Patents by Inventor JEE HUN JEONG

JEE HUN JEONG has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • SELF-ALIGNING PROCESS METHOD AND SELF-ALIGNING PROCESS APPARATUS FOR REDUCING CRITICAL DIMENSION VARIATION OF SIC TRENCH GATE MOSFET STRUCTURE
    Publication number: 20230326992
    Abstract: A self-aligning process method and a self-aligning process apparatus for reducing critical dimension variation of a SiC trench gate MOSFET structure are disclosed.
    Type: Application
    Filed: July 15, 2021
    Publication date: October 12, 2023
    Inventors: Ho Jun LEE, Jee Hun JEONG, Sang Woo KIM, Min Seok JANG, O Gyun SEOK
  • Inductively coupled plasma processing apparatus
    Patent number: 11735396
    Abstract: An inductively coupled plasma processing apparatus includes a lower chamber providing a space for a substrate, a high-frequency antenna that generates inductively coupled plasma in the lower chamber, dielectric windows disposed between the lower chamber and the high-frequency antenna, metal windows alternatingly disposed between the dielectric windows, and gas inlet pipes disposed in each of the metal windows, wherein each of the gas inlet pipes includes nozzles that introduce gases to the lower chamberamber.
    Type: Grant
    Filed: January 13, 2021
    Date of Patent: August 22, 2023
    Assignees: SAMSUNG ELECTRONICS CO., LTD., PUSAN NATIONAL UNIVERSITY INDUSTRY-UNIVERSITY COOPERATION FOUNDATION
    Inventors: Seung Bo Shim, Doug Yong Sung, Ho-Jun Lee, Jee Hun Jeong, Sung Hwan Cho, Ju-Hong Cha
  • INDUCTIVELY COUPLED PLASMA PROCESSING APPARATUS
    Publication number: 20220005671
    Abstract: An inductively coupled plasma processing apparatus includes a lower chamber providing a space for a substrate, a high-frequency antenna configured to generate inductively coupled plasma in the lower chamber, dielectric windows disposed between the lower chamber and the high-frequency antenna, metal windows alternatingly disposed between the dielectric windows, and gas inlet pipes disposed in each of the metal windows, wherein each of the gas inlet pipes includes nozzles configured to introduce gases to the lower chamber.
    Type: Application
    Filed: January 13, 2021
    Publication date: January 6, 2022
    Applicant: Pusan National University Industry-University Coop
    Inventors: SEUNG BO SHIM, DOUG YONG SUNG, HO-JUN LEE, JEE HUN JEONG, SUNG HWAN CHO, JU-HONG CHA