Patents by Inventor Jeff Andresen

Jeff Andresen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Systems, devices, and methods for combined wafer and photomask inspection
    Patent number: 11125677
    Abstract: Systems, devices, and methods for combined wafer and photomask inspection are provided. In some embodiments, chucks are provided, the chucks comprising: a removable insert, wherein the removable insert is configured to support a wafer so that an examination surface of the wafer lies within a focal range when the chuck is in a first configuration, wherein the removable insert is inserted into the chuck in the first configuration; and a first structure forming a recess that has a depth sufficient to support a photomask so that an examination surface of the photomask lies within the focal range when the chuck is in a second configuration, wherein the removable insert is not inserted into the chuck in the second configuration.
    Type: Grant
    Filed: April 8, 2019
    Date of Patent: September 21, 2021
    Assignee: Nanotronics Imaging, Inc.
    Inventors: Randolph E. Griffith, Jeff Andresen, Scott Pozzi-Loyola, Michael Moskie, Steve Scranton, Alejandro S. Jaime, John B. Putman
  • SYSTEMS, DEVICES, AND METHODS FOR COMBINED WAFER AND PHOTOMASK INSPECTION
    Publication number: 20190257741
    Abstract: Systems, devices, and methods for combined wafer and photomask inspection are provided. In some embodiments, chucks are provided, the chucks comprising: a removable insert, wherein the removable insert is configured to support a wafer so that an examination surface of the wafer lies within a focal range when the chuck is in a first configuration, wherein the removable insert is inserted into the chuck in the first configuration; and a first structure forming a recess that has a depth sufficient to support a photomask so that an examination surface of the photomask lies within the focal range when the chuck is in a second configuration, wherein the removable insert is not inserted into the chuck in the second configuration.
    Type: Application
    Filed: April 8, 2019
    Publication date: August 22, 2019
    Inventors: Randolph E. Griffith, Jeff Andresen, Scott Pozzi-Loyola, Michael Moskie, Steve Scranton, Alejandro S. Jamie, John B. Putman
  • Systems, devices, and methods for combined wafer and photomask inspection
    Patent number: 10254214
    Abstract: Systems, devices, and methods for combined wafer and photomask inspection are provided. In some embodiments, chucks are provided, the chucks comprising: a removable insert, wherein the removable insert is configured to support a wafer so that an examination surface of the wafer lies within a focal range when the chuck is in a first configuration, wherein the removable insert is inserted into the chuck in the first configuration; and a first structure forming a recess that has a depth sufficient to support a photomask so that an examination surface of the photomask lies within the focal range when the chuck is in a second configuration, wherein the removable insert is not inserted into the chuck in the second configuration.
    Type: Grant
    Filed: February 20, 2018
    Date of Patent: April 9, 2019
    Assignee: Nanotronics Imaging, Inc.
    Inventors: Randolph E. Griffith, Jeff Andresen, Scott Pozzi-Loyola, Michael Moskie, Steve Scranton, Alejandro S. Jaime, John B. Putman