Abstract: A method is shown for manufacturing silicon semiconductor nanowires on graphite cloth conducting substrates. The nanowires are grown on the substrate by first depositing a thin gold film on the graphite cloth using RF sputtering. The substrate structure is then exposed to dilute silane, resulting in a uniform coating of Si nanowires on the cloth. A method is also shown for growing calcified mineral phases on such nanowire surfaces as well as for the incorporation of anti-osteoporotic drugs or anti-bacterial agents onto the surface of the nanowires. Lastly, a method is shown for promoting the growth of bone-forming cells onto the nanowire materials by exposing specially treated nanowires to bone marrow cells.

Abstract: A method is shown for manufacturing silicon semiconductor nanowires on graphite cloth conducting substrates. The nanowires are grown on the substrate by first depositing a thin gold film on the graphite cloth using RF sputtering. The substrate structure is then exposed to dilute silane, resulting in a uniform coating of Si nanowires on the cloth. A method is also shown for growing calcified mineral phases on such nanowire surfaces as well as for the incorporation of anti-osteoporotic drugs or anti-bacterial agents onto the surface of the nanowires. Lastly, a method is shown for promoting the growth of bone-forming cells onto the nanowire materials by exposing specially treated nanowires to bone marrow cells.

Abstract: A method of forming thin porous layers of calcium phosphate upon a silicon wafer surface using a high voltage spark. The outer layer of calcium phosphate is the inorganic component of bone and is anchored to the underlying substrate of silicon. The silicon is compatible with existing integrated circuit processing methods. The morphology and thickness of the calcium phosphate film can be controlled by the duration of the spark and the distance between the affected surface and the counterelectrode utilized. The resultant porous layer can be impregnated with medicinally useful substances which then can be subsequently released to the surroundings through an electrical actuator.

Abstract: A method of forming thin porous layers of calcium phosphate upon a silicon wafer surface using a high voltage spark. The outer layer of calcium phosphate is the inorganic component of bone and is anchored to the underlying substrate of silicon. The silicon is compatible with existing integrated circuit processing methods. The morphology and thickness of the calcium phosphate film can be controlled by the duration of the spark and the distance between the affected surface and the counterelectrode utilized. The resultant porous layer can be impregnated with medicinally useful substances which then can be subsequently released to the surroundings through an electrical actuator.