Abstract: Direct scanning microlithography process of a substrate such as a wafer, by means of an optical and/or electronic beam, for obtaining photomechanical or electromechanical lithography of submicrometric structures at the surface of the substrate, wherein the source of the optical and/or electronic beam used for lithography is kept at an appropriate distance from the substrate by means of a waveguide proximity probe, such as a fiber optic proximity probe capable of measuring rapid variation, depending on the distance, of the intensity of an electromagnetic wave reflected by the substrate within the near field area located at the end of the probe. The invention also concerns microlithography devices using this process.

Abstract: Reflection microscopy process and apparatus for examining a surface which enable the injection of highly coherent electromagnetic wave, such as produced by a laser, in a waveguide whose outlet surface is flat and transparent, at least in the zone where propagation mode of the waveguide is emitted. The outlet surface is positioned above the surface to be examined at a chosen distance so that the coupling coefficient between the particular mode of propagation of waveguide and the propagation mode of the electric field of the wave reflected by the surface and guided in return by the waveguide, depends in an essentially exponential way on the distance or can be compared, at least locally, with an exponential variation function, or is rapidly decreasing, depending on the distance, and the surface is scanned with the waveguide. In particular, the field of the invention concerns scanning microscopy, by purely optical elements and with nanometric resolution.

Abstract: Installation for the analysis or transformation of the surface of samples placed in a vacuum or controlled atmosphere, including a main enclosure in which is positioned a support plate for at least one device, called SXM, in which a microprobe such as a light or electricity conducting tip is positioned close to the surface of the sample to be examined, whether in the air or in a vacuum. The device is intended for the microscopy, spectroscopy or etching of the sample surface by scanning of the surface by the microprobe. The support plate is equipped with elements for disconnecting it from the main enclosure and with elements for rotating the support plate around a central axis allowing the use of a series of SXM devices fitted into the periphery of the support plate.