Patents by Inventor Jed Davidow

Jed Davidow has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6896763
    Abstract: A method and apparatus for monitoring a process by employing principal component analysis are provided. Correlated attributes are measured for the process to be monitored (the production process). Principal component analysis then is performed on the measured correlated attributes so as to generate at least one production principal component; and the at least one production principal component is compared to a principal component associated with a calibration process (a calibration principal component). The calibration principal component is obtained by measuring correlated attributes of a calibration process, and by performing principal component analysis on the measured correlated attributes so as to generate at least one principal component. A principal component having a feature indicative of at least one of a desired process state, process event and chamber state then is identified and is designated as the calibration principal component.
    Type: Grant
    Filed: January 14, 2003
    Date of Patent: May 24, 2005
    Inventors: Lalitha Balasubramhanya, Moshe Sarfaty, Jed Davidow, Dimitris Lymberopoulos
  • Publication number: 20030136511
    Abstract: A method and apparatus for monitoring a process by employing principal component analysis are provided. Correlated attributes are measured for the process to be monitored (the production process). Principal component analysis then is performed on the measured correlated attributes so as to generate at least one production principal component; and the at least one production principal component is compared to a principal component associated with a calibration process (a calibration principal component). The calibration principal component is obtained by measuring correlated attributes of a calibration process, and by performing principal component analysis on the measured correlated attributes so as to generate at least one principal component. A principal component having a feature indicative of at least one of a desired process state, process event and chamber state then is identified and is designated as the calibration principal component.
    Type: Application
    Filed: January 14, 2003
    Publication date: July 24, 2003
    Inventors: Lalitha Balasubramhanya, Moshe Sarfaty, Jed Davidow, Dimitris Lymberopoulos
  • Patent number: 6521080
    Abstract: A method and apparatus for monitoring a process by employing principal component analysis are provided. Correlated attributes are measured for the process to be monitored (the production process). Principal component analysis then is performed on the measured correlated attributes so as to generate at least one production principal component; and the at least one production principal component is compared to a principal component associated with a calibration process (a calibration principal component). The calibration principal component is obtained by measuring correlated attributes of a calibration process, and by performing principal component analysis on the measured correlated attributes so as to generate at least one principal component. A principal component having a feature indicative of at least one of a desired process state, process event and chamber state then is identified and is designated as the calibration principal component.
    Type: Grant
    Filed: November 15, 2001
    Date of Patent: February 18, 2003
    Assignee: Applied Materials Inc.
    Inventors: Lalitha Balasubramhanya, Moshe Sarfaty, Jed Davidow, Dimitris Lymberopoulos
  • Patent number: 6455437
    Abstract: A method and apparatus for monitoring process state using plasma attributes are provided. Electromagnetic emissions generated by a plasma are collected, and a detection signal having at least one frequency component is generated based on the intensity of the collected electromagnetic emissions; or, the RF power delivered to a wafer pedestal is monitored and serves as the detection signal. The magnitude of at least one frequency component of the detection signal then is monitored over time. By monitoring the magnitude of at least one frequency component of the detection signal over time, a characteristic fingerprint of the plasma process is obtained. Features within the characteristic fingerprint provide process state information, process event information and process chamber information. In general, any chemical reaction having an attribute that varies with reaction rate may be similarly monitored.
    Type: Grant
    Filed: April 7, 1999
    Date of Patent: September 24, 2002
    Assignee: Applied Materials Inc.
    Inventors: Jed Davidow, Moshe Sarfaty, Dimitris Lymberopoulos
  • Publication number: 20020055259
    Abstract: A method and apparatus for monitoring a process by employing principal component analysis are provided. Correlated attributes are measured for the process to be monitored (the production process). Principal component analysis then is performed on the measured correlated attributes so as to generate at least one production principal component; and the at least one production principal component is compared to a principal component associated with a calibration process (a calibration principal component). The calibration principal component is obtained by measuring correlated attributes of a calibration process, and by performing principal component analysis on the measured correlated attributes so as to generate at least one principal component. A principal component having a feature indicative of at least one of a desired process state, process event and chamber state then is identified and is designated as the calibration principal component.
    Type: Application
    Filed: November 15, 2001
    Publication date: May 9, 2002
    Inventors: Lalitha Balasubramhanya, Moshe Sarfaty, Jed Davidow, Dimitris Lymberopoulos
  • Patent number: 6368975
    Abstract: A method and apparatus for monitoring a process by employing principal component analysis are provided. Correlated attributes are measured for the process to be monitored (the production process). Principal component analysis then is performed on the measured correlated attributes so as to generate at least one production principal component; and the at least one production principal component is compared to a principal component associated with a calibration process (a calibration principal component). The calibration principal component is obtained by measuring correlated attributes of a calibration process, and by performing principal component analysis on the measured correlated attributes so as to generate at least one principal component. A principal component having a feature indicative of at least one of a desired process state, process event and chamber state then is identified and is designated as the calibration principal component.
    Type: Grant
    Filed: July 7, 1999
    Date of Patent: April 9, 2002
    Assignee: Applied Materials, Inc.
    Inventors: Lalitha Balasubramhanya, Moshe Sarfaty, Jed Davidow, Dimitris Lymberopoulos