Patents by Inventor Jeanne E. Haubrich
Jeanne E. Haubrich has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 8179589Abstract: The invention is directed to novel methods and compositions useful for improving the performance of electrophoretic displays. The methods comprise adding a high absorbance dye or pigment, or conductive particles, or a conductive filler in the form of nanoparticles and having a volume resistivity of less than about 104 ohm cm, or a charge transport material into an electrode protecting layer of the display.Type: GrantFiled: August 16, 2010Date of Patent: May 15, 2012Assignee: SiPix Imaging, Inc.Inventors: Zarng-Arh George Wu, Jeanne E. Haubrich, Xiaojia Wang, Rong-Chang Liang
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Patent number: 8002948Abstract: A process for forming a patterned thin film structure on a substrate is disclosed. A pattern is printed with a material, such as a masking coating or an ink, on the substrate, the pattern being such that, in one embodiment, the desired thin film structures will be formed in the areas where the printed material is not present, i.e., a negative image of thin film structure to be formed is printed. In another embodiment, the pattern is printed with a material that is difficult to strip from the substrate, and the desired thin film structures will be formed in the areas where the printed material is present, i.e., a positive image of the thin film structure is printed. The thin film material is deposited on the patterned substrate, and the undesired area is stripped, leaving behind the patterned thin film structures.Type: GrantFiled: July 12, 2007Date of Patent: August 23, 2011Assignees: SiPix Imaging, Inc., Etansi Inc.Inventors: Jeanne E. Haubrich, Yi-Shung Chaug, Zarng-Arh George Wu, Rong-Chang Liang, Xiaojia Wang
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Publication number: 20080021128Abstract: A radiation-curable acrylate composition comprises: a) at least one urethane polyacrylate possessing a number average molecular weight of at least about 400 per acrylate group and having a Tg of not greater than about 40° C.; b) at least one crosslinking polyacrylate having a Tg of at least about 50° C.; c) at least one hydrophobic monoacrylate; and, d) at least one photoinitiator.Type: ApplicationFiled: July 19, 2006Publication date: January 24, 2008Inventors: Jeanne E. Haubrich, Wen P. Liao, Sona Sivakova Slocum
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Publication number: 20080020170Abstract: A substate possesses a transparent protective layer derived from a radiation-curable acrylate composition which comprises: a) at least one urethane polyacrylate possessing a number average molecular weight of at least about 400 per acrylate group and having a Tg of not greater than about 40° C.; b) at least one crosslinking polyacrylate having a Tg of at least about 50° C.; c) at least one hydrophobic monoacrylate; and, d) at least one photoinitiator.Type: ApplicationFiled: July 19, 2006Publication date: January 24, 2008Inventors: Jeanne E. Haubrich, Wen P. Liao, Sona Sivakova Slocum
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Publication number: 20080020169Abstract: An optical data storage medium comprises: a) a substrate; b) at least one data layer on substrate (a); and, c) at least one transparent protective layer on data layer (b), the transparent protective layer being formed from a radiation curable acrylate composition and exhibiting upon the cure thereof a modulus of not greater than about 500 MPa, a shrinkage of less than about 8 percent, a scratch resistance of less than about 5 percent and a Tg of from about 20 to about 60° C.Type: ApplicationFiled: July 19, 2006Publication date: January 24, 2008Inventors: Jeanne E. Haubrich, Wen P. Liao, Sona Sivakova Slocum
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Patent number: 7261920Abstract: A process for forming a patterned thin film structure on a substrate is disclosed. A pattern is printed with a material, such as a masking coating or an ink, on the substrate, the pattern being such that, in one embodiment, the desired thin film structures will be formed in the areas where the printed material is not present, i.e., a negative image of thin film structure to be formed is printed. In another embodiment, the pattern is printed with a material that is difficult to strip from the substrate, and the desired thin film structures will be formed in the areas where the printed material is present, i.e., a positive image of the thin film structure is printed. The thin film material is deposited on the patterned substrate, and the undesired area is stripped, leaving behind the patterned thin film structures.Type: GrantFiled: September 19, 2003Date of Patent: August 28, 2007Assignee: SiPix Imaging, Inc.Inventors: Jeanne E. Haubrich, Yi-Shung Chaug, Zarng-Arh George Wu, Rong-Chang Liang
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Patent number: 6909532Abstract: A matrix driven electrophoretic display with a multi-layer back plane is disclosed. The display comprises a top electrode layer, a display cell layer, and a multi-layer back plane. In one embodiment, the multi-layer back plane comprises an electrode formed on the top surface of the top substrate of the multi-layer back plane, a conductive via structure through the substrate, and a conductive trace connected electrically to the via structure at the bottom surface of the first substrate, whereby an electrical connection may be made from the electrode to a structure or component not located immediately beneath the electrode in the multi-layer back plane. In other embodiments, the multi-layer back plane may comprise additional layers and via holes, as needed to connect the electrode with the appropriate switching elements and/or driver elements, as applicable. Such switching and driver elements, integrated with multi-layer back plane.Type: GrantFiled: April 23, 2003Date of Patent: June 21, 2005Assignee: SiPix Imaging, Inc.Inventors: Jerry Chung, Jack Hou, Yi-Shung Chaug, Jeanne E. Haubrich, Rong-Chang Liang
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Publication number: 20040131779Abstract: A process for forming a patterned thin film structure on a substrate is disclosed. A pattern is printed with a material, such as a masking coating or an ink, on the substrate, the pattern being such that, in one embodiment, the desired thin film structures will be formed in the areas where the printed material is not present, i.e., a negative image of thin film structure to be formed is printed. In another embodiment, the pattern is printed with a material that is difficult to strip from the substrate, and the desired thin film structures will be formed in the areas where the printed material is present, i.e., a positive image of the thin film structure is printed. The thin film material is deposited on the patterned substrate, and the undesired area is stripped, leaving behind the patterned thin film structures.Type: ApplicationFiled: September 19, 2003Publication date: July 8, 2004Applicant: SiPix Imaging, Inc.Inventors: Jeanne E. Haubrich, Yi-Shung Chaug, Zarng-Arh George Wu, Rong-Chang Liang
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Publication number: 20040085619Abstract: The invention is directed to novel methods and compositions useful for improving the performance of electrophoretic displays. The methods comprise adding a high absorbance dye or pigment, or conductive particles or a charge transport material into an electrode protecting layer of the display.Type: ApplicationFiled: July 10, 2003Publication date: May 6, 2004Inventors: Zarng-Arh George Wu, Jeanne E. Haubrich, Xiaojia Wang, Rong-Chang Liang
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Publication number: 20030206331Abstract: A matrix driven electrophoretic display with a multi-layer back plane is disclosed. The display comprises a top electrode layer, a display cell layer, and a multi-layer back plane. In one embodiment, the multi-layer back plane comprises an electrode formed on the top surface of the top substrate of the multi-layer back plane, a conductive via structure through the substrate, and a conductive trace connected electrically to the via structure at the bottom surface of the first substrate, whereby an electrical connection may be made from the electrode to a structure or component not located immediately beneath the electrode in the multi-layer back plane. In other embodiments, the multi-layer back plane may comprise additional layers and via holes, as needed to connect the electrode with the appropriate switching elements and/or driver elements, as applicable.Type: ApplicationFiled: April 23, 2003Publication date: November 6, 2003Inventors: Jerry Chung, Jack Hou, Y.S. Chaug, Jeanne E. Haubrich, Rong-Chang Liang
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Publication number: 20030203101Abstract: A process for forming a patterned conductive structure on a substrate is disclosed. A pattern is printed with a material, such as a masking coating or an ink, on the substrate, the pattern being such that, in one embodiment, the desired conductive structures will be formed in the areas where the printed material is not present, i.e., a negative image of conductive structure to be formed is printed. In another embodiment, the pattern is printed with a material that is difficult to strip from the substrate, and the desired conductive structures will be formed in the areas where the printed material is present, i.e., a positive image of the conductive structure is printed. The conductive material is deposited on the patterned substrate, and the undesired area is stripped, leaving behind the patterned electrode structures.Type: ApplicationFiled: April 23, 2003Publication date: October 30, 2003Applicant: SiPix Imaging, Inc.Inventors: Jeanne E. Haubrich, Y. S. Chaug, Zarng-Arh George Wu, Abbas Hosseini, Paul Gendler, Rong-Chang Liang
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Patent number: 6605416Abstract: Photochemical acid progenitors in combination with dihydroperimidine squarylium dyes have been found to be particularly effective at generating acid upon irradiation with near-infrared radiation. It has been found that dihydroperimidine squarylium dyes that are particularly useful in this invention have an oxidation potential greater than about 0.5 V relative to SCE as measured in dichloromethane.Type: GrantFiled: February 2, 1998Date of Patent: August 12, 2003Assignee: Imation Corp.Inventors: Stanley C. Busman, Richard J. Ellis, Jeanne E. Haubrich, William D. Ramsden, Tran Van Thien, Gregory D. Cuny
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Publication number: 20010008748Abstract: Photochemical acid progenitors in combination with dihydroperimidine squarylium dyes have been found to be particularly effective at generating acid upon irradiation with near-infrared radiation. It has been found that dihydroperimidine squarylium dyes that are particularly useful in this invention have an oxidation potential greater than about 0.5 V relative to SCE as measured in dichloromethane.Type: ApplicationFiled: February 2, 1998Publication date: July 19, 2001Inventors: STANLEY C. BUSMAN, RICHARD J. ELLIS, JEANNE E. HAUBRICH, WILLIAM D. RAMSDEN, THIEN VAN TRAN, GREGORY D. CUNY
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Patent number: 5763134Abstract: Photochemical acid progenitors in combination with dihydroperimidine squarylium dyes have been found to be particularly effective at generating acid upon irradiation with near-infrared radiation. It has been found that dihydroperimidine squarylium dyes that are particularly useful in this invention have an oxidation potential greater than about 0.5 V relative to SCE as measured in dichloromethane.Type: GrantFiled: May 13, 1996Date of Patent: June 9, 1998Assignee: Imation CorpInventors: Stanley C. Busman, Richard J. Ellis, Jeanne E. Haubrich, William D. Ramsden, Tran Van Thien, Gregory D. Cuny
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Patent number: 5599652Abstract: Peroxycarboxylic ester photoinitiators derived from aromatic nitrogen containing heterocyclic carboxylic acids are described. The heterocyclic aromatic ring may contain additional nitrogen atoms, be fused with another aromatic ring system, be substituted with an additional peroxycarboxylic ester group and/or be substituted with an electron group having a Hammett sigma value greater than 0.1. The peroxycarboxylic ester photoinitiators have been found to be useful in photopolymerizable compositions and photosensitive elements.Type: GrantFiled: March 22, 1996Date of Patent: February 4, 1997Assignee: Imation Corp.Inventor: Jeanne E. Haubrich
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Patent number: 5527921Abstract: Peroxycarboxylic ester photoinitiators derived from aromatic nitrogen containing heterocyclic carboxylic acids are described. The heterocyclic aromatic ring may contain additional nitrogen atoms, be fused with another aromatic ring system, be substituted with an additional peroxycarboxylic ester group and/or be substituted with an electron group having a Hammett sigma value greater than 0.1. The peroxycarboxylic ester photoinitiators have been found to be useful in photopolymerizable compositions and photosensitive elements.Type: GrantFiled: March 21, 1995Date of Patent: June 18, 1996Assignee: Minnesota Mining and Manufacturing CompanyInventor: Jeanne E. Haubrich
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Patent number: RE38251Abstract: Photochemical acid progenitors in combination with dihydroperimidine squarylium dyes have been found to be particularly effective at generating acid upon irradiation with new-infrared radiation. It has been found that dihydroperimidine squarylium dyes that are particularly useful in this invention have an oxidation potential greater than about 0.5 V relative to SCE as measured in dichloromethane.Type: GrantFiled: February 23, 2000Date of Patent: September 16, 2003Assignee: Imation Corp.Inventors: Stanley C. Busman, Richard J. Ellis, Jeanne E. Haubrich, William D. Ramsden, Tran Van Thien, Gregory D. Cuny