Abstract: This projection method and apparatus use laser illumination, beam steering with a microelectromechanical-system (“MEMS”) mirror or array, and an afocal lens to magnify the MEMS deflections. In some preferred forms of the invention a beam splitter—preferably of polarization type—cooperates with a quarter-wave plate to transmit the radiation beam in one pass through the splitter and reflect the beam in another pass, thus cleanly separating the source subassembly from the processing and output subassemblies.