Patents by Inventor Jeff Rendlen

Jeff Rendlen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7199305
    Abstract: The invention provides a nanolithographic protosubstrate adapted for nanolithographic formation of nanostructures on the protosubstrate comprising: a substrate having a top surface exposed for nanolithographic formation of nanostructures, wherein the top surface comprises: electrically insulating surface regions; and at least one discreet electrode topology surrounded by the electrically insulating surface regions, wherein the electrode topology is adapted with electrical interconnections for electrically coupling the electrode topology to an external device.
    Type: Grant
    Filed: May 23, 2003
    Date of Patent: April 3, 2007
    Assignee: NanoInk, Inc.
    Inventors: Sylvain Cruchon-Dupeyrat, Michael Nelson, Jeff Rendlen, Joseph Fragala
  • Publication number: 20040026681
    Abstract: The invention provides a nanolithographic protosubstrate adapted for nanolithographic formation of nanostructures on the protosubstrate comprising: a substrate having a top surface exposed for nanolithographic formation of nanostructures, wherein the top surface comprises: electrically insulating surface regions; and at least one discreet electrode topology surrounded by the electrically insulating surface regions, wherein the electrode topology is adapted with electrical interconnections for electrically coupling the electrode topology to an external device.
    Type: Application
    Filed: May 23, 2003
    Publication date: February 12, 2004
    Applicant: Nanolnk, Inc.
    Inventors: Sylvain Cruchon-Dupeyrat, Michael Nelson, Jeff Rendlen, Joseph Fragala