Patents by Inventor Jee-Eun Park

Jee-Eun Park has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Nanopositioning substrate preparation apparatus and preparation method using dip pen nanolithography with a single tip or multiple tips using atomic force microscope (AFM)
    Patent number: 9403180
    Abstract: Provided are method and apparatus to nanoposition ink, the apparatus including: a substrate; a pattern index; an atomic force microscope (AMF) tip configured to form a pattern on the pattern index; a first ink reservoir including a first ink; a second ink reservoir including a second ink; a first cleaning portion configured to remove the first ink from the AMF tip; a second washing portion configured to remove the second ink from the AMF tip; a position determining portion configured to interact with the AMF tip; an electrode connection portion configured to apply a voltage to the position determining portion, in order to determine a position of the AMF tip when the AMF tip interacts with the position determining portion. The AMF tip is configured to configured to interact with the position determining portion, prior to forming the pattern using the first and second inks.
    Type: Grant
    Filed: May 21, 2012
    Date of Patent: August 2, 2016
    Assignee: Korea Research Institute of Bioscience and Biotechnology
    Inventors: Tai-Hwan Ha, Jee-Eun Park
  • NANOPOSITIONING SUBSTRATE PREPARATION APPARATUS AND PREPARATION METHOD USING DIP PEN NANOLITHOGRAPHY WITH A SINGLE TIP OR MULTIPLE TIPS USING ATOMIC FORCE MICROSCOPE (AFM)
    Publication number: 20140134336
    Abstract: Provided are method and apparatus to nanoposition ink, the apparatus including: a substrate; a pattern index; an atomic force microscope (AMF) tip configured to form a pattern on the pattern index; a first ink reservoir including a first ink; a second ink reservoir including a second ink; a first cleaning portion configured to remove the first ink from the AMF tip; a second washing portion configured to remove the second ink from the AMF tip; a position determining portion configured to interact with the AMF tip; an electrode connection portion configured to apply a voltage to the position determining portion, in order to determine a position of the AMF tip when the AMF tip interacts with the position determining portion. The AMF tip is configured to configured to interact with the position determining portion, prior to forming the pattern using the first and second inks.
    Type: Application
    Filed: May 21, 2012
    Publication date: May 15, 2014
    Applicant: KOREA RESEARCH INSTITUTE OF BIOSCIENCE AND BIOTECH NOLOGY
    Inventors: Tai-Hwan Ha, Jee-Eun Park