Abstract: A process and apparatus for the manufacture of chemical vapor deposition deposited structures which comprises supplying a solid zinc metal continuously to a heated retort at a controlled rate. The retort is a body of refractory material having a top and a bottom and a traverse cross section which decreases from the top to the bottom of the retort. The zinc is melted, vaporized, and conveyed to a chemical vapor deposition zone defined by a number of heated mandrel plates where it is reacted with either hydrogen sulfide or hydrogen selenide to form a chemical vapor deposited structure. The process and apparatus provide for improved control over the evaporation rate of zinc and a reduction in the furnace volume needed to melt and vaporize the zinc.

Abstract: An improved method of forming a ZnS layer on a ZnSe substrate by chemical vapor deposition of ZnS onto the ZnSe is disclosed in which the ZnS is contacted, prior to the chemical vapor deposition of the ZnS, with H.sub.2 S in the absence of zinc metal vapor to cause reaction of the H.sub.2 S and the surface of the ZnSe substrate.