Abstract: The present disclosure discloses a lateral transistor having a source region, a drain region, a gate near the source region side and a field dielectric positioned in or atop a portion of a well region between the drain region and the gate. The lateral transistor further includes a non-conductive field plate positioning layer positioned atop a portion of the field dielectric and separated laterally from the gate with a first lateral distance, a lateral conductive field plate positioned atop the non-conductive field plate positioning layer and separated laterally from the gate with a second lateral distance and a vertical trenched field plate contact extending vertically from a top surface of an interlayer dielectric layer through the interlayer dielectric layer to reach and contact with the lateral conductive field plate.

Abstract: An LDMOS device with a field plate contact having a field plate contact metal layer being positioned above the field plate contact. The field plate contact metal layer has a sub-maximum size satisfied for the electrical connection between the field plate contact and an external applying voltage. This sub-maximum size is prescribed by the physical limitation of the LDMOS device. The field plate contact metal layer extends a sub-maximum length from one edge toward to the other edge of the field plate contact.

Abstract: An LDMOS device with a plurality of drain contact structures. Each drain contact structure has a drain contact, a first drain contact metal layer and a via. The drain contact is positioned above a drain region. The first drain contact metal layer is positioned above the drain contact. The via is positioned above the first drain contact metal layer. The LDMOS device has a second drain contact metal layer conductively coupled to the via of each drain contact structure.

Abstract: An LDMOS device with a field plate contact having a field plate contact metal layer being positioned above the field plate contact. The field plate contact metal layer has a sub-maximum size satisfied for the electrical connection between the field plate contact and an external applying voltage. This sub-maximum size is prescribed by the physical limitation of the LDMOS device. The field plate contact metal layer extends a sub-maximum length from one edge toward to the other edge of the field plate contact.

Abstract: A method for fabricating a LDMOS device, including: forming a semiconductor substrate; forming a dielectric layer atop the semiconductor substrate and an electric conducting layer on the dielectric layer; forming a first photoresist layer on the electric conducting layer; patterning the first photoresist layer through a first mask to form a first opening; etching the electric conducting layer through the first opening; implanting dopants of a first doping type into the semiconductor substrate through the first opening to form a first body region adjacent to the surface of the semiconductor substrate, and a second body region located beneath the first body region; removing the first photoresist layer; etching the electric conducting layer using a second photoresist layer and a second mask.

Abstract: A method for fabricating a LDMOS device, including: forming a semiconductor substrate; forming a dielectric layer atop the semiconductor substrate and an electric conducting layer on the dielectric layer; forming a first photoresist layer on the electric conducting layer; patterning the first photoresist layer through a first mask to form a first opening; etching the electric conducting layer through the first opening; implanting dopants of a first doping type into the semiconductor substrate through the first opening to form a first body region adjacent to the surface of the semiconductor substrate, and a second body region located beneath the first body region; removing the first photoresist layer; etching the electric conducting layer using a second photoresist layer and a second mask.

Abstract: A method for fabricating a LDMOS device, including: forming a semiconductor substrate; forming a dielectric layer atop the semiconductor substrate and an electric conducting layer on the dielectric layer; forming a first photoresist layer on the electric conducting layer; patterning the first photoresist layer through a first mask to form a first opening; etching the electric conducting layer through the first opening; implanting dopants of a first doping type into the semiconductor substrate through the first opening to form a first body region adjacent to the surface of the semiconductor substrate, and a second body region located beneath the first body region; removing the first photoresist layer; etching the electric conducting layer using a second photoresist layer and a second mask.

Abstract: A method for fabricating a LDMOS device in a well region of a semiconductor substrate, including: forming a body region and a source layer in the well region through a window of a polysilicon layer above the well region, wherein the body region has a deeper junction depth than the source layer; forming spacers at side walls of the polysilicon layer; and etching through the source layer through a window shaped by the spacers, wherein the source layer under the spacers is protected from etching, and is defined as source regions of the LDMOS device.

Abstract: A lateral DMOS device with peak electric field moved below a top surface of the device along a body-drain junction is introduced. The LDMOS has a deep body and a drift region formed by a series of P-type and N-type implants, respectively. The implant doses and depths are tuned so that the highest concentration gradient of the body-drift junction is formed below the surface, which suppresses the injection and trapping of hot holes in the device drain-gate oxide region vicinity, and the associated device performance changes, during operation in breakdown.

Abstract: A method for fabricating a LDMOS device in a semiconductor substrate of a first doping type, including: implanting a series of dopants into the semiconductor substrate using a first mask, and forming a first region of a second doping type adjacent to the surface of the semiconductor substrate, a second region of the first doping type located beneath the first region, and a third region of the second doping type located beneath the second region; implanting dopants into the semiconductor substrate using a second mask, and forming a fourth region of the second doping type adjacent to the first, second and third regions, wherein the fourth region extends from the surface of the semiconductor substrate to approximately the same depth as the third region; and implanting dopants into the first region using a third mask, and form a first well of the first doping type.

Abstract: A method of fabricating an LDMOS device includes: forming a gate of the LDMOS device on a semiconductor substrate; performing tilt body implantation by implanting dopants of a first conductivity type in the semiconductor substrate using a mask, wherein the tilt body implantation is implanted at an angle from a vertical direction; performing zero tilt body implantation by implanting dopants of the first conductivity type using the same mask, wherein the zero tilt body implantation is implanted with zero tilt from the vertical direction, and wherein the tilt body implantation and the zero tilt body implantation are configured to form a body region of the LDMOS device; and forming a source region and a drain contact region of the LDMOS device, wherein the source region and the drain contact region are of a second conductivity type.

Abstract: A semiconductor device has: a gate region having a dielectric layer and a conducting layer; an N-type drain region having a lightly doped drift region and a highly doped drain contact region formed in the drift region, wherein the drain region is at a first side of the gate region; a P-type body region adjacent to the drain region, the body region having a lightly doped first portion body region, a second portion body region, and a highly doped body contact region; and an N-type highly doped source region in the body region, wherein the source region is at a second side of the gate region; wherein the first portion body region is doped with boron, the second portion body region is doped with boron and indium in the first portion body region, and the second portion body region is located adjacent to and beneath the source region.

Abstract: A method of fabricating an LDMOS device includes: forming a gate of the LDMOS device on a semiconductor substrate; performing tilt body implantation by implanting dopants of a first conductivity type in the semiconductor substrate using a mask, wherein the tilt body implantation is implanted at an angle from a vertical direction; performing zero tilt body implantation by implanting dopants of the first conductivity type using the same mask, wherein the zero tilt body implantation is implanted with zero tilt from the vertical direction, and wherein the tilt body implantation and the zero tilt body implantation are configured to form a body region of the LDMOS device; and forming a source region and a drain contact region of the LDMOS device, wherein the source region and the drain contact region are of a second conductivity type.

Abstract: A semiconductor device has: a gate region having a dielectric layer and a conducting layer; an N-type drain region having a lightly doped drift region and a highly doped drain contact region formed in the drift region, wherein the drain region is at a first side of the gate region; a P-type body region adjacent to the drain region, the body region having a lightly doped first portion body region, a second portion body region, and a highly doped body contact region; and an N-type highly doped source region in the body region, wherein the source region is at a second side of the gate region; wherein the first portion body region is doped with boron, the second portion body region is doped with boron and indium in the first portion body region, and the second portion body region is located adjacent to and beneath the source region.

Abstract: Method of forming dual gate insulation layers and semiconductor device having dual gate insulation layers is disclosed. The method of forming dual gate insulation layers comprises forming a first thin layer of a thick gate insulation layer on a semiconductor substrate by oxidizing the semiconductor substrate, depositing a second thicker layer of the thick gate insulation layer on the first thin layer, removing a portion of the thick gate insulation layer to expose a surface area of the semiconductor substrate and forming a thin gate insulation layer on the exposed surface area of the semiconductor substrate. The method of forming dual gate insulation layers, when applied in fabricating semiconductor devices having dual gate insulation layers and trench isolation structures, may help to reduce a silicon stress near edges of the trench isolation structures and reduce/alleviate/prevent the formation of a leaky junction around the edges of the trench isolation structures.

Abstract: The present invention discloses a method of manufacturing an N-type LDMOS device. The method comprises forming a gate above the semiconductor substrate; forming a body, comprising forming a Pwell apart from the gate and forming a Pbase partly in the Pwell, wherein the Pbase is wider and shallower than the Pwell; and forming an N-type source and a drain contact region. Wherein the body curvature of the LDMOS device is controlled by adjusting the layout width of the Pwell.

Abstract: The present technology discloses a U-shape RESURF MOSFET device. Wherein the MOSFET device comprises a drain having a drain contact region and a drift region, a source, a body, a gate and a recessed-FOX structure. Wherein the recessed-FOX structure is between the gate and the drift region vertically and between the body and the drain contact region laterally, and wherein the recessed-FOX structure is configured to make the drift region into a U shape. The present technology further discloses the depth of the drift region is controlled by adjusting a layout width.

Abstract: Method of forming dual gate insulation layers and semiconductor device having dual gate insulation layers is disclosed. The method of forming dual gate insulation layers comprises forming a first thin layer of a thick gate insulation layer on a semiconductor substrate by oxidizing the semiconductor substrate, depositing a second thicker layer of the thick gate insulation layer on the first thin layer, removing a portion of the thick gate insulation layer to expose a surface area of the semiconductor substrate and forming a thin gate insulation layer on the exposed surface area of the semiconductor substrate. The method of forming dual gate insulation layers, when applied in fabricating semiconductor devices having dual gate insulation layers and trench isolation structures, may help to reduce a silicon stress near edges of the trench isolation structures and reduce/alleviate/prevent the formation of a leaky junction around the edges of the trench isolation structures.

Abstract: The present technology discloses a bipolar junction transistor (BJT) device integrated into a semiconductor substrate. The BJT device comprises a collector, a base and an emitter. The collector is of a first doping type on the substrate; the base is of a second doping type in the collector from the top surface of the semiconductor device and the base has a base depth; and the emitter is of a first doping type in the base from the top surface of the semiconductor device. The base depth is controlled by adjusting a layout width in forming the base.

Abstract: The present technology discloses a U-shape RESURF MOSFET device. Wherein the MOSFET device comprises a drain having a drain contact region and a drift region, a source, a body, a gate and a recessed-FOX structure. Wherein the recessed-FOX structure is between the gate and the drift region vertically and between the body and the drain contact region laterally, and wherein the recessed-FOX structure is configured to make the drift region into a U shape. The present technology further discloses the depth of the drift region is controlled by adjusting a layout width.