Abstract: Provided is an intervertebral implant which is fixedly placed between spinous processes of adjacent vertebrae to maintain a predetermined space between the spinous processes and to prevent a relative displacement between superior and inferior facets of adjacent vertebrae. The intervertebral implant includes a spacer having two opposing notches for receiving two adjacent spinous processes and a band for securing the two spinous processes and the spacer, the spacer comprising a through-hole bored through sides of the spacer to allow the band to pass therethrough and depressions curved inwardly from outsides of the spacer to facilitate fastening of the band passed through the through-hole, and the band binding the two spinous processes and the spacer in a figure 8 form while passing through the through-hole to secure the two spinous processes and the spacer.