow over the planar surface in use and a second gas outlet configured to provide a second gas flow over the planar surface in use, wherein the first gas outlet and the second gas outlet are arranged at different distances perpendicular to the planar surface; and a control system configured to independently control a first momentum of gas exiting the first gas outlet and a second momentum of gas exiting the second gas outlet or to independently vary the first gas flow and/or the second gas flow over the planar surface of the patterning device.Type: GrantFiled: March 8, 2017Date of Patent: August 27, 2019Assignees: ASML Holding N.V., ASML Netherlands B.V.Inventors: Güneş Nak{dot over (i)}bo{hacek over (g)}lu, Lowell Lane Baker, Ruud Hendrikus Martinus Johannes Bloks, Hakki Ergün Cekli, Geoffrey Alan Schultz, Laurentius Johannes Adrianus Van Bokhoven, Frank Johannes Jacobus Van Boxtel, Jean-Philippe Xavier Van Damme, Christopher Charles Ward
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Publication number: 20190121248Abstract: A patterning apparatus for a lithographic apparatus, the patterning apparatus including a patterning device support structure configured to support a patterning device having a planar surface; a patterning device conditioning system including a first gas outlet configured to provide a first gas flow over the planar surface in use and a second gas outlet configured to provide a second gas flow over the planar surface in use, wherein the first gas outlet and the second gas outlet are arranged at different distances perpendicular to the planar surface; and a control system configured to independently control a first momentum of gas exiting the first gas outlet and a second momentum of gas exiting the second gas outlet or to independently vary the first gas flow and/or the second gas flow over the planar surface of the patterning device.Type: ApplicationFiled: March 8, 2017Publication date: April 25, 2019Applicants: ASML NETHERLANDS B.V., ASML HOLDING N.V.Inventors: Günes NAKIBOGLU, Lowell Lane BAKER, Ruud Hendrikus Martinus Johannes BLOKS, Hakki Ergün CEKLI, Geoffrey Alan SCHULTZ, Laurentius Johannes Adrianus VAN BOKHOVEN, Frank Johannes Jacobus VAN BOXTEL, Jean-Philippe Xavier VAN DAMME, Christopher Charles WARD
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Publication number: 20180095369Abstract: A lithographic apparatus including a support to support a patterning device, a substrate table to hold a substrate, and a projection system to project a radiation beam patterned by the patterning device onto a target portion of the substrate. A transparent layer is provided to protect the pattering device. The apparatus further includes a transparent layer deformation-determining device to determine a deformation profile of the transparent layer, the deformation profile of the transparent layer expressing a deformation of the transparent layer during a scanning movement of the lithographic apparatus, and a compensator device which is configured to control the projection system, the substrate table and/or the support in response to the deformation profile of the transparent layer to compensate for the deformation of the transparent layer during the scanning movement of the apparatus.Type: ApplicationFiled: March 24, 2016Publication date: April 5, 2018Applicant: ASML Netherlands B.V.Inventors: Kevin VAN DE RUIT, Bart Dinand PAARHUIS, Jean-Philippe Xavier VAN DAMME, Johannes ONVLEE, Cornelis Melchior BROUWER, Pieter Jacob KRAMER
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Patent number: 9740112Abstract: A patterning device support (200), for example, a patterning device (202) or substrate support, can be configured to release internal stresses of a patterning device loaded thereon. The patterning device support can include a positive pressuring generating interface (206a, 206b) or an acoustic vibration generating interface (206a, 206b), or can be configured to oscillate while at least a portion of patterning device is decoupled from the patterning device support. A method of transferring a patterning device between a patterning device handling apparatus and a patterning device support configured to move the patterning device can include positioning the patterning device onto a surface of the patterning device support, and performing a process that releases internal stress of the patterning device.Type: GrantFiled: September 23, 2013Date of Patent: August 22, 2017Assignees: ASML Holding N.V., ASML Netherlands B.V.Inventors: Arindam Sinharoy, Stephen S. Roux, Jean-Philippe Xavier Van Damme, Daniel Nathan Burbank, Mark Josef Schuster, Duncan Harris, Christopher Charles Ward
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Patent number: 9507279Abstract: A reticle is loaded into a lithographic apparatus. The apparatus performs measurements on the reticle, so as to calculate alignment parameters for transferring the pattern accurately to substrates. Tests are performed to detect possible contamination of the reticle or its support. Either operation proceeds with a warning, or the patterning of substrates is stopped. The test uses may use parameters of the alignment model itself, or different parameters. The integrity parameters may be compared against reference values reflecting historic measurements, so that sudden changes in a parameter are indicative of contamination. Integrity parameters may be calculated from residuals of the alignment model. In an example, height residuals are used to calculate parameters of residual wedge (Rx?) and residual roll (Ryy?). From these, integrity parameters expressed as height deviations are calculated and compared against thresholds.Type: GrantFiled: October 31, 2013Date of Patent: November 29, 2016Assignee: ASML Netherlands B.V.Inventors: Emil Peter Schmitt-Weaver, Paul Frank Luehrmann, Eduardus Johannes Gerardus Boon, Daan Maurits Slotboom, Jean-Philippe Xavier Van Damme, Wolfgang Henke, Alexander Ypma, Marc Jurian Kea
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Publication number: 20150277240Abstract: A patterning device support (200), for example, a patterning device (202) or substrate support, can be configured to release internal stresses of a patterning device loaded thereon. The patterning device support can include a positive pressuring generating interface (206a, 206b) or an acoustic vibration generating interface (206a, 206b), or can be configured to oscillate while at least a portion of patterning device is decoupled from the patterning device support. A method of transferring a patterning device between a patterning device handling apparatus and a patterning device support configured to move the patterning device can include positioning the patterning device onto a surface of the patterning device support, and performing a process that releases internal stress of the patterning device.Type: ApplicationFiled: September 23, 2013Publication date: October 1, 2015Applicants: ASML Holding N.V., ASML Netherlands B.V.Inventors: Arindam Sinharoy, Stephen S. Roux, Jean-Philippe Xavier Van Damme, Daniel Nathan Burbank, Mark Josef Schuster, Duncan Harris, Christopher Charles Ward
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Patent number: 8988657Abstract: A lithographic apparatus having a component that moves in a first direction, the component including a passive gas flow system. The passive gas flow system has a gas inlet to drive gas into the passive gas flow system when the component moves in the first direction and a gas outlet, connected to the gas inlet by a gas conduit, to direct the gas that is driven into the passive gas flow system in a certain direction.Type: GrantFiled: July 3, 2012Date of Patent: March 24, 2015Assignee: ASML Netherlands B.V.Inventors: Frank Johannes Jacobus Van Boxtel, Jeroen Gerard Gosen, Anthonie Kuijper, Arjan Hubrecht Josef Anna Martens, Jean-Philippe Xavier Van Damme, Peter Schoenmakers, Franciscus Joannes Anthonius Evers, Jaap Wilhelmus Petrus Van Empel, Léon Hubert Joseph Coumans, Justin Johannes Hermanus Gerritzen
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Publication number: 20140168627Abstract: A reticle is loaded into a lithographic apparatus. The apparatus performs measurements on the reticle, so as to calculate alignment parameters for transferring the pattern accurately to substrates. Tests are performed to detect possible contamination of the reticle or its support. Either operation proceeds with a warning, or the patterning of substrates is stopped. The test uses may use parameters of the alignment model itself, or different parameters. The integrity parameters may be compared against reference values reflecting historic measurements, so that sudden changes in a parameter are indicative of contamination. Integrity parameters may be calculated from residuals of the alignment model. In an example, height residuals are used to calculate parameters of residual wedge (Rx?) and residual roll (Ryy?). From these, integrity parameters expressed as height deviations are calculated and compared against thresholds.Type: ApplicationFiled: October 31, 2013Publication date: June 19, 2014Applicant: ASML Netherlands B.V.Inventors: Emil Peter SCHMITT-WEAVER, Paul Frank Luehrmann, Eduardus Johannes Gerardus Boon, Daan Maurits Slotboom, Jean-Philippe Xavier Van Damme, Wolfgang Henke, Alexander Ypma, Marc Jurian Kea
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Publication number: 20130010270Abstract: A lithographic apparatus having a component that moves in a first direction, the component including a passive gas flow system. The passive gas flow system has a gas inlet to drive gas into the passive gas flow system when the component moves in the first direction and a gas outlet, connected to the gas inlet by a gas conduit, to direct the gas that is driven into the passive gas flow system in a certain direction.Type: ApplicationFiled: July 3, 2012Publication date: January 10, 2013Applicant: ASML NETHERLANDS B.V.Inventors: Frank Johannes Jacobus VAN BOXTEL, Jeroen Gerard Gosen, Anthonie Kuijper, Arjan Hubrecht Josef Anna Martens, Jean-Philippe Xavier Van Damme, Peter Schoenmakers, Franciscus Joannes Anthonius Evers, Jaap Wilhelmus Petrus Van Empel, Léon Hubert Joseph Coumans, Justin Johannes Hermanus Gerritzen